Method for manufacturing a semiconductor device
    1.
    发明授权
    Method for manufacturing a semiconductor device 失效
    半导体器件的制造方法

    公开(公告)号:US07507508B2

    公开(公告)日:2009-03-24

    申请号:US11306380

    申请日:2005-12-27

    IPC分类号: G03C5/00 G03F9/00

    CPC分类号: G03F7/70641 G03F7/70625

    摘要: A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor wafer. The predetermined assessment pattern includes a first assessment pattern having a remaining pattern, and a second assessment pattern which includes a remaining pattern formed in a position lower than the first assessment pattern in the direction of the optical axis of an exposure device. The method includes a preparation step, and a step of manufacturing an actual semiconductor device. The preparation step includes a forming step, a measuring step, a calculating step, and a creating step. The step of manufacturing an actual semiconductor device includes a forming step, a measuring step, a calculating step and an assessing step.

    摘要翻译: 公开了一种制造半导体器件的方法。 该方法可以通过在半导体晶片的主表面上形成预定的评估图案来评估曝光条件。 预定评估图案包括具有剩余图案的第一评估图案和包括在曝光装置的光轴方向上形成在比第一评估图案低的位置的剩余图案的第二评估图案。 该方法包括制备步骤和制造实际半导体器件的步骤。 准备步骤包括形成步骤,测量步骤,计算步骤和创建步骤。 制造实际半导体器件的步骤包括形成步骤,测量步骤,计算步骤和评估步骤。

    Flare measuring mask and flare measuring method of semiconductor aligner
    2.
    发明授权
    Flare measuring mask and flare measuring method of semiconductor aligner 失效
    半导体校准器的耀斑测量面罩和耀斑测量方法

    公开(公告)号:US07186481B2

    公开(公告)日:2007-03-06

    申请号:US10761215

    申请日:2004-01-22

    IPC分类号: G03F9/00

    CPC分类号: G03F7/7085 G03F1/44

    摘要: A flare measuring mask and a flare measuring method are capable of measuring flare at high sensitivity by an optical measuring instrument. The first measuring portion has a double cross shielding area including first stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals and third stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals, crossing with the first shielding portions at right angles, and the second measuring portion includes second-stripe shaped shielding portions identical to the first shielding portions of the first measuring portion and fourth stripe-shaped shielding portions identical to the third shielding portions, crossing with the second shielding portions at right angles in a central portion. In the resist length measuring process, the presence of the flare is checked by measuring the length of the resist pattern corresponding to the respective shielding portions in the longitudinal direction.

    摘要翻译: 耀斑测量面罩和耀斑测量方法能够通过光学测量仪器以高灵敏度测量耀斑。 第一测量部分具有双交叉屏蔽区域,包括以规则间隔平行排列的同一图形的第一条形屏蔽部分和同一图形的第三条形屏蔽部分以规则间隔平行排列,与第一屏蔽 第二测量部分包括与第一测量部分的第一屏蔽部分相同的第二条形屏蔽部分和与第三屏蔽部分相同的第四条形屏蔽部分,与第二屏蔽部分在右边交叉 中心部分的角度。 在抗蚀剂长度测量过程中,通过测量与纵向上各个屏蔽部分对应的抗蚀剂图案的长度来检查闪光的存在。

    METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
    3.
    发明申请
    METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE 失效
    制造半导体器件的方法

    公开(公告)号:US20060199089A1

    公开(公告)日:2006-09-07

    申请号:US11306380

    申请日:2005-12-27

    IPC分类号: G06F17/50 G03C5/00

    CPC分类号: G03F7/70641 G03F7/70625

    摘要: A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor wafer. The predetermined assessment pattern includes a first assessment pattern having a remaining pattern, and a second assessment pattern which includes a remaining pattern formed in a position lower than the first assessment pattern in the direction of the optical axis of an exposure device. The method includes a preparation step, and a step of manufacturing an actual semiconductor device. The preparation step includes a forming step, a measuring step, a calculating step, and a creating step. The step of manufacturing an actual semiconductor device includes a forming step, a measuring step, a calculating step and an assessing step.

    摘要翻译: 公开了一种制造半导体器件的方法。 该方法可以通过在半导体晶片的主表面上形成预定的评估图案来评估曝光条件。 预定评估图案包括具有剩余图案的第一评估图案和包括在曝光装置的光轴方向上形成在比第一评估图案低的位置的剩余图案的第二评估图案。 该方法包括制备步骤和制造实际半导体器件的步骤。 准备步骤包括形成步骤,测量步骤,计算步骤和创建步骤。 制造实际半导体器件的步骤包括形成步骤,测量步骤,计算步骤和评估步骤。

    Method for forming alignment mark
    4.
    发明授权
    Method for forming alignment mark 失效
    形成对准标记的方法

    公开(公告)号:US6143622A

    公开(公告)日:2000-11-07

    申请号:US478805

    申请日:2000-01-07

    摘要: A method for forming an alignment mark includes defining a circuit pattern area and an alignment mark area on a semiconductor substrate, forming a first pattern in the alignment mark area, forming a second pattern of a first material on the first pattern, forming a layer of a second material different from the first on the entire surface of the semiconductor substrate, and polishing the layer of the second material and the second layer such that the second pattern and the layer of second material are polished at different speed, until a step difference appears between the second pattern and the layer.

    摘要翻译: 形成对准标记的方法包括在半导体衬底上限定电路图案区域和对准标记区域,在对准标记区域中形成第一图案,在第一图案上形成第一材料的第二图案,形成第 与半导体基板的整个表面上的第一材料不同的第二材料,并且研磨第二材料和第二层的层,使得第二图案和第二材料层以不同的速度被抛光,直到出现阶差 在第二图案和图层之间。

    Flare measuring mask and flare measuring method of semiconductor aligner
    5.
    发明申请
    Flare measuring mask and flare measuring method of semiconductor aligner 失效
    半导体校准器的耀斑测量面罩和耀斑测量方法

    公开(公告)号:US20050095510A1

    公开(公告)日:2005-05-05

    申请号:US10761215

    申请日:2004-01-22

    CPC分类号: G03F7/7085 G03F1/44

    摘要: A flare measuring mask and a flare measuring method are capable of measuring flare at high sensitivity by an optical measuring instrument. The first measuring portion has a double cross shielding area including first stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals and third stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals, crossing with the first shielding portions at right angles, and the second measuring portion includes second-stripe shaped shielding portions identical to the first shielding portions of the first measuring portion and fourth stripe-shaped shielding portions identical to the third shielding portions, crossing with the second shielding portions at right angles in a central portion. In the resist length measuring process, the presence of the flare is checked by measuring the length of the resist pattern corresponding to the respective shielding portions in the longitudinal direction.

    摘要翻译: 耀斑测量面罩和耀斑测量方法能够通过光学测量仪器以高灵敏度测量耀斑。 第一测量部分具有双交叉屏蔽区域,包括以规则间隔平行排列的同一图形的第一条形屏蔽部分和同一图形的第三条形屏蔽部分以规则间隔平行排列,与第一屏蔽 第二测量部分包括与第一测量部分的第一屏蔽部分相同的第二条形屏蔽部分和与第三屏蔽部分相同的第四条形屏蔽部分,与第二屏蔽部分在右边交叉 中心部分的角度。 在抗蚀剂长度测量过程中,通过测量与纵向上各个屏蔽部分对应的抗蚀剂图案的长度来检查闪光的存在。

    FLUID DYNAMIC BEARING DEVICE AND MOTOR WITH SAME
    7.
    发明申请
    FLUID DYNAMIC BEARING DEVICE AND MOTOR WITH SAME 有权
    流体动力轴承装置和电动机

    公开(公告)号:US20150233417A1

    公开(公告)日:2015-08-20

    申请号:US14425972

    申请日:2013-08-19

    IPC分类号: F16C17/10 F16C33/10

    摘要: A fluid dynamic bearing device including: a bearing sleeve fixed to an inner periphery of a housing; a shaft member removably inserted along an inner periphery of the bearing sleeve; an annular member having an inner peripheral surface for defining a radial gap together with an outer peripheral surface of the shaft member; and radial bearing portions and a thrust bearing portion for supporting the shaft member. At least the radial bearing gap at each of the radial bearing portions, and a bottom gap having the thrust bearing portion received therein are filled with lubricating oil. A void section is formed in an interior space of the housing. Assuming that d1 represents a gap width of the radial bearing gap and d2 represents a gap width of the radial gap, a relationship of 30d1≦d2≦250d1 is satisfied.

    摘要翻译: 一种流体动力轴承装置,包括:固定到壳体的内周的轴承套筒; 轴构件,其沿着所述轴承套筒的内周可移除地插入; 环形构件,其具有用于与所述轴构件的外周表面一起限定径向间隙的内周表面; 以及用于支撑轴构件的径向轴承部分和止推轴承部分。 至少每个径向轴承部分处的径向轴承间隙和其中容纳有止推轴承部分的底部间隙填充有润滑油。 在壳体的内部空间中形成空隙部。 假设d1表示径向轴承间隙的间隙宽度,d2表示径向间隙的间隙宽度,则满足30d1≦̸ d2≦̸ 250d1的关系。

    Digital camera
    10.
    发明授权
    Digital camera 有权
    数码相机

    公开(公告)号:US08520121B2

    公开(公告)日:2013-08-27

    申请号:US13252486

    申请日:2011-10-04

    申请人: Yasuhiro Yamamoto

    发明人: Yasuhiro Yamamoto

    IPC分类号: H04N5/222 H04N5/228 H04N5/225

    摘要: A digital camera is provided that includes a camera body and a monitor device. The camera body includes an imaging module, an image stabilization module, a first connector half and a first wireless communication module. The monitor device is detachable from the camera body and includes a monitor, a second connector half complemental to the first connector half and a second wireless communication module complemental to the first wireless communication module. An operation of the image stabilization module is suspended when monitor device is detached from the camera body.

    摘要翻译: 提供了一种包括相机主体和监视器装置的数字照相机。 相机主体包括成像模块,图像稳定模块,第一连接器半部和第一无线通信模块。 监视器装置可从照相机主体拆卸并且包括监视器,与第一连接器半部互补的第二连接器和与第一无线通信模块互补的第二无线通信模块。 当监控设备从照相机主体上拆下时,图像稳定模块的操作被暂停。