摘要:
A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor wafer. The predetermined assessment pattern includes a first assessment pattern having a remaining pattern, and a second assessment pattern which includes a remaining pattern formed in a position lower than the first assessment pattern in the direction of the optical axis of an exposure device. The method includes a preparation step, and a step of manufacturing an actual semiconductor device. The preparation step includes a forming step, a measuring step, a calculating step, and a creating step. The step of manufacturing an actual semiconductor device includes a forming step, a measuring step, a calculating step and an assessing step.
摘要:
A flare measuring mask and a flare measuring method are capable of measuring flare at high sensitivity by an optical measuring instrument. The first measuring portion has a double cross shielding area including first stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals and third stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals, crossing with the first shielding portions at right angles, and the second measuring portion includes second-stripe shaped shielding portions identical to the first shielding portions of the first measuring portion and fourth stripe-shaped shielding portions identical to the third shielding portions, crossing with the second shielding portions at right angles in a central portion. In the resist length measuring process, the presence of the flare is checked by measuring the length of the resist pattern corresponding to the respective shielding portions in the longitudinal direction.
摘要:
A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor wafer. The predetermined assessment pattern includes a first assessment pattern having a remaining pattern, and a second assessment pattern which includes a remaining pattern formed in a position lower than the first assessment pattern in the direction of the optical axis of an exposure device. The method includes a preparation step, and a step of manufacturing an actual semiconductor device. The preparation step includes a forming step, a measuring step, a calculating step, and a creating step. The step of manufacturing an actual semiconductor device includes a forming step, a measuring step, a calculating step and an assessing step.
摘要:
A method for forming an alignment mark includes defining a circuit pattern area and an alignment mark area on a semiconductor substrate, forming a first pattern in the alignment mark area, forming a second pattern of a first material on the first pattern, forming a layer of a second material different from the first on the entire surface of the semiconductor substrate, and polishing the layer of the second material and the second layer such that the second pattern and the layer of second material are polished at different speed, until a step difference appears between the second pattern and the layer.
摘要:
A flare measuring mask and a flare measuring method are capable of measuring flare at high sensitivity by an optical measuring instrument. The first measuring portion has a double cross shielding area including first stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals and third stripe-shaped shielding portions of the same figure aligned in parallel at regular intervals, crossing with the first shielding portions at right angles, and the second measuring portion includes second-stripe shaped shielding portions identical to the first shielding portions of the first measuring portion and fourth stripe-shaped shielding portions identical to the third shielding portions, crossing with the second shielding portions at right angles in a central portion. In the resist length measuring process, the presence of the flare is checked by measuring the length of the resist pattern corresponding to the respective shielding portions in the longitudinal direction.
摘要:
Providing a fluid dynamic bearing device, wherein the outer member comprises a member formed by a pressing process on a plate member, the radial bearing surface and at least the one of the thrust bearing surfaces of the outer member being formed by the pressing process, and wherein at least a part of the inner member, which forms the radial bearing surface and the thrust bearing surfaces of the inner member, is made of a sintered metal.
摘要:
A fluid dynamic bearing device including: a bearing sleeve fixed to an inner periphery of a housing; a shaft member removably inserted along an inner periphery of the bearing sleeve; an annular member having an inner peripheral surface for defining a radial gap together with an outer peripheral surface of the shaft member; and radial bearing portions and a thrust bearing portion for supporting the shaft member. At least the radial bearing gap at each of the radial bearing portions, and a bottom gap having the thrust bearing portion received therein are filled with lubricating oil. A void section is formed in an interior space of the housing. Assuming that d1 represents a gap width of the radial bearing gap and d2 represents a gap width of the radial gap, a relationship of 30d1≦d2≦250d1 is satisfied.
摘要:
A lubricating coating which can prevent the occurrence of galling even when makeup is carried out with a high torque and which has excellent rust preventing properties is formed on the contact surfaces of a pin and/or a box of a tubular threaded joint. The lubricating coating contains copolymer particles made from particles of an acrylic-silicone copolymer with an average particle diameter of 10-50 μm dispersed in a highly viscous matrix made from a mixture of a rosin-based substance selected from rosin and its derivatives, wax, a metal soap, and a basic metal salt of an aromatic organic acid (such as highly basic Ca sulfonate).
摘要:
A lubricating coating which can prevent the occurrence of galling even when makeup is carried out with a high torque and which has excellent rust preventing properties is formed on the contact surfaces of a pin and/or a box of a tubular threaded joint. The lubricating coating contains copolymer particles made from particles of an acrylic-silicone copolymer with an average particle diameter of 10-50 μm dispersed in a highly viscous matrix made from a mixture of a rosin-based substance selected from rosin and its derivatives, wax, a metal soap, and a basic metal salt of an aromatic organic acid (such as highly basic Ca sulfonate).
摘要:
A digital camera is provided that includes a camera body and a monitor device. The camera body includes an imaging module, an image stabilization module, a first connector half and a first wireless communication module. The monitor device is detachable from the camera body and includes a monitor, a second connector half complemental to the first connector half and a second wireless communication module complemental to the first wireless communication module. An operation of the image stabilization module is suspended when monitor device is detached from the camera body.