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公开(公告)号：US07276124B2
公开(公告)日：2007-10-02
申请号：US11129548
申请日：2005-05-13
申请人： Alex Gurary , Scott Elman , Keng Moy , Vadim Boguslavskiy
发明人： Alex Gurary , Scott Elman , Keng Moy , Vadim Boguslavskiy
IPC分类号： C23C16/00 , H01L21/301 , C23F1/00
CPC分类号： C23C16/4411 , C23C16/4401 , C30B25/08 , C30B25/10 , H01L21/2026 , H01L21/67109 , H01L21/67126 , H01L21/67373 , H01L21/67379 , H01L21/67772 , H01L21/67775 , H01L27/1218 , H01L27/1274 , H01L27/1285 , H01L27/1296 , H01L29/66757 , H01L29/66772 , H01L29/78654 , H01L29/78675
摘要： A shutter assembly for a reactor includes a cylindrical shutter for selectively closing a passthrough opening of the reactor, the shutter forming a closed loop and including an internal cavity adapted to receive a cooling fluid, tubing connected with the cylindrical shutter for supplying the cooling fluid to the internal cavity, and an actuator connected with the tubing for moving the tubing and the cylindrical shutter. The cylindrical shutter is movable between a first substantially closed position and a second substantially open position.
摘要翻译： 用于反应器的快门组件包括用于选择性地闭合反应器的通路开口的圆柱形快门，所述活门形成闭合回路并且包括适于接纳冷却流体的内部空腔，与所述圆柱形开闭器连接的管道，用于将冷却流体供应到 内腔，以及与管道连接的致动器，用于移动管道和圆柱形闸门。 圆柱形快门可在第一基本关闭位置和第二基本打开位置之间移动。
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公开(公告)号：US20050217578A1
公开(公告)日：2005-10-06
申请号：US11129548
申请日：2005-05-13
申请人： Alexander Gurary , Scott Elman , Keng Moy , Vadim Boguslavskiy
发明人： Alexander Gurary , Scott Elman , Keng Moy , Vadim Boguslavskiy
IPC分类号： B65G49/07 , C23C16/44 , C30B25/08 , C30B25/10 , H01L21/00 , H01L21/20 , H01L21/205 , H01L21/336 , H01L21/67 , H01L21/673 , H01L21/677 , H01L21/77 , H01L21/84 , H01L29/786 , C23C16/00 , C23F1/00
CPC分类号： C23C16/4411 , C23C16/4401 , C30B25/08 , C30B25/10 , H01L21/2026 , H01L21/67109 , H01L21/67126 , H01L21/67373 , H01L21/67379 , H01L21/67772 , H01L21/67775 , H01L27/1218 , H01L27/1274 , H01L27/1285 , H01L27/1296 , H01L29/66757 , H01L29/66772 , H01L29/78654 , H01L29/78675
摘要： A shutter assembly for a reactor includes a cylindrical shutter for selectively closing a passthrough opening of the reactor, the shutter forming a closed loop and including an internal cavity adapted to receive a cooling fluid, tubing connected with the cylindrical shutter for supplying the cooling fluid to the internal cavity, and an actuator connected with the tubing for moving the tubing and the cylindrical shutter. The cylindrical shutter is movable between a first substantially closed position and a second substantially open position.
摘要翻译： 用于反应器的快门组件包括用于选择性地闭合反应器的通路开口的圆柱形快门，所述活门形成闭合回路并且包括适于接纳冷却流体的内部空腔，与所述圆柱形开闭器连接的管道，用于将冷却流体供应到 内腔，以及与管道连接的致动器，用于移动管道和圆柱形闸门。 圆柱形快门可在第一基本关闭位置和第二基本打开位置之间移动。
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公开(公告)号：US06902623B2
公开(公告)日：2005-06-07
申请号：US10046426
申请日：2002-01-16
申请人： Alexander Gurary , Scott Elman , Keng Moy , Vadim Boguslavskiy
发明人： Alexander Gurary , Scott Elman , Keng Moy , Vadim Boguslavskiy
IPC分类号： B65G49/07 , C23C16/44 , C30B25/08 , C30B25/10 , H01L21/00 , H01L21/20 , H01L21/205 , H01L21/336 , H01L21/67 , H01L21/673 , H01L21/677 , H01L21/77 , H01L21/84 , H01L29/786 , C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： C23C16/4411 , C23C16/4401 , C30B25/08 , C30B25/10 , H01L21/2026 , H01L21/67109 , H01L21/67126 , H01L21/67373 , H01L21/67379 , H01L21/67772 , H01L21/67775 , H01L27/1218 , H01L27/1274 , H01L27/1285 , H01L27/1296 , H01L29/66757 , H01L29/66772 , H01L29/78654 , H01L29/78675
摘要： A reactor for growing epitaxial layers includes reaction chamber having a passthrough opening for inserting and removing wafer carriers from the reaction chamber. A reactor also includes a cylindrical shutter located inside the reaction chamber for selectively closing the passthrough opening. The cylindrical shutter is movable between a first position for closing the passthrough opening and a second position for opening the passthrough opening. The cylindrical shutter includes an internal cavity adapted to receive a cooling fluid and tubing for introducing the cooling fluid into the internal cavity. The tubing is permanently secured to the shutter and moves simultaneously therewith. The cylindrical shutter and the internal cavity of the shutter surrounds an outer perimeter of the wafer carrier, thereby minimizing nonuniformity in the temperature and flow field characteristics of the reactant gases.
摘要翻译： 用于生长外延层的反应器包括具有用于从反应室插入和移除晶片载体的穿通开口的反应室。 反应器还包括位于反应室内部的用于选择性地关闭通式开口的圆柱形开闭器。 圆柱形快门可以在用于关闭穿通开口的第一位置和用于打开穿通开口的第二位置之间移动。 圆柱形闸门包括适于接收冷却流体的内腔和用于将冷却流体引入内腔的管道。 管道永久地固定在闸门上并同时移动。 圆柱形闸门和闸门的内腔围绕晶片载体的外周，从而最小化反应气体的温度和流场特性的不均匀性。
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公开(公告)号：US20130252404A1
公开(公告)日：2013-09-26
申请号：US13424821
申请日：2012-03-20
申请人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
发明人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
IPC分类号： C23C16/458 , H01L21/203
CPC分类号： C23C16/4584 , C23C16/4586 , C23C16/46 , H01L21/6719 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.
摘要翻译： 化学气相沉积反应器的结构理想地包括具有内部的反应室，安装在反应室中的主轴和可拆卸地安装到主轴上以与其一起旋转的晶片载体。 主轴理想地具有沿着垂直旋转轴线延伸的轴和从轴向外突出的键。 晶片载体优选地具有限定相对面对的顶表面和底表面的主体，并且至少一个晶片保持特征构造成使得晶片可以被保持在其中，晶片的表面暴露在主体的顶表面处。 晶片载体理想地还具有从主体的底表面延伸到主体中的凹槽和沿着第一横向轴线从凹部的周边向外突出的键槽。 轴优选地接合在凹部中，并且键优选地接合到键槽中。
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公开(公告)号：USD687791S1
公开(公告)日：2013-08-13
申请号：US29416236
申请日：2012-03-20
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公开(公告)号：USD687790S1
公开(公告)日：2013-08-13
申请号：US29416220
申请日：2012-03-20
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公开(公告)号：USD726133S1
公开(公告)日：2015-04-07
申请号：US29416216
申请日：2012-03-20
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公开(公告)号：USD712852S1
公开(公告)日：2014-09-09
申请号：US29416217
申请日：2012-03-20
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公开(公告)号：US20110114022A1
公开(公告)日：2011-05-19
申请号：US12746846
申请日：2008-12-01
CPC分类号： C23C16/4581 , C23C16/45508 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate. The wafer carrier also preferably includes a gas flow facilitating element on the upstream surface of the plate in the central region of the plate. The gas flow facilitating element helps redirect the flow of incident gases along the upstream surface and away from a flow discontinuity in the central region.
摘要翻译： 用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。 轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。 在清洁板时可以拆下轮毂。 晶片载体还优选地包括在板的中心区域中的板的上游表面上的气流促进元件。 气流促进元件有助于沿着上游表面并且远离中心区域中的流动不连续性重定向入射气体的流动。
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公开(公告)号：US09816184B2
公开(公告)日：2017-11-14
申请号：US13424821
申请日：2012-03-20
申请人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
发明人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
IPC分类号： C23C16/458 , C23C16/46 , H01L21/67 , H01L21/687
CPC分类号： C23C16/4584 , C23C16/4586 , C23C16/46 , H01L21/6719 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.
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