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1.发明授权High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system 有权具有用于极紫外光刻系统的液态金属界面的高热负荷光学元件公开(公告)号：US09041904B2
公开(公告)日：2015-05-26
申请号：US13331549
申请日：2011-12-20
申请人： Alton H. Phillips
发明人： Alton H. Phillips
CPC分类号： G02B7/1815 , G02B5/0891 , G03F7/70825 , G03F7/70891 , G21K1/06 , G21K2201/065
摘要： Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger includes at least one well defined therein. The mirror assembly includes a mirror block having a mirrored surface. The mirror assembly also has at least one surface. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The at least one surface is in contact with the liquid metal to transfer heat from the mirror block to the heat exchanger.
摘要翻译： 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，一种装置包括热交换器，反射镜组件和第一液态金属界面。 热交换器包括至少一个井。 镜组件包括具有镜面的镜块。 镜组件还具有至少一个表面。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 所述至少一个表面与所述液态金属接触以将热量从所述镜块传递到所述热交换器。
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2.发明申请HIGH HEAT LOAD OPTICS WITH A LIQUID METAL INTERFACE FOR USE IN AN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM 审中-公开具有液体金属界面的高热负载光源，可用于超极紫外光刻系统公开(公告)号：US20120099088A1
公开(公告)日：2012-04-26
申请号：US13331549
申请日：2011-12-20
申请人： Alton H. Phillips
发明人： Alton H. Phillips
CPC分类号： G02B7/1815 , G02B5/0891 , G03F7/70825 , G03F7/70891 , G21K1/06 , G21K2201/065
摘要： Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The minor assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first minor block to the heat exchanger.
摘要翻译： 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 次要组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一小块转移到热交换器。
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公开(公告)号：US20110109419A1
公开(公告)日：2011-05-12
申请号：US12616907
申请日：2009-11-12
IPC分类号： H01F27/32
CPC分类号： H01F5/06 , H01F27/22 , H01F41/074
摘要： Embodiments of the invention provide improved thermal conductivity within, among other things, electromagnetic coils, coil assemblies, electric motors, and lithography devices. In one embodiment, a thermally conductive coil includes at least two adjacent coil layers. The coil layers include windings of wires formed from a conductor and an insulator that electrically insulates the windings within each coil layer. In some cases the insulator of the wires is at least partially absent along an outer surface of one or both coil layers to increase the thermal conductivity between the coil layers. In some embodiments, an insulation layer is provided between the coil layers to electrically insulate the coil layers. In some cases the insulation layer has a thermal conductivity greater than the thermal conductivity of the wire insulator.
摘要翻译： 本发明的实施例尤其提供了电磁线圈，线圈组件，电动马达和光刻装置之内的改进的导热性。 在一个实施例中，导热线圈包括至少两个相邻的线圈层。 线圈层包括由导体和绝缘体形成的导线的绕组，其将线圈电绝缘在每个线圈层内。 在一些情况下，线的绝缘体至少部分地沿着一个或两个线圈层的外表面不存在，以增加线圈层之间的热导率。 在一些实施例中，绝缘层设置在线圈层之间以使线圈层电绝缘。 在一些情况下，绝缘层的导热率大于导线绝缘体的导热率。
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公开(公告)号：US20100156198A1
公开(公告)日：2010-06-24
申请号：US12643888
申请日：2009-12-21
申请人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
发明人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/19 , H02K9/20 , H02K41/031 , H02K2201/18
摘要： According to one aspect of the present invention, a motor arrangement includes at least one coil, a cover plate, and a shield layer. The at least one coil has a first side and a second side. The cover plate is positioned substantially over the first side of the at least one coil at a distance from the at least one coil. The shield layer is positioned between the first side of the at least one coil and the cover plate, and has a top surface. The top surface contacts the cover plate, and includes a liquid and a gas that form a mixture and cause the top surface to have a substantially constant temperature.
摘要翻译： 根据本发明的一个方面，电动机装置包括至少一个线圈，盖板和屏蔽层。 该至少一个线圈具有第一侧和第二侧。 覆盖板基本上位于距离至少一个线圈一定距离的至少一个线圈的第一侧上方。 屏蔽层位于至少一个线圈的第一侧和盖板之间，并具有顶面。 顶表面接触盖板，并且包括形成混合物的液体和气体，并使顶表面具有基本恒定的温度。
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公开(公告)号：US07477358B2
公开(公告)日：2009-01-13
申请号：US11238237
申请日：2005-09-28
CPC分类号： G03F7/70741
摘要： An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.
摘要翻译： 公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。 外壳包括第一和第二部分，其在处理，检查，存储和运输期间形成围绕保护的掩模版的外壳。 外壳与加热器和散热器一起提供封闭的掩模版的热泳保护。
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公开(公告)号：US06953109B2
公开(公告)日：2005-10-11
申请号：US10267489
申请日：2002-10-08
IPC分类号： F16F9/02 , F16F15/023 , F16F7/10
CPC分类号： F16F15/0232 , F16F9/02
摘要： A vibration isolator (200) for isolating a first assembly (202) from vibration from a second assembly (204) includes a housing (206) that is secured to the second assembly (204) and a pendulum assembly (208). The pendulum assembly (208) includes one or more pistons (226) and a connector assembly (224). The piston (226) is coupled to the first assembly (202). The connector assembly (224) couples the piston (226) to the housing (206) and allows the piston (226) to swing laterally relative to the housing (206). The vibration isolator (200) can also include a pendulum support (264) and/or a mover (580) that moves the piston (226) and assists in supporting the load of the first assembly (202).
摘要翻译： 用于将第一组件（202）与来自第二组件（204）的振动隔离的隔振器（200）包括固定到第二组件（204）和摆锤组件（208）的壳体（206）。 摆锤组件（208）包括一个或多个活塞（226）和连接器组件（224）。 活塞（226）联接到第一组件（202）。 连接器组件（224）将活塞（226）联接到壳体（206）并允许活塞（226）相对于壳体（206）横向摆动。 隔振器（200）还可以包括使活塞（226）移动并有助于支撑第一组件（202）的负载的摆动支撑件（264）和/或移动器（580）。
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7.发明授权Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs) 有权利用原位测量技术结合热电芯片（TEC）的方法和装置公开(公告)号：US08794011B2
公开(公告)日：2014-08-05
申请号：US13270522
申请日：2011-10-11
申请人： Alton H. Phillips , Akio Ohta , Douglas C. Watson
发明人： Alton H. Phillips , Akio Ohta , Douglas C. Watson
IPC分类号： F25B21/02
CPC分类号： G01J5/0275 , G01J2005/0077 , G03F7/70875
摘要： According to one aspect of the present invention, an apparatus includes a surface and a first array. The surface emits radiation, and the first array is arranged over the surface and arranged to provide cooling to the surface, the first array including a plurality of TECs. At least a first sensing arrangement is substantially integrated with the first array, wherein the first sensing arrangement is arranged to make a non-contact measurement associated with the surface. The apparatus also includes a controller arranged to obtain the non-contact measurement and to use the non-contact measurement to control the cooling provided by the first array.
摘要翻译： 根据本发明的一个方面，一种装置包括表面和第一阵列。 表面发射辐射，并且第一阵列布置在表面上并且布置成向表面提供冷却，第一阵列包括多个TEC。 至少第一感测装置基本上与第一阵列一体化，其中第一感测装置布置成进行与表面相关联的非接触测量。 该装置还包括控制器，其布置成获得非接触式测量并使用非接触测量来控制第一阵列所提供的冷却。
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公开(公告)号：US20120120379A1
公开(公告)日：2012-05-17
申请号：US13090183
申请日：2011-04-19
IPC分类号： G03B27/68
CPC分类号： F28F3/12 , F28D2021/0077 , G03F7/70783 , G03F7/70875
摘要： An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226) includes a state observer (250) and a controller (260). The state observer (250) estimates an estimated physical condition (250C) of the reticle (28). The controller (260) controls the adjuster elements (258E) of the temperature adjuster (258) based at least in part on the estimated physical condition (250C).
摘要翻译： 用于控制掩模版（28）的变形的装置包括温度调节器（258）和控制系统（226）。 温度调节器（258）包括分别调节掩模版（28）的多个区域（28R）的温度的多个调节元件（258E）。 控制系统（226）包括状态观察器（250）和控制器（260）。 状态观察器（250）估计掩模版（28）的估计的物理条件（250℃）。 控制器（260）至少部分地基于估计的身体状况（250C）来控制温度调节器（258）的调节器元件（258E）。
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公开(公告)号：US07804583B2
公开(公告)日：2010-09-28
申请号：US12242050
申请日：2008-09-30
CPC分类号： G03F7/70741
摘要： An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.
摘要翻译： 公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。 外壳包括第一和第二部分，其在处理，检查，存储和运输期间形成围绕保护的掩模版的外壳。 公开了一种用于将掩模版从暴露室外的位置传送到曝光位置的方法，包括使用负载锁定室的方法。
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公开(公告)号：US07773198B2
公开(公告)日：2010-08-10
申请号：US11655674
申请日：2007-01-19
申请人： Alton H. Phillips
发明人： Alton H. Phillips
CPC分类号： G03B27/42 , G03F1/66 , G03F7/70866
摘要： A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the device container (246) includes a fluid port (254) that allows for the flow of fluid (276) into and out of the device container (246). The shield assembly (250) is encircled by the device container (246). Further, the shield assembly (250) is positioned between the fluid port (254) and the reticle (26) when the reticle (26) is positioned within the device container (246). The shield assembly (250) can inhibit contaminants (278) near the fluid port (254) from being deposited on the reticle (26) and can maintain the integrity of the reticle (26).
摘要翻译： 用于存储掩模版（26）的装置容器组件（30）包括装置容器（246）和屏蔽组件（250）。 装置容器（246）围绕标线（26）。 此外，装置容器（246）包括允许流体（276）流入和流出装置容器（246）的流体端口（254）。 屏蔽组件（250）被设备容器（246）包围。 此外，当标线片（26）位于装置容器（246）内时，屏蔽组件（250）定位在流体端口（254）和光罩（26）之间。 屏蔽组件（250）可以抑制流体端口（254）附近的污染物（278）沉积在掩模版（26）上并且可以保持掩模版（26）的完整性。
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