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    Positive-working light sensitive diazo materials with azo dye
    4.
    发明授权
    Positive-working light sensitive diazo materials with azo dye 失效
    正色工作的光敏重氮材料与偶氮染料

    公开(公告)号：US4296194A

    公开(公告)日：1981-10-20

    申请号：US122190

    申请日：1980-02-19

    申请人： Terence Harper ,  Allen P. Gates

    发明人： Terence Harper ,  Allen P. Gates

    IPC分类号： G03F7/105 ,  G03C1/60 ,  G03C1/54

    CPC分类号： G03F7/105

    摘要： A positive working light-sensitive composition comprises in admixture (a) a first component which is an azo dye formed by reacting a p-amino-benzene diazonium salt and a compound including the grouping ##STR1## and (b) a second component which includes a o-quinone diazide and/or a diazonium compound and which, on exposure to light produces an acidic light decomposition product which is capable of reacting with the azo dye to produce a material having a color different to that of the azo dye. The composition exhibits a color change on exposure to light and is useful for the manufacture of light sensitive plates for use in lithographic printing plate production.

    摘要翻译： 正性工作的感光性组合物包含（a）第一组分，其是通过使对氨基苯重氮盐和包含分组的化合物（IMAGE）反应形成的偶氮染料和（b）第二组分，其包括 一种邻醌二叠氮化物和/或重氮化合物，并且在暴露于光时产生酸性光分解产物，其能够与偶氮染料反应以产生具有与偶氮染料不同的颜色的材料。 该组合物在曝光时显示出颜色变化，并且可用于制造用于平版印刷版生产的光敏板。

    Radiation-sensitive plates formed using diazonium salts
    5.
    发明授权
    Radiation-sensitive plates formed using diazonium salts 失效
    使用重氮盐形成的辐射敏感板

    公开(公告)号：US4595648A

    公开(公告)日：1986-06-17

    申请号：US649486

    申请日：1984-09-11

    申请人： Michael Stanton ,  Allen P. Gates ,  Rodney M. Potts

    发明人： Michael Stanton ,  Allen P. Gates ,  Rodney M. Potts

    IPC分类号： G03F7/016 ,  G03C1/54

    CPC分类号： G03F7/016

    摘要： A radiation sensitive compound contains at least two groups having the structure ##STR1## in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X' which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X' is an imino group; Y represents O or S; R represents a single bond or a divalent or other polyvalent radical and A.sup.- is an anion. Radiation sensitive compositions comprising the compound and optionally a resin may be used to produce radiation sensitive plates for lithographic printing plate production.

    摘要翻译： 辐射敏感性化合物含有至少两个具有结构的基团，其中Ar表示衍生自芳族或杂芳族化合物的二价或其它多价基团; X和X'可以相同或不同，各自表示O，S或亚氨基，条件是X和X'中的至少一个是亚氨基; Y表示O或S; R表示单键或二价或其它多价基团，A-表示阴离子。 可以使用包含该化合物和任选的树脂的辐射敏感组合物来生产用于平版印刷版生产的辐射敏感板。

    Light-sensitive materials
    8.
    发明授权
    Light-sensitive materials 失效
    感光材料

    公开(公告)号：US4254244A

    公开(公告)日：1981-03-03

    申请号：US866829

    申请日：1978-01-04

    申请人： Allen P. Gates ,  Allan Saunderson

    发明人： Allen P. Gates ,  Allan Saunderson

    IPC分类号： C08F8/36 ,  C08G85/00 ,  C08F261/02 ,  C08F261/04 ,  C08F283/10

    CPC分类号： C08G85/004

    摘要： A light sensitive material suitable for coating onto a support to produce a light sensitive plate for use in, for example, the manufacture of a printing plate comprises groups of the formula: ##STR1## attached to carbon atoms, wherein ##STR2## wherein R.sub.5 represents a hydrogen atom or an alkyl group; R is an aromatic radical; a is zero or unity; R.sub.1, R.sub.2 and R.sub.3 are hydrogen atoms, halogen atoms, cyano groups, or specified aliphatic or aromatic groups; X is a deactivating group; R.sub.4 is a hydrogen atom, a carboxyl group, a cyano group or a specified aliphatic or aromatic group; and Ph is a phenyl group. The material may be produced by reacting a polymer containing epoxide groups, hydroxyl groups, or primary and/or secondary amino groups with the halosulphonyl group of a compound having the forula: ##STR3## wherein R, R.sub.1, R.sub.2 R.sub.3, and a have the above meanings, wherein X has the above meaning or is a halosulphonyl group and R.sub.4 has the above mentioned meaning or, in the case where X is a deactivating group, is a halosulphonyl substituted group.

    摘要翻译： 适用于涂覆在支撑体上以产生用于例如印刷板的制造的光敏板的感光材料包括与碳原子连接的下列基团：其中或 >其中R5表示氢原子或烷基; R是芳族基团; a是零或统一; R1，R2和R3是氢原子，卤素原子，氰基或特定的脂族或芳族基团; X是失活组; R4是氢原子，羧基，氰基或规定的脂族或芳族基团; Ph为苯基。 该材料可以通过使含有环氧基，羟基或伯和/或仲氨基的聚合物与具有所述基团的化合物的卤代磺酰基反应来制备：其中R，R 1，R 2，R 3和 上述含义，其中X具有上述含义或为卤素磺酰基，且R4具有上述含义，或在X为失活基团的情况下为卤代磺酰基取代基。