Coated article with silicon oxynitride adjacent glass
    6.
    发明授权
    Coated article with silicon oxynitride adjacent glass 有权
    涂有氮氧化硅相邻玻璃的涂层制品

    公开(公告)号:US07267879B2

    公开(公告)日:2007-09-11

    申请号:US10636918

    申请日:2003-08-08

    IPC分类号: B32B17/06

    摘要: A low-E coated article is provided, in certain example embodiments, with a layer including silicon oxynitride adjacent the glass substrate in order to improve chemical and/or mechanical durability of the coated article. In certain example embodiments, the coated article may be formed so as to have a fairly high visible transmission (TY or Tvis) to sheet resistance (Rs) ratio (i.e., a ratio Tvis/Rs). The higher this ratio, the better the coated article's combined functionality of providing for both good solar performance (e.g., ability to reflect and/or absorb IR radiation) and high visible transmission. Coated articles herein may be used in the context of insulating glass (IG) window units, architectural or residential monolithic window units, vehicle window units, and/or the like.

    摘要翻译: 在某些示例性实施方案中,提供低E涂层制品,其中包含邻近玻璃基底的氮氧化硅层,以改善涂覆制品的化学和/或机械耐久性。 在某些示例性实施例中,涂覆制品可以形成为具有相当高的可见透射率(TY或T vis)与薄层电阻(R SUB)之比(即 ,比例比例)。 该比例越高,涂层制品提供良好的太阳能性能(例如,反射和/或吸收IR辐射的能力)和高可见透射率的组合功能越好。 本文中的涂层制品可用于中空玻璃(IG)窗单元,建筑或住宅单片窗单元,车窗单元等的上下文中。

    Sputtering apparatus with rotating target and target cooling
    10.
    发明授权
    Sputtering apparatus with rotating target and target cooling 失效
    具有旋转目标和目标冷却的溅射装置

    公开(公告)号:US5262032A

    公开(公告)日:1993-11-16

    申请号:US918142

    申请日:1992-07-23

    IPC分类号: C23C14/34 H01J37/34

    摘要: A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).

    摘要翻译: 提出了一种溅射装置,特别是具有磁控管阴极和旋转靶(1)的溅射装置,并且由液体冷却剂(优选水)进行目标冷却,其中提供用于使冷却集中在旋转的区域或区域上 暴露于由等离子体(12)产生的热的靶(1)和磁体组件(23)的磁体(28,29,30,31)形成至少一个冷却通道(34,35)。