公开(公告)号：US20220314397A1

公开(公告)日：2022-10-06

申请号：US17849576

申请日：2022-06-24

申请人： Applied Materials, Inc.

发明人： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D`Ambra

IPC分类号： B24B53/017

摘要： A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US20210394540A1

公开(公告)日：2021-12-23

申请号：US16909947

申请日：2020-06-23

申请人： Applied Materials, Inc.

发明人： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Allen L. D`Ambra

IPC分类号： B41J29/17 ,  B41J11/36

摘要： In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

公开(公告)号：US20210402565A1

公开(公告)日：2021-12-30

申请号：US17344617

申请日：2021-06-10

申请人： Applied Materials, Inc.

发明人： Roy C. Nangoy ,  Shantanu Rajiv Gadgil ,  Nathan Arron Davis ,  Allen L. D`Ambra ,  Michael J. Coughlin ,  Sumit Subhash Patankar

IPC分类号： B24B57/02 ,  B24B53/017 ,  B24B37/34

摘要： A polishing assembly includes a rotatable platen to support a polishing pad, a polishing liquid delivery arm having an enclosure open at a bottom thereof and one or more ports to deliver a polishing liquid and a cleaning fluid downwardly through an interior space of the enclosure onto the polishing pad, and a delivery arm cleaning tool removably attached to the polishing liquid delivery arm, the cleaning tool extending below the delivery arm and having a delivery arm-facing surface shaped such that the cleaning tool directs the cleaning fluid from the polishing liquid delivery arm on to a surface of the enclosure of the polishing liquid delivery arm.

公开(公告)号：US11545371B2

公开(公告)日：2023-01-03

申请号：US16909947

申请日：2020-06-23

申请人： Applied Materials, Inc.

发明人： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Allen L. D'Ambra

IPC分类号： H01L21/67 ,  B24B37/27 ,  B08B3/00 ,  B08B1/04 ,  B24B37/34 ,  B24B37/12 ,  B24B57/00 ,  H01L21/306 ,  B24B55/04 ,  H01L21/304

摘要： In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

公开(公告)号：US11484987B2

公开(公告)日：2022-11-01

申请号：US16813275

申请日：2020-03-09

申请人： Applied Materials, Inc.

发明人： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D'Ambra

IPC分类号： B24B53/017 ,  B24B37/34 ,  C09D5/00 ,  B65D81/32 ,  B65D47/42 ,  B05C17/00 ,  B05D1/28 ,  B05D5/08

摘要： Chemically impregnated applicators used to provide hydrophobic surfaces on chemical mechanical polishing system components and related application methods. A method of forming a hydrophobic coating on a surface of a polishing system component includes cleaning the surface of the polishing system component to remove a polishing fluid residue therefrom and applying a hydrophobicity causing chemical solution to the surface of the polishing system component.

公开(公告)号：US11370083B2

公开(公告)日：2022-06-28

申请号：US16932628

申请日：2020-07-17

申请人： Applied Materials, Inc

发明人： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D'Ambra

IPC分类号： B24B53/017

摘要： A pad conditioner head cleaning tool has a first clamp configured to removably engage a first portion of a sponge against an outer surface of a disk-shaped pad conditioner head at a first location, a second clamp configured to removable engage a second portion of the sponge against the outer surface of the disk-shaped pad conditioner head at a second location, and an arm coupling the first clamp to the second clamp. The arm is sufficiently flexible to permit the first clamp and the second clamp to be separated to fit around the disk-shaped pad conditioner head and sufficiently tensile to bias the first clamp and the second clamp inwardly to press the sponge against an outer surface of a pad conditioner head.

公开(公告)号：US20210402561A1

公开(公告)日：2021-12-30

申请号：US16932628

申请日：2020-07-17

申请人： Applied Materials, Inc.

发明人： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D`Ambra

IPC分类号： B24B53/017

摘要： A pad conditioner head cleaning tool has a first clamp configured to removably engage a first portion of a sponge against an outer surface of a disk-shaped pad conditioner head at a first location, a second clamp configured to removable engage a second portion of the sponge against the outer surface of the disk-shaped pad conditioner head at a second location, and an arm coupling the first clamp to the second clamp. The arm is sufficiently flexible to permit the first clamp and the second clamp to be separated to fit around the disk-shaped pad conditioner head and sufficiently tensile to bias the first clamp and the second clamp inwardly to press the sponge against an outer surface of a pad conditioner head.