公开(公告)号：US20180351164A1

公开(公告)日：2018-12-06

申请号：US15570988

申请日：2015-05-15

Applicant: Applied Materials, Inc.

Inventor： Anke HELLMICH ,  Thomas Werner ZILBAUER ,  Jose Manuel DIEGUEZ-CAMPO ,  Stefan KELLER ,  Georg JOST

IPC: H01M4/1395 ,  H01M4/04 ,  H01M4/38 ,  H01M4/40 ,  H01M10/052 ,  H01M6/40

CPC classification number: H01M4/1395 ,  H01M4/0423 ,  H01M4/0426 ,  H01M4/382 ,  H01M4/405 ,  H01M6/40 ,  H01M10/052 ,  H01M10/0585

Abstract: The present disclosure provides a masking device for use in a lithium deposition process in the manufacturing of thin film batteries. The masking device includes a mask portion made of a metal or metal alloy, and one or more openings in the mask portion, wherein the one or more openings are configured to allow particles of a deposition material to pass through the mask portion, and wherein a size of each opening of the one or more openings, is at least 0.5 cm2.

公开(公告)号：US20180135160A1

公开(公告)日：2018-05-17

申请号：US15852820

申请日：2017-12-22

Applicant: Applied Materials, Inc.

Inventor： Frank SCHNAPPENBERGER ,  Anke HELLMICH ,  Thomas KOCH ,  Thomas DEPPISCH

IPC: C23C14/00 ,  C23C14/54 ,  H01J37/32

CPC classification number: C23C14/0042 ,  C23C14/544 ,  H01J37/32449 ,  H01J37/32981 ,  H01J37/3299

Abstract: A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.

公开(公告)号：US20220246411A1

公开(公告)日：2022-08-04

申请号：US17617555

申请日：2019-06-24

Applicant: Applied Materials, Inc.

Inventor： Anke HELLMICH

IPC: H01J37/34 ,  C23C14/35 ,  C23C14/08

Abstract: A method of depositing a material on a substrate is described. The method includes sputtering at least a component of the material from a first rotary target with a first magnet assembly and a second rotary target with a second magnet assembly. The first magnet assembly within the first rotary target provides a first plasma confinement in a first direction facing towards the second rotary target. The second magnet assembly within the second rotary target provides a second plasma confinement in a second direction facing towards the first rotary target.