公开(公告)号：US11860528B2

公开(公告)日：2024-01-02

申请号：US17129077

申请日：2020-12-21

Applicant: Applied Materials, Inc.

Inventor： Ribhu Gautam ,  Vibhu Jindal ,  Sanjay Bhat ,  Praveen Kumar Choragudi ,  Vinodh Ramachandran ,  Arun Rengaraj

IPC: H01L21/67 ,  G03F1/24 ,  H01L21/687 ,  B65G47/90 ,  C23C14/06 ,  C23C14/56 ,  C23C14/58 ,  C23C14/35

CPC classification number: G03F1/24 ,  B65G47/90 ,  C23C14/0641 ,  C23C14/35 ,  C23C14/566 ,  C23C14/568 ,  C23C14/5806 ,  H01L21/67167 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/68707 ,  H01L21/68742 ,  H01L21/68764

Abstract: Substrate processing systems or platforms and methods configured to process substrates including of extreme ultraviolet (EUV) mask blanks are disclosed. Systems or platforms provide a small footprint, high throughput of substrates and minimize defect generation. The substrate processing system platform comprises a single central transfer chamber, a single transfer robot, a substrate flipping fixture, and processing chambers are positioned around the single central transfer chamber.

公开(公告)号：US20220197128A1

公开(公告)日：2022-06-23

申请号：US17129077

申请日：2020-12-21

Applicant: Applied Materials, Inc.

Inventor： Ribhu Gautam ,  Vibhu Jindal ,  Sanjay Bhat ,  Praveen Kumar Choragudi ,  Vinodh Ramachandran ,  Arun Rengaraj

IPC: G03F1/24 ,  H01L21/67 ,  H01L21/687 ,  C23C14/06 ,  C23C14/56 ,  C23C14/58 ,  C23C14/35 ,  B65G47/90

Abstract: Substrate processing systems or platforms and methods configured to process substrates including of extreme ultraviolet (EUV) mask blanks are disclosed. Systems or platforms provide a small footprint, high throughput of substrates and minimize defect generation. The substrate processing system platform comprises a single central transfer chamber, a single transfer robot, a substrate flipping fixture, and processing chambers are positioned around the single central transfer chamber.