公开(公告)号：US11625811B2

公开(公告)日：2023-04-11

申请号：US17216459

申请日：2021-03-29

Applicant: Applied Materials, Inc.

Inventor： Abhinav Kumar ,  Benjamin Schwarz ,  Charles Hardy

IPC: G06T3/40 ,  G06N3/08 ,  G06N20/00 ,  G06K9/00 ,  G06T7/62 ,  G06T5/50

Abstract: A method includes determining a plurality of features of a first original image of a first product that are expected to be different for one or more products to be produced via manufacturing parameters of a manufacturing process compared to the first product. The method further includes adjusting one or more of the plurality of features of the first original image to generate a first synthetic image. The method further includes providing a plurality of images including the first original image and the first synthetic image to train a machine learning model to generate a trained machine learning model configured to generate output associated with updating the manufacturing parameters of the manufacturing process.

公开(公告)号：US10460968B2

公开(公告)日：2019-10-29

申请号：US14094601

申请日：2013-12-02

Applicant: APPLIED MATERIALS, INC.

Inventor： Chih-Hsun Hsu ,  Tza-Jing Gung ,  Benjamin Schwarz ,  Shahid Rauf ,  Ankur Agarwal ,  Vijay D. Parkhe ,  Michael D. Willwerth ,  Zhiqiang Guo

IPC: H01L21/67 ,  H01L21/683 ,  H01J37/32

Abstract: Electrostatic chucks with variable pixelated magnetic field are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A plurality of electromagnets is disposed in the base, the plurality of electromagnets configured to provide pixelated magnetic field tuning capability for the ESC.

公开(公告)号：US11264252B2

公开(公告)日：2022-03-01

申请号：US16561907

申请日：2019-09-05

Applicant: Applied Materials, Inc.

Inventor： Michael D. Willwerth ,  Jeffrey Ludwig ,  Benjamin Schwarz ,  Roberto Cesar Cotlear

IPC: H01L21/67 ,  H01J37/32

Abstract: Implementations described herein provide a chamber lid assembly. In one embodiment, a chamber lid assembly includes a heater embedded in a dielectric body forming a boundary of a processing chamber, wherein the heater has one or more heating zones that are independently controlled.

公开(公告)号：US20200013661A1

公开(公告)日：2020-01-09

申请号：US16576645

申请日：2019-09-19

Applicant: Applied Materials, Inc.

Inventor： Chih-Hsun Hsu ,  Tza-Jing Gung ,  Benjamin Schwarz ,  Shahid Rauf ,  Ankur Agarwal ,  Vijay D. Parkhe ,  Michael D. Willwerth ,  Zhiqiang Guo

IPC: H01L21/683

Abstract: Electrostatic chucks with variable pixelated magnetic field are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A plurality of electromagnets is disposed in the base, the plurality of electromagnets configured to provide pixelated magnetic field tuning capability for the ESC.

公开(公告)号：US20130288037A1

公开(公告)日：2013-10-31

申请号：US13749600

申请日：2013-01-24

Applicant: APPLIED MATERIALS, INC.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Ren-Guan Duan ,  Benjamin Schwarz

IPC: C04B35/505 ,  C04B35/628

CPC classification number: C04B35/505 ,  C04B35/62884 ,  C04B2235/3217 ,  C04B2235/3244 ,  C23C4/11 ,  C23C4/134 ,  C23C24/04 ,  H01J37/32082 ,  Y02T50/6765 ,  Y10T428/24997

Abstract: In an optimized method to apply a plasma sprayed coating of a yttrium containing oxide onto an article, a plasma power of between about 89-91 kW is selected for a plasma spraying system. Gas is flowed through the plasma spraying system at a selected gas flow rate of about 115-130 L/min. Ceramic powder comprising a yttrium containing oxide is fed into the plasma spraying system at a selected powder feed rate of about 10-30 g/min. A yttrium dominant ceramic coating is then formed on the article based on the selected power, the selected gas flow rate and the selected powder feed rate.

Abstract translation: 在将含有钇的氧化物的等离子喷涂涂层施加到制品上的优化方法中，等离子体喷涂系统选择约89-91kW的等离子体功率。 气体以约115-130L / min的选定气体流速流过等离子喷涂系统。 包含含钇氧化物的陶瓷粉末以约10-30g / min的选定的粉末进料速率进料到等离子喷涂系统中。 然后基于所选择的功率，所选择的气体流速和所选择的粉末进料速率，在制品上形成钇优势陶瓷涂层。

公开(公告)号：US10790180B2

公开(公告)日：2020-09-29

申请号：US16576645

申请日：2019-09-19

Applicant: Applied Materials, Inc.

Inventor： Chih-Hsun Hsu ,  Tza-Jing Gung ,  Benjamin Schwarz ,  Shahid Rauf ,  Ankur Agarwal ,  Vijay D. Parkhe ,  Michael D. Willwerth ,  Zhiqiang Guo

IPC: H01L21/683 ,  H01J37/32

Abstract: Electrostatic chucks with variable pixelated magnetic field are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A plurality of electromagnets is disposed in the base, the plurality of electromagnets configured to provide pixelated magnetic field tuning capability for the ESC.

公开(公告)号：US10515862B2

公开(公告)日：2019-12-24

申请号：US15480337

申请日：2017-04-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonard Tedeschi ,  Benjamin Schwarz ,  Changhun Lee ,  Ping Han Hsieh ,  Adauto Diaz ,  Daniel T. McCormick

IPC: H01L23/58 ,  H01L21/66 ,  H01L21/67 ,  H01L23/522 ,  H01L23/64

Abstract: Embodiments may also include a residual chemical reaction diagnostic device. The residual chemical reaction diagnostic device may include a substrate and a residual chemical reaction sensor formed on the substrate. In an embodiment, the residual chemical reaction sensor provides electrical outputs in response to the presence of residual chemical reactions. In an embodiment, the substrate is a device substrate, and the sensor is formed in a scribe line of the device substrate. In an alternative embodiment, the substrate is a process development substrate. In some embodiments, the residual chemical reaction sensor includes, a first probe pad, wherein a plurality of first arms extend out from the first probe pad, and a second probe pad, wherein a plurality of second arms extend out from the second probe pad and are interdigitated with the first arms.

公开(公告)号：US20150218057A1

公开(公告)日：2015-08-06

申请号：US14687615

申请日：2015-04-15

Applicant: Applied Materials, Inc.

Inventor： Ren-Guan Duan ,  Thorsten Lill ,  Jennifer Y. Sun ,  Benjamin Schwarz

IPC: C04B41/00 ,  F27D15/02 ,  F27D19/00 ,  F27D9/00 ,  H01J37/32 ,  F27D7/06

CPC classification number: C04B41/0072 ,  C04B35/111 ,  C04B35/14 ,  C04B35/44 ,  C04B35/46 ,  C04B35/486 ,  C04B35/505 ,  C04B35/5611 ,  C04B35/5622 ,  C04B35/565 ,  C04B35/58014 ,  C04B35/581 ,  C04B35/584 ,  C04B41/009 ,  C04B41/80 ,  C04B2235/3225 ,  C04B2235/6562 ,  C04B2235/6567 ,  C04B2235/658 ,  C04B2235/6581 ,  C04B2235/662 ,  C04B2235/76 ,  C04B2235/764 ,  C04B2235/785 ,  C04B2235/963 ,  F27D7/06 ,  F27D9/00 ,  F27D15/02 ,  F27D19/00 ,  F27D2007/063 ,  F27D2009/007 ,  F27D2019/0028 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/3288 ,  H01J2237/334 ,  H01L21/67069 ,  Y10T428/24355 ,  Y10T428/24372 ,  C04B35/00 ,  C04B41/4515 ,  C04B41/4517

Abstract: A machined ceramic article having an initial surface defect density and an initial surface roughness is provided. The machined ceramic article is heated to a temperature range between about 1000° C. and about 1800° C. at a ramping rate of about 0.1° C. per minute to about 20° C. per minute. The machined ceramic article is heat-treated in air atmosphere. The machined ceramic article is heat treated at one or more temperatures within the temperature range for a duration of up to about 24 hours. The machined ceramic article is then cooled at the ramping rate, wherein after the heat treatment the machined ceramic article has a reduced surface defect density and a reduced surface roughness.

Abstract translation: 提供具有初始表面缺陷密度和初始表面粗糙度的加工陶瓷制品。 将加工的陶瓷制品以约0.1℃/分钟至约20℃/分钟的升温速率加热至约1000℃至约1800℃的温度范围。 机加工的陶瓷制品在大气中进行热处理。 机加工的陶瓷制品在一个或多个温度范围内在高达约24小时的时间内进行热处理。 然后将加工的陶瓷制品以斜坡率进行冷却，其中在热处理后，机加工的陶瓷制品具有降低的表面缺陷密度和降低的表面粗糙度。

公开(公告)号：US09034199B2

公开(公告)日：2015-05-19

申请号：US13659813

申请日：2012-10-24

Applicant: Applied Materials, Inc.

Inventor： Ren-Guan Duan ,  Thorsten Lill ,  Jennifer Y. Sun ,  Benjamin Schwarz

IPC: B44C1/22 ,  C04B41/00 ,  H01L21/67 ,  C04B35/111 ,  C04B35/14 ,  C04B35/44 ,  C04B35/46 ,  C04B35/486 ,  C04B35/505 ,  C04B35/56 ,  C04B35/565 ,  C04B35/58 ,  C04B35/581 ,  C04B35/584 ,  C04B41/80

CPC classification number: C04B41/0072 ,  C04B35/111 ,  C04B35/14 ,  C04B35/44 ,  C04B35/46 ,  C04B35/486 ,  C04B35/505 ,  C04B35/5611 ,  C04B35/5622 ,  C04B35/565 ,  C04B35/58014 ,  C04B35/581 ,  C04B35/584 ,  C04B41/009 ,  C04B41/80 ,  C04B2235/3225 ,  C04B2235/6562 ,  C04B2235/6567 ,  C04B2235/658 ,  C04B2235/6581 ,  C04B2235/662 ,  C04B2235/76 ,  C04B2235/764 ,  C04B2235/785 ,  C04B2235/963 ,  F27D7/06 ,  F27D9/00 ,  F27D15/02 ,  F27D19/00 ,  F27D2007/063 ,  F27D2009/007 ,  F27D2019/0028 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/3288 ,  H01J2237/334 ,  H01L21/67069 ,  Y10T428/24355 ,  Y10T428/24372 ,  C04B35/00 ,  C04B41/4515 ,  C04B41/4517

Abstract: A machined ceramic article having an initial surface defect density and an initial surface roughness is provided. The machined ceramic article is heated to a temperature range between about 1000° C. and about 1800° C. at a ramping rate of about 0.1° C. per minute to about 20° C. per minute. The machined ceramic article is heat-treated in air atmosphere. The machined ceramic article is heat treated at one or more temperatures within the temperature range for a duration of up to about 24 hours. The machined ceramic article is then cooled at the ramping rate, wherein after the heat treatment the machined ceramic article has a reduced surface defect density and a reduced surface roughness.

Abstract translation: 提供具有初始表面缺陷密度和初始表面粗糙度的加工陶瓷制品。 将加工的陶瓷制品以约0.1℃/分钟至约20℃/分钟的升温速率加热至约1000℃至约1800℃的温度范围。 机加工的陶瓷制品在大气中进行热处理。 机加工的陶瓷制品在一个或多个温度范围内在高达约24小时的时间内进行热处理。 然后将加工的陶瓷制品以斜坡率进行冷却，其中在热处理后，机加工的陶瓷制品具有降低的表面缺陷密度和降低的表面粗糙度。

公开(公告)号：US11227193B2

公开(公告)日：2022-01-18

申请号：US17216449

申请日：2021-03-29

Applicant: Applied Materials, Inc.

Inventor： Abhinav Kumar ,  Benjamin Schwarz ,  Charles Hardy

IPC: G06K9/62 ,  G06N3/08 ,  G06N20/00 ,  G06T5/00 ,  G06K9/80 ,  G06T5/50

Abstract: A method includes providing attributes of a manufacturing process and an image of a product associated with the manufacturing process to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, predictive data. The method further includes determining, based on the predictive data, image measurements of the image of the product associated with the manufacturing process. Manufacturing parameters of the manufacturing process are to be updated based on the image measurements.