公开(公告)号：US11764069B2

公开(公告)日：2023-09-19

申请号：US17335868

申请日：2021-06-01

Applicant: Applied Materials, Inc.

Inventor： Jimin Zhang ,  Brian J. Brown ,  Eric Lau ,  Ekaterina Mikhaylichenko ,  Jeonghoon Oh ,  Gerald J. Alonzo

IPC: H01L21/321 ,  B24B37/10 ,  H01L21/306 ,  B24B37/04

CPC classification number: H01L21/3212 ,  B24B37/042 ,  B24B37/107 ,  H01L21/30625

Abstract: Certain aspects of the present disclosure provide techniques for a method of removing material on a substrate. An exemplary method includes rotating a substrate about a first axis in a first direction and urging a surface of the substrate against a polishing surface of a polishing pad while rotating the substrate, wherein rotating the substrate about the first axis includes rotating the substrate a first angle at a first rotation rate, and then rotating the substrate a second angle at a second rotation rate, and the first rotation rate is different from the second rotation rate.

公开(公告)号：US11717936B2

公开(公告)日：2023-08-08

申请号：US16552901

申请日：2019-08-27

Applicant: Applied Materials, Inc.

Inventor： Dmitry Sklyar ,  Jeonghoon Oh ,  Gerald J. Alonzo ,  Jonathan Domin ,  Steven M. Zuniga ,  Jay Gurusamy

IPC: B24B49/04 ,  H01L21/321 ,  H01L21/67 ,  B24B37/005 ,  B24B57/04

CPC classification number: B24B49/04 ,  B24B37/005 ,  B24B57/04 ,  H01L21/3212 ,  H01L21/67092

Abstract: Embodiments of the present disclosure generally provide methods, polishing systems with computer readable medium having the methods stored thereon, to facilitate consistent tensioning of a polishing article disposed on a web-based polishing system. In one embodiment, a substrate processing method includes winding a used portion of a polishing article onto a take-up roll of a polishing system by rotating a first spindle having the take-up roll disposed thereon; measuring, using an encoder wheel, a polishing article advancement length of the used portion of the polishing article wound onto the take-up roll; determining a tensioning torque to apply to a supply roll using the measured polishing article advancement length; and tensioning the polishing article by applying the tensioning torque to the supply roll.