公开(公告)号：US11833637B2

公开(公告)日：2023-12-05

申请号：US17360907

申请日：2021-06-28

Applicant: Applied Materials, Inc.

Inventor： Hari Soundararajan ,  Shou-Sung Chang ,  Calvin Lee ,  Jonathan P. Domin ,  Shuchivrat Datar ,  Dmitry Sklyar ,  Paul D. Butterfield ,  Chad Pollard ,  Haosheng Wu

IPC: B24B37/015 ,  B24B37/04 ,  F22B35/00

CPC classification number: B24B37/015 ,  B24B37/042 ,  F22B35/00

Abstract: A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.

公开(公告)号：US11693435B2

公开(公告)日：2023-07-04

申请号：US17356287

申请日：2021-06-23

Applicant: Applied Materials, Inc.

Inventor： Ricardo Martinez ,  Hung Xuan Hoang ,  Dmitry Sklyar ,  Farooq Aleem ,  Jagan Rangarajan ,  William Wadsworth ,  Brett Hoogensen

IPC: G05D7/06 ,  G05B19/042

CPC classification number: G05D7/0676 ,  G05B19/042 ,  G05B2219/45096

Abstract: In a substrate processing system, such as a chemical mechanical system, updated controller configuration data is obtained for a plurality of liquid flow controllers of the substrate processing system. Each of a plurality of liquid flow controllers (LFCs) coupled to an Ethernet for Control Automation Technology (EtherCAT) bus automatically downloads a copy of the updated controller configuration data through the EtherCAT bus. Each of the plurality of liquid flow controllers controls fluid flow of a separate fluid line from a plurality of fluid lines in the substrate processing system, fluid flow through the plurality of fluid lines is controlled using the plurality of liquid flow controllers having the updated controller configuration data.

公开(公告)号：US11801582B2

公开(公告)日：2023-10-31

申请号：US17360907

申请日：2021-06-28

Applicant: Applied Materials, Inc.

Inventor： Hari Soundararajan ,  Shou-Sung Chang ,  Calvin Lee ,  Jonathan P. Domin ,  Shuchivrat Datar ,  Dmitry Sklyar ,  Paul D. Butterfield ,  Chad Pollard ,  Haosheng Wu

IPC: B24B37/015 ,  B24B37/04 ,  F22B35/00

CPC classification number: B24B37/015 ,  B24B37/042 ,  F22B35/00

Abstract: A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.

公开(公告)号：US11717936B2

公开(公告)日：2023-08-08

申请号：US16552901

申请日：2019-08-27

Applicant: Applied Materials, Inc.

Inventor： Dmitry Sklyar ,  Jeonghoon Oh ,  Gerald J. Alonzo ,  Jonathan Domin ,  Steven M. Zuniga ,  Jay Gurusamy

IPC: B24B49/04 ,  H01L21/321 ,  H01L21/67 ,  B24B37/005 ,  B24B57/04

CPC classification number: B24B49/04 ,  B24B37/005 ,  B24B57/04 ,  H01L21/3212 ,  H01L21/67092

Abstract: Embodiments of the present disclosure generally provide methods, polishing systems with computer readable medium having the methods stored thereon, to facilitate consistent tensioning of a polishing article disposed on a web-based polishing system. In one embodiment, a substrate processing method includes winding a used portion of a polishing article onto a take-up roll of a polishing system by rotating a first spindle having the take-up roll disposed thereon; measuring, using an encoder wheel, a polishing article advancement length of the used portion of the polishing article wound onto the take-up roll; determining a tensioning torque to apply to a supply roll using the measured polishing article advancement length; and tensioning the polishing article by applying the tensioning torque to the supply roll.

公开(公告)号：US20230415297A1

公开(公告)日：2023-12-28

申请号：US18465519

申请日：2023-09-12

Applicant: Applied Materials, Inc.

Inventor： Hari Soundararajan ,  Shou-Sung Chang ,  Calvin Lee ,  Jonathan P. Domin ,  Shuchivrat Datar ,  Dmitry Sklyar ,  Paul D. Butterfield ,  Chad Pollard ,  Haosheng Wu

IPC: B24B37/015

CPC classification number: B24B37/015 ,  B24B37/042

Abstract: A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.

公开(公告)号：US20210405665A1

公开(公告)日：2021-12-30

申请号：US17356287

申请日：2021-06-23

Applicant: Applied Materials, Inc.

Inventor： Ricardo Martinez ,  Hung Xuan Hoang ,  Dmitry Sklyar ,  Farooq Aleem ,  Jagan Rangarajan ,  William Wadsworth ,  Brett Hoogensen

IPC: G05D7/06 ,  G05B19/042

Abstract: In a substrate processing system, such as a chemical mechanical system, updated controller configuration data is obtained for a plurality of liquid flow controllers of the substrate processing system. Each of a plurality of liquid flow controllers (LFCs) coupled to an Ethernet for Control Automation Technology (EtherCAT) bus automatically downloads a copy of the updated controller configuration data through the EtherCAT bus. Each of the plurality of liquid flow controllers controls fluid flow of a separate fluid line from a plurality of fluid lines in the substrate processing system, fluid flow through the plurality of fluid lines is controlled using the plurality of liquid flow controllers having the updated controller configuration data.

公开(公告)号：US20210402554A1

公开(公告)日：2021-12-30

申请号：US17360907

申请日：2021-06-28

Applicant: Applied Materials, Inc.

Inventor： Hari Soundararajan ,  Shou-Sung Chang ,  Calvin Lee ,  Jonathan P. Domin ,  Shuchivrat Datar ,  Dmitry Sklyar ,  Paul D. Butterfield ,  Chad Pollard ,  Haosheng Wu

IPC: B24B37/015

Abstract: A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.