公开(公告)号：US20200090966A1

公开(公告)日：2020-03-19

申请号：US16545749

申请日：2019-08-20

Applicant: Applied Materials, Inc.

Inventor： Jacob NEWMAN

IPC: H01L21/67 ,  H01L21/677 ,  B65G47/91

Abstract: An embodiment is a processing system for processing a substrate. The processing system includes a Front Opening Unified Pod (FOUP) load lock (FLL) and a vacuum system. The FLL has walls defining an interior space therein. The FLL includes load lock isolation and tunnel isolation doors. The load lock isolation door is operable to close a first opening in a first sidewall of the FLL. The first opening is sized so that a FOUP is capable of passing therethrough. The tunnel isolation door is operable to close a second opening in a second sidewall of the FLL. The second opening is sized so that a substrate is capable of passing therethrough. The vacuum system is fluidly connected to the interior space of the FLL and is operable to pump down a pressure of the interior space of the FLL.

公开(公告)号：US20220406630A1

公开(公告)日：2022-12-22

申请号：US17857749

申请日：2022-07-05

Applicant: Applied Materials, Inc.

Inventor： Jacob NEWMAN

IPC: H01L21/67 ,  B65G47/91 ,  H01L21/677

Abstract: An embodiment is a processing system for processing a substrate. The processing system includes a Front Opening Unified Pod (FOUP) load lock (FLL) and a vacuum system. The FLL has walls defining an interior space therein. The FLL includes load lock isolation and tunnel isolation doors. The load lock isolation door is operable to close a first opening in a first sidewall of the FLL. The first opening is sized so that a FOUP is capable of passing therethrough. The tunnel isolation door is operable to close a second opening in a second sidewall of the FLL. The second opening is sized so that a substrate is capable of passing therethrough. The vacuum system is fluidly connected to the interior space of the FLL and is operable to pump down a pressure of the interior space of the FLL.

公开(公告)号：US20220130700A1

公开(公告)日：2022-04-28

申请号：US17647120

申请日：2022-01-05

Applicant: Applied Materials, Inc.

Inventor： Jacob NEWMAN ,  Ulrich OLDENDORF ,  Martin AENIS ,  Andrew J. CONSTANT ,  Shay ASSAF ,  Jeffrey C. HUDGENS ,  Alexander BERGER ,  William Tyler WEAVER

IPC: H01L21/677 ,  B65G47/92 ,  H01L21/67 ,  H01L21/687

Abstract: Embodiments herein relate to a transport system and a substrate processing and transfer (SPT) system. The SPT system includes a transport system that connects two processing tools. The transport system includes a vacuum tunnel that is configured to transport substrates between the processing tools. The vacuum tunnel includes a substrate transport carriage to move the substrate through the vacuum tunnel. The SPT system has a variety of configurations that allow the user to add or remove processing chambers, depending on the process chambers required for a desired substrate processing procedure.

公开(公告)号：US20190295872A1

公开(公告)日：2019-09-26

申请号：US16431239

申请日：2019-06-04

Applicant: Applied Materials, Inc.

Inventor： Shay ASSAF ,  Andrew CONSTANT ,  Jacob NEWMAN ,  Charles CARLSON ,  William Tyler WEAVER ,  Stephen HICKERSON

IPC: H01L21/67

Abstract: Methods and apparatus for processing a substrate are provided herein. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between each of the load lock chamber, the transfer chamber, and the thermal process chamber. In other implementations, a process platform having a load lock chamber, a transfer chamber, and a thermal process chamber is disclosed. Methods of measuring oxygen concentration in a load lock chamber via evacuation of a transfer chamber are also described herein.

公开(公告)号：US20180254207A1

公开(公告)日：2018-09-06

申请号：US15660784

申请日：2017-07-26

Applicant: Applied Materials, Inc.

Inventor： Shay ASSAF ,  Andrew CONSTANT ,  Jacob NEWMAN ,  Charles CARLSON ,  William Tyler WEAVER ,  Stephen HICKERSON

IPC: H01L21/67

CPC classification number: H01L21/67196 ,  H01L21/67109 ,  H01L21/67161 ,  H01L21/67184 ,  H01L21/67201 ,  H01L21/67207

Abstract: Methods and apparatus for processing a substrate are provided herein. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between each of the load lock chamber, the transfer chamber, and the thermal process chamber. In other implementations, a process platform having a load lock chamber, a transfer chamber, and a thermal process chamber is disclosed. Methods of measuring oxygen concentration in a load lock chamber via evacuation of a transfer chamber are also described herein.

公开(公告)号：US20170213749A1

公开(公告)日：2017-07-27

申请号：US15355763

申请日：2016-11-18

Applicant: Applied Materials, Inc.

Inventor： Jacob NEWMAN

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67109 ,  H01L21/67115 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67748 ,  H01L21/68742 ,  H01L21/68757 ,  H01L21/68764 ,  H01L21/68771

Abstract: Embodiments described herein relate to apparatus and methods for thermally processing substrates. In one embodiment, a processing system includes a factory interface coupled to a plurality of load lock chambers. The plurality of load lock chambers are coupled to a transfer chamber which houses a robot. A thermal processing chamber is coupled to the transfer chamber and the robot is configured to transfer substrate between the load lock chambers and the thermal processing chamber. A multi-substrate support, which is disposed within the thermal processing chamber, rotates to facilitate efficient substrate thermal processing. A gas curtain apparatus disposed in a port plenum provides environment separation between the processing chamber and the transfer chamber while enabling efficient substrate transfer between the thermal processing chamber and the transfer chamber.

公开(公告)号：US20160002821A1

公开(公告)日：2016-01-07

申请号：US14735189

申请日：2015-06-10

Applicant: Applied Materials, Inc.

Inventor： Jacob NEWMAN

IPC: C30B25/14 ,  C30B25/12 ,  C30B25/10

CPC classification number: C30B25/14 ,  C30B25/105 ,  C30B25/12

Abstract: Embodiments relate to methods and apparatus for batch processing of substrates during epitaxial film formation. In one example, a process chamber includes a chamber lid and substrate support. The chamber lid includes a centrally disposed gas inlet and a first gas deflector coupled to the chamber lid and adapted to direct the first process gas laterally across surfaces of a plurality of substrates. The lid also includes one or more gas outlets disposed radially outward of the centrally disposed gas inlet, and a plurality of lamps disposed between the centrally disposed gas inlet and the one or more gas outlets. The substrate support is rotatable and includes both a gas passage formed therein for introducing a second process gas to the internal volume of the process chamber and a second gas deflector adapted to direct the second process gas laterally across the surfaces of the plurality of substrates.

Abstract translation: 实施例涉及在外延膜形成期间批量处理衬底的方法和装置。 在一个示例中，处理室包括室盖和衬底支撑件。 室盖包括中心设置的气体入口和耦合到室盖的第一气体偏转器，并且适于将第一工艺气体横向地引导穿过多个衬底的表面。 盖子还包括设置在中心设置的气体入口的径向外侧的一个或多个气体出口，以及设置在中心设置的气体入口和一个或多个气体出口之间的多个灯。 衬底支撑件是可旋转的，并且包括形成在其中的气体通道，用于将第二工艺气体引入到处理室的内部容积;以及第二气体偏转器，其适于将第二工艺气体横向横跨多个衬底的表面。