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公开(公告)号：US20250093300A1
公开(公告)日：2025-03-20
申请号：US18885019
申请日：2024-09-13
Applicant: Applied Materials, Inc.
Inventor： Jia Pelpa , Mehran Moalem , Manuel A. Hernandez , Ryan Pakulski
IPC: G01N29/02 , G01N29/036 , G01N29/24 , H01L21/67
Abstract: A system can include a chamber body of a processing chamber, a substrate support assembly disposed within the chamber body and associated with a processing region, a radical sensor disposed within the processing chamber, and a controller. The radical sensor is to measure a change in resonant frequency of a radical sensor of the radical sensor, and the change in resonant frequency of the radical sensor correlates to a concentration of radical species associated with a target gas. The controller is to determine one or more conditions of the processing chamber based on the change in the resonant frequency of the radical sensor.
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公开(公告)号：US20230060529A1
公开(公告)日：2023-03-02
申请号：US17874929
申请日：2022-07-27
Applicant: Applied Materials, Inc.
Inventor： Mehran Moalem , Kartik Ramaswamy
IPC: H01J37/32
Abstract: Embodiments disclosed herein include a plasma source. In an embodiment, the plasma source includes a plurality of plasma legs connected to each other by corner connectors. In an embodiment, each plasma leg comprises a conductive shell, a magnetic layer around the conductive shell, and a primary coil in the magnetic layer.
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公开(公告)号：US20230375506A1
公开(公告)日：2023-11-23
申请号：US18198123
申请日：2023-05-16
Applicant: Applied Materials, Inc.
Inventor： Mehran Moalem , Mehdi Balooch
CPC classification number: G01N29/022 , G01N33/0027 , H01J37/32981 , G01N2291/014 , G01N2291/021 , H01J37/32357 , H01J2237/334
Abstract: A sensor device comprises a quartz crystal microbalance (QCM) and a coating on at least a portion of a surface of the QCM, wherein the coating selectively reacts with radicals of a target gas and does not react with stable molecules of the target gas. The QCM is configured such that a resonant frequency of the QCM changes in response to reaction of the radicals of the target gas with the coating, wherein the change in the resonant frequency of the QCM correlates to an amount of the radicals of the target gas that have reacted with the coating.
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公开(公告)号：US11110392B2
公开(公告)日：2021-09-07
申请号：US16429357
申请日：2019-06-03
Applicant: APPLIED MATERIALS, INC.
Inventor： Colin John Dickinson , Mehran Moalem , Daniel O. Clark
Abstract: Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, a method for treating an exhaust gas in an exhaust conduit of a substrate processing system includes: flowing an exhaust gas from a process chamber into a plasma source via a foreline; injecting a reagent into the foreline; forming a plasma in the plasma source from the exhaust gas and the reagent; and injecting a cleaning gas into the foreline, wherein the cleaning gas and the reagent are different gases.
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公开(公告)号：US10722840B2
公开(公告)日：2020-07-28
申请号：US15449226
申请日：2017-03-03
Applicant: APPLIED MATERIALS, INC.
Inventor： Colin John Dickinson , Mehran Moalem , Daniel O. Clark
Abstract: Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, a method for treating an exhaust gas in an exhaust conduit of a substrate processing system includes: flowing an exhaust gas and a reagent gas into an exhaust conduit of a substrate processing system; injecting a non-reactive gas into the exhaust conduit to maintain a desired pressure in the exhaust conduit for conversion of the exhaust gas; and forming a plasma from the exhaust gas and reagent gas, subsequent to injecting the non-reactive gas, to convert the exhaust gas to abatable byproduct gases.
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Patent Agency Ranking
公开(公告)号：US20220415617A1
公开(公告)日：2022-12-29
申请号：US17835718
申请日：2022-06-08
Applicant: Applied Materials, Inc.
Inventor： Mehran Moalem
IPC: H01J37/32
Abstract: Embodiments disclosed herein include a plasma source. In an embodiment, a plasma source comprises a dielectric body with a top surface, a bottom surface, and sidewall surfaces. In an embodiment, a plurality of holes pass through the dielectric body, where a first set of holes pass from the top surface to the bottom surface, and a second set of holes pass between opposite sidewall surfaces. In an embodiment, a housing is around the dielectric body, and a monopole antenna extending into the dielectric body.
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公开(公告)号：US20220415612A1
公开(公告)日：2022-12-29
申请号：US17835730
申请日：2022-06-08
Applicant: Applied Materials, Inc.
Inventor： Mehran Moalem , Kartik Ramaswamy
Abstract: Embodiments disclosed herein include plasma sources. In an embodiment, a plasma source comprises an input to a plenum for dividing gas into a plurality of parallel fluidic paths, a plurality of plasma zones, wherein each plasma zone is along one of the plurality of parallel fluidic paths, and a plurality of magnetic cores, wherein each magnetic core surrounds one of the plurality of plasma zones. In an embodiment, an RF coil wraps around the plurality of magnetic cores. In an embodiment, the plasma source further comprises a manifold at a bottom of the plurality of plasma zones, where the manifold merges the plurality of fluidic paths into a single output.
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8.发明申请公开(公告)号：US20220392812A1
公开(公告)日：2022-12-08
申请号：US17735837
申请日：2022-05-03
Applicant: Applied Materials, Inc.
Inventor： Mehran Moalem
Abstract: Embodiments disclosed herein include a processing tool for measuring neutral radical concentrations. In an embodiment, the processing tool comprises a processing chamber, and a neutral radical mass spectrometry (NRMS) analyzer fluidically coupled to the processing chamber. In an embodiment, the NRMS analyzer comprises a first chamber fluidically coupled to the processing chamber, where the first chamber comprises a modulator, and a second chamber fluidically coupled to the first chamber, where the second chamber is a residual gas analyzer or a mass spectrometer. In an embodiment, an unobstructed line of sight passes from the processing chamber to the second chamber.
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公开(公告)号：US09597634B2
公开(公告)日：2017-03-21
申请号：US14300372
申请日：2014-06-10
Applicant: APPLIED MATERIALS, INC.
Inventor： Colin John Dickinson , Mehran Moalem , Daniel O. Clark
CPC classification number: B01D53/32 , B01D53/92 , B01D2258/0216 , B01D2259/122 , B01D2259/80 , B01D2259/818 , C23C16/4412
Abstract: Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a substrate processing system includes a plasma source coupled to a foreline of a process chamber, a reagent source coupled to the foreline upstream of the plasma source, and a foreline gas injection kit coupled to the foreline to controllably deliver a gas to the foreline, wherein the foreline injection kit includes a pressure regulator to set a foreline gas delivery pressure setpoint, and a first pressure gauge coupled to monitor a delivery pressure of the gas.
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公开(公告)号：US20250098541A1
公开(公告)日：2025-03-20
申请号：US18883312
申请日：2024-09-12
Applicant: Applied Materials, Inc.
Inventor： Jia Pelpa , Mehran Moalem , Mehdi Balooch , Damodar Shanbhag
IPC: H10N30/30 , G10K11/04 , H10N30/03 , H10N30/067 , H10N30/082 , H10N30/85 , H10N30/87
Abstract: A device can include a radical sensor including a piezoelectric resonator. The radical sensor includes a base structure including a piezoelectric material, and a filter formed on the base structure to selectively react with a radical species. A resonant frequency of the radical sensor changes in response to reaction of the radical species to the filter. The filter includes at least one of: a crystalline material, a doped coating, or a coating having a thickness that ranges from about 5 micrometers to about 50 micrometers.
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