MACHINE LEARNING MODEL GENERATION AND UPDATING FOR MANUFACTURING EQUIPMENT

    公开(公告)号:US20230306281A1

    公开(公告)日:2023-09-28

    申请号:US17668280

    申请日:2022-02-09

    CPC classification number: G06N5/022 G05B13/029

    Abstract: A method includes determining that conditions of a processing chamber have changed since a trained machine learning model associated with the processing chamber was trained. The method further includes determining whether a change in the conditions of the processing chamber is a gradual change or a sudden change. Responsive to determining that the change in the conditions of the processing chamber is a gradual change, the method further includes performing a first training process to generate a new machine learning model. Responsive to determining that the change in the conditions of the processing chamber is a sudden change, the method further includes performing a second training process to generate the new machine learning model. The first training process is different from the second training process.

    ACCELERATING PREVENTATIVE MAINTENANCE RECOVERY AND RECIPE OPTIMIZING USING MACHINE-LEARNING BASED ALGORITHM

    公开(公告)号:US20230163002A1

    公开(公告)日:2023-05-25

    申请号:US17534446

    申请日:2021-11-23

    Inventor: Pengyu Han

    Abstract: A method for determining processing chamber conditions using sensor data and a machine learning model is provided. The method includes receiving, by a processing device, sensor data that include chamber data indicating a state of an environment of a processing chamber processing a substrate according to a set of process parameters of a current process. The sensor data further include spectral data indicating optical emission spectra (OES) measurements of a plasma disposed within the processing chamber. The method further includes using the sensor data as input to a machine learning model and obtaining one or more outputs that indicate one or more chamber condition metrics. The method further includes determining a recovery status of a processing chamber based on the one or more chamber condition metrics. The method further includes causing a modification to a performance of the processing chamber based on the recovery status of the processing chamber.

    OBTAINING SUBSTRATE METROLOGY MEASUREMENT VALUES USING MACHINE LEARNING

    公开(公告)号:US20220397515A1

    公开(公告)日:2022-12-15

    申请号:US17344788

    申请日:2021-06-10

    Abstract: A machine learning model trained to provide metrology measurements for a substrate is provided. Training data generated for a prior substrate processed according to a prior process is provided to train the model. The training data includes a training input including a subset of historical spectral data extracted from a normalized set of historical spectral data collected for the prior substrate during the prior process. The subset of historical spectral data includes an indication of historical spectral features associated with a particular type of metrology measurement. The training data also includes a training output including a historical metrology measurement obtained for the prior substrate, the historical metrology measurement associated with the particular type of metrology measurement. Spectral data is collected for a current substrate processed according to a current process. A subset of current data extracted from a normalized set of the spectral data for the current substrate is provided as input to the trained model. Metrology measurement data for the current substrate is extracted from one or more outputs of the trained model.

    ACCELERATING PREVENTATIVE MAINTENANCE RECOVERY AND RECIPE OPTIMIZING USING MACHINE-LEARNING BASED ALGORITHM

    公开(公告)号:US20250022733A1

    公开(公告)日:2025-01-16

    申请号:US18896633

    申请日:2024-09-25

    Inventor: Pengyu Han

    Abstract: A method for determining processing chamber conditions using sensor data and a machine learning model is provided. The method includes receiving, by a processing device, sensor data that include chamber data indicating a state of an environment of a processing chamber processing a substrate according to a set of process parameters of a current process. The sensor data further include spectral data indicating optical emission spectra (OES) measurements of a plasma disposed within the processing chamber. The method further includes using the sensor data as input to a machine learning model and obtaining one or more outputs that indicate one or more chamber condition metrics. The method further includes determining a recovery status of a processing chamber based on the one or more chamber condition metrics. The method further includes causing a modification to a performance of the processing chamber based on the recovery status of the processing chamber.

    Endpoint detection system for enhanced spectral data collection

    公开(公告)号:US11965798B2

    公开(公告)日:2024-04-23

    申请号:US17344791

    申请日:2021-06-10

    Inventor: Pengyu Han Lei Lian

    Abstract: An endpoint detection system for enhanced spectral data collection is provided. An optical bundle is coupled to a light source configured to generate incident light. The optical bundle includes two or more sets of optical fibers that each include an emitting optical fiber and a receiving optical fiber. The receiving optical fibers are disposed within the optical bundle at a pairing angle relative to a respective emitting optical fiber. The optical bundle is also coupled to a collimator assembly that includes an achromatic lens. The achromatic lens receives a first light beam of incident light from a first emitting optical fiber and directs spectral components of the first light beam to a first and second portion of a surface of a substrate. The first portion of the substrate surface is substantially the same as the second portion. The achromatic lens collects reflected spectral components that are produced by the spectral components directed to the first and second portions of the substrate surface. The achromatic lens transmits the reflected spectral components to a first receiving fiber of the optical fiber bundle, which transmits the reflected spectral components to a light detection component. A processing device coupled to the light detection component determines a reflectance of the substrate surface based on the reflected spectral components.

    ENDPOINT DETECTION SYSTEM FOR ENHANCED SPECTRAL DATA COLLECTION

    公开(公告)号:US20220397482A1

    公开(公告)日:2022-12-15

    申请号:US17344791

    申请日:2021-06-10

    Inventor: Pengyu Han Lei Lian

    Abstract: An endpoint detection system for enhanced spectral data collection is provided. An optical bundle is coupled to a light source configured to generate incident light. The optical bundle includes two or more sets of optical fibers that each include an emitting optical fiber and a receiving optical fiber. The receiving optical fibers are disposed within the optical bundle at a pairing angle relative to a respective emitting optical fiber. The optical bundle is also coupled to a collimator assembly that includes an achromatic lens. The achromatic lens receives a first light beam of incident light from a first emitting optical fiber and directs spectral components of the first light beam to a first and second portion of a surface of a substrate. The first portion of the substrate surface is substantially the same as the second portion. The achromatic lens collects reflected spectral components that are produced by the spectral components directed to the first and second portions of the substrate surface. The achromatic lens transmits the reflected spectral components to a first receiving fiber of the optical fiber bundle, which transmits the reflected spectral components to a light detection component. A processing device coupled to the light detection component determines a reflectance of the substrate surface based on the reflected spectral components.

    Eliminating internal reflections in an interferometric endpoint detection system

    公开(公告)号:US11421977B2

    公开(公告)日:2022-08-23

    申请号:US16165544

    申请日:2018-10-19

    Inventor: Lei Lian Pengyu Han

    Abstract: A method is disclosed for operating an endpoint detection system of a processing chamber having a ceiling formed therein, a substrate support located internal to the processing chamber, and a substrate resting on the substrate support. A transparent panel is located in the ceiling of the processing chamber, the panel oriented at a first acute angle relative to the substrate and the substrate support. The transparent panel receives an incident light beam from the endpoint detection system at a second acute angle relative to the panel. The transparent panel transmits the incident light beam to the substrate within the processing chamber at an angle perpendicular to the substrate and the substrate support.

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