公开(公告)号：US10431489B2

公开(公告)日：2019-10-01

申请号：US14554945

申请日：2014-11-26

Applicant: APPLIED MATERIALS, INC.

Inventor： Pulkit Agarwal ,  Song-Moon Suh ,  Glen Mori ,  Steven V. Sansoni

IPC: H01L21/687 ,  B25J15/00 ,  B25J11/00

Abstract: Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.

公开(公告)号：US09947578B2

公开(公告)日：2018-04-17

申请号：US15358690

申请日：2016-11-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Yu Lei ,  Vikash Banthia ,  Kai Wu ,  Xinyu Fu ,  Yi Xu ,  Kazuya Daito ,  Feiyue Ma ,  Pulkit Agarwal ,  Chi-Chou Lin ,  Dien-Yeh Wu ,  Guoqiang Jian ,  Wei V. Tang ,  Jonathan Bakke ,  Mei Chang ,  Sundar Ramamurthy

IPC: H01L21/4763 ,  H01L21/768 ,  C23C16/44 ,  C23C16/455 ,  C23C16/46 ,  C23C16/52 ,  H01L21/311 ,  C23C16/02 ,  C23C16/04 ,  C23C16/06 ,  C23C16/08 ,  C23C16/505 ,  C23C16/54

CPC classification number: H01L21/76843 ,  C23C16/0227 ,  C23C16/0281 ,  C23C16/045 ,  C23C16/06 ,  C23C16/08 ,  C23C16/4401 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/46 ,  C23C16/505 ,  C23C16/52 ,  C23C16/54 ,  H01L21/31116 ,  H01L21/76802 ,  H01L21/76877

Abstract: Methods for forming metal contacts having tungsten liner layers are provided herein. In some embodiments, a method of processing a substrate includes: exposing a substrate, within a first substrate process chamber, to a plasma formed from a first gas comprising a metal organic tungsten precursor gas or a fluorine-free tungsten halide precursor to deposit a tungsten liner layer, wherein the tungsten liner layer is deposited atop a dielectric layer and within a feature formed in a first surface of the dielectric layer of a substrate; transferring the substrate to a second substrate process chamber without exposing the substrate to atmosphere; and exposing the substrate to a second gas comprising a tungsten fluoride precursor to deposit a tungsten fill layer atop the tungsten liner layer.

公开(公告)号：US20160016286A1

公开(公告)日：2016-01-21

申请号：US14335291

申请日：2014-07-18

Applicant: Applied Materials, Inc.

Inventor： Song-Moon Suh ,  Yuanhong Guo ,  Guangchi Xuan ,  Pulkit Agarwal

IPC: B24C1/00 ,  B08B7/00

CPC classification number: B24C1/003 ,  B08B3/04 ,  B24C1/00 ,  B24C3/32

Abstract: Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.

Abstract translation: 本文公开了使用固体二氧化碳（CO 2）颗粒流清洁陶瓷制品的系统和方法。 一种方法包括将液体CO 2流入喷嘴中，并将来自喷嘴的固体CO 2颗粒的第一流引导至陶瓷制品第一时间以清洁陶瓷制品。 液体CO 2在离开喷嘴时被转化为第一流的固体CO 2颗粒。 固体CO 2颗粒的第一流引起在陶瓷制品上形成一层固体CO 2。 在固体CO 2层升华之后，将第二股固体CO 2颗粒流从喷嘴朝着陶瓷制品引导至少第一持续时间或第二持续时间，以进一步清洁陶瓷制品。

公开(公告)号：US09925639B2

公开(公告)日：2018-03-27

申请号：US14335291

申请日：2014-07-18

Applicant: Applied Materials, Inc.

Inventor： Song-Moon Suh ,  Yuanhong Guo ,  Guangchi Xuan ,  Pulkit Agarwal

IPC: B24C1/00 ,  B08B3/04

CPC classification number: B24C1/003 ,  B08B3/04 ,  B24C1/00 ,  B24C3/32

Abstract: Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.

公开(公告)号：US09425076B2

公开(公告)日：2016-08-23

申请号：US14476224

申请日：2014-09-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Pulkit Agarwal ,  Daniel Greenberg ,  Song-Moon Suh ,  Jeffrey Brodine ,  Steven V. Sansoni ,  Glen Mori

IPC: B66F19/00 ,  H01L21/687 ,  H01L21/677

CPC classification number: H01L21/68707 ,  H01L21/67766

Abstract: Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes a support member; and a plurality of substrate contact elements protruding from the support member, wherein each of the plurality of substrate contact elements includes: a first contact surface to support a substrate when placed thereon; and a second contact surface extending from the first contact surface, wherein the second contact surface is adjacent a periphery of the substrate to prevent radial movement of the substrate, wherein the first contact surface is at a first angle with respect to the support member and the second contact surface is at a second angle with respect to the support member, and wherein the first angle is between about 3 degrees and 5 degrees.

Abstract translation: 本文公开了用于支撑衬底的装置的实施例。 在一些实施例中，用于支撑衬底的装置包括支撑构件; 以及从所述支撑构件突出的多个基板接触元件，其中所述多个基板接触元件中的每一个包括：当放置在其上时支撑基板的第一接触表面; 以及从所述第一接触表面延伸的第二接触表面，其中所述第二接触表面邻近所述衬底的周边以防止所述衬底的径向移动，其中所述第一接触表面相对于所述支撑构件处于第一角度， 第二接触表面相对于支撑构件处于第二角度，并且其中第一角度在约3度和5度之间。