公开(公告)号：US20180158677A1

公开(公告)日：2018-06-07

申请号：US15869021

申请日：2018-01-11

Applicant: Applied Materials, Inc.

Inventor： Cara BEASLEY ,  Ralf HOFMANN ,  Majeed A. FOAD

IPC: H01L21/02 ,  H01L21/288 ,  C01B32/182 ,  C01B32/184 ,  B05D5/12

CPC classification number: H01L21/02527 ,  B05D3/061 ,  B05D3/065 ,  B05D3/141 ,  B05D5/12 ,  C01B32/182 ,  C01B32/184 ,  C01B32/186 ,  C01B32/20 ,  H01L21/02318 ,  H01L21/0234 ,  H01L21/02345 ,  H01L21/0237 ,  H01L21/02376 ,  H01L21/02628 ,  H01L21/02664 ,  H01L21/288

Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

公开(公告)号：US20170148631A1

公开(公告)日：2017-05-25

申请号：US15427367

申请日：2017-02-08

Applicant: Applied Materials, Inc.

Inventor： Cara BEASLEY ,  Ralf HOFMANN ,  Majeed A. FOAD

IPC: H01L21/02 ,  H01L21/288

CPC classification number: H01L21/02376 ,  B05D3/061 ,  B05D3/065 ,  B05D3/141 ,  B05D5/12 ,  C01B32/182 ,  C01B32/184 ,  C01B32/186 ,  C01B32/20 ,  H01L21/02318 ,  H01L21/0234 ,  H01L21/02345 ,  H01L21/0237 ,  H01L21/02527 ,  H01L21/02628 ,  H01L21/02664 ,  H01L21/288

Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

公开(公告)号：US20160204451A1

公开(公告)日：2016-07-14

申请号：US15076523

申请日：2016-03-21

Applicant: Applied Materials, Inc.

Inventor： Byung-Sung Leo KWAK ,  Stefan BANGERT ,  Ralf HOFMANN ,  Michael KOENIG

IPC: H01M6/40

CPC classification number: H01M6/40 ,  C23C14/042 ,  H01M4/02 ,  H01M4/13 ,  H01M4/139 ,  H01M4/5825 ,  H01M4/621 ,  H01M4/623 ,  H01M4/663 ,  H01M2004/028 ,  Y02E60/122 ,  Y10T29/49002 ,  Y10T29/5313

Abstract: A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.

Abstract translation: 用于基板薄膜处理的磁性处理组件，用于组装和拆卸荫罩以覆盖工件顶部以暴露于加工状态的系统和方法。 组件可以包括磁性处理载体和荫罩，其设置在磁性处理载体上并且磁耦合到磁性处理载体以覆盖待暴露于加工过程中要设置在荫罩和磁性处理载体之间的工件的顶部 条件。 系统包括具有用于保持荫罩的第一支撑件的第一室，用于保持处理托架的第二支撑件以及将荫罩对准待设置在承载件和荫罩之间的工件的对准系统。 第一和第二支撑件可相对于彼此移动。