公开(公告)号：US11887818B2

公开(公告)日：2024-01-30

申请号：US17498231

申请日：2021-10-11

Applicant: Applied Materials, Inc.

Inventor： Tsutomu Tanaka ,  John C. Forster ,  Ran Liu ,  Kenichi Ohno ,  Ning Li ,  Mihaela Balseanu ,  Keiichi Tanaka ,  Li-Qun Xia

IPC: H01J37/32 ,  C23C16/50 ,  C23C16/455 ,  C23C16/458 ,  C23C16/34 ,  C23C16/40 ,  C23C16/52 ,  C23C16/505

CPC classification number: H01J37/32449 ,  C23C16/345 ,  C23C16/401 ,  C23C16/458 ,  C23C16/4554 ,  C23C16/4583 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/50 ,  C23C16/505 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32137 ,  H01J37/32183 ,  H01J37/32935 ,  H01J37/32082

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

公开(公告)号：US11158489B2

公开(公告)日：2021-10-26

申请号：US15805466

申请日：2017-11-07

Applicant: Applied Materials, Inc.

Inventor： Tsutomu Tanaka ,  John C. Forster ,  Ran Liu ,  Kenichi Ohno ,  Ning Li ,  Mihaela Balseanu ,  Keiichi Tanaka ,  Li-Qun Xia

IPC: H01J37/00 ,  H01J37/32 ,  C23C16/50 ,  C23C16/455 ,  C23C16/458 ,  C23C16/34 ,  C23C16/40 ,  C23C16/52 ,  C23C16/505

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

公开(公告)号：US20220028660A1

公开(公告)日：2022-01-27

申请号：US17498231

申请日：2021-10-11

Applicant: Applied Materials, Inc.

Inventor： Tsutomu Tanaka ,  John C. Forster ,  Ran Liu ,  Kenichi Ohno ,  Ning Li ,  Mihaela A. Balseanu ,  Keiichi Tanaka ,  Li-Qun Xia

IPC: H01J37/32

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

公开(公告)号：US20180130642A1

公开(公告)日：2018-05-10

申请号：US15805466

申请日：2017-11-07

Applicant: Applied Materials, Inc.

Inventor： Tsutomu Tanaka ,  John C. Forster ,  Ran Liu ,  Kenichi Ohno ,  Ning Li ,  Mihaela Balseanu ,  Keiichi Tanaka ,  Li-Qun Xia

IPC: H01J37/32 ,  C23C16/50 ,  C23C16/455 ,  C23C16/52 ,  C23C16/458 ,  C23C16/34 ,  C23C16/40

CPC classification number: H01J37/32449 ,  C23C16/345 ,  C23C16/401 ,  C23C16/4554 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/458 ,  C23C16/4583 ,  C23C16/50 ,  C23C16/505 ,  C23C16/52 ,  H01J37/32082 ,  H01J37/32137 ,  H01J37/32183 ,  H01J37/3244 ,  H01J37/32935

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.