公开(公告)号：US12249494B2

公开(公告)日：2025-03-11

申请号：US18500951

申请日：2023-11-02

Applicant: Applied Materials, Inc.

Inventor： Yuanhong Guo ,  Sheng Guo ,  Marek Radko ,  Steve Sansoni ,  Xiaoxiong Yuan ,  See-Eng Phan ,  Yuji Murayama ,  Pingping Gou ,  Song-Moon Suh

IPC: H01J37/32

Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.

公开(公告)号：US20240062999A1

公开(公告)日：2024-02-22

申请号：US18500951

申请日：2023-11-02

Applicant: Applied Materials, Inc.

Inventor： Yuanhong Guo ,  Sheng Guo ,  Marek Radko ,  Steve Sansoni ,  Xiaoxiong Yuan ,  See-Eng Phan ,  Yuji Murayama ,  Pingping Gou ,  Song-Moon Suh

IPC: H01J37/32

CPC classification number: H01J37/32825 ,  H01J37/32357 ,  H01J37/32449 ,  H01J37/32889

Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.

公开(公告)号：US11854773B2

公开(公告)日：2023-12-26

申请号：US17214707

申请日：2021-03-26

Applicant: Applied Materials, Inc.

Inventor： Yuanhong Guo ,  Sheng Guo ,  Marek Radko ,  Steve Sansoni ,  Xiaoxiong Yuan ,  See-Eng Phan ,  Yuji Murayama ,  Pingping Gou ,  Song-Moon Suh

IPC: H01J37/32

CPC classification number: H01J37/32825 ,  H01J37/32357 ,  H01J37/32449 ,  H01J37/32889

Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.

公开(公告)号：US20210305028A1

公开(公告)日：2021-09-30

申请号：US17214707

申请日：2021-03-26

Applicant: Applied Materials, Inc.

Inventor： Yuanhong Guo ,  Sheng Guo ,  Marek Radko ,  Steve Sansoni ,  Xiaoxiong Yuan ,  See-Eng Phan ,  Yuji Murayama ,  Pingping Gou ,  Song-Moon Suh

IPC: H01J37/32

Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.

公开(公告)号：US10053778B2

公开(公告)日：2018-08-21

申请号：US14337131

申请日：2014-07-21

Applicant: APPLIED MATERIALS, INC.

Inventor： Vijay D. Parkhe ,  Kurt J Ahmann ,  Matthew C Tsai ,  Steve Sansoni

IPC: H01L21/683 ,  C23C16/00 ,  C23C16/46 ,  H01L21/687

CPC classification number: C23C16/463 ,  H01L21/6831 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T279/23

Abstract: A cooling pedestal for supporting a substrate, comprises a support structure having cooling conduits to flow a fluid therethrough to cool the substrate, and a contact surface comprising a coating of a diamond-like carbon. The coating comprises (i) a coefficient of friction of less than about 0.3, (ii) an average surface roughness of less than about 0.4 micrometers, and (iii) a microhardness of at least about 8 GPa.