公开(公告)号：US20200165721A1

公开(公告)日：2020-05-28

申请号：US16075914

申请日：2016-02-12

Applicant: Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK ,  Applied Materials, Inc.

Inventor： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK

IPC: C23C14/56 ,  C23C16/54 ,  B65G39/18 ,  B05C9/14 ,  B05C1/08 ,  C23C16/458 ,  C23C16/511

Abstract: A vacuum processing system for a flexible substrate is provided. The vacuum processing system includes a first chamber adapted for housing a supply roll for providing the flexible substrate; a second chamber adapted for housing a take-up roll for storing the flexible substrate after processing; a substrate transport arrangement including one or more guide rollers for guiding the flexible substrate from the first chamber to the second chamber; a maintenance zone between the first chamber and the second chamber wherein the maintenance zone allows for maintenance access to or of at least one of the first chamber and the second chamber; and a first process chamber for processing the flexible substrate.

公开(公告)号：US20190112706A1

公开(公告)日：2019-04-18

申请号：US16217027

申请日：2018-12-11

Applicant: Applied Materials, Inc.

Inventor： Hans-Georg LOTZ ,  Neil MORRISON ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

IPC: C23C16/458 ,  H01J37/32 ,  C23C14/56

Abstract: An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

公开(公告)号：US20180100236A1

公开(公告)日：2018-04-12

申请号：US15837893

申请日：2017-12-11

Applicant: Applied Materials, Inc.

Inventor： Neil Morrison ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

IPC: C23C16/54 ,  H01J37/32 ,  C23C16/455 ,  C23C16/50

Abstract: An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.

公开(公告)号：US20220056575A1

公开(公告)日：2022-02-24

申请号：US16998872

申请日：2020-08-20

Applicant: Applied Materials, Inc.

Inventor： Andreas LOPP ,  Stefan BANGERT ,  Wolfgang BUSCHBECK

IPC: C23C14/26 ,  C23C14/54 ,  H01M4/04

Abstract: One or more heating assemblies for a material deposition apparatus for pre-heating a substrate before entering a material deposition area and/or for post-heating the substrate after exiting the material deposition area are described.

公开(公告)号：US20210381097A1

公开(公告)日：2021-12-09

申请号：US17332871

申请日：2021-05-27

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Wolfgang BUSCHBECK

IPC: C23C14/24 ,  C23C14/54

Abstract: A crucible for flash evaporation of a liquid material is described. The crucible includes one or more sidewalls and a reservoir portion below the one or more sidewalls, the reservoir portion of having a first cross-section of a first size and a second cross-section above the first cross-section of a second size, the second size being larger than the first size.

公开(公告)号：US20190006216A1

公开(公告)日：2019-01-03

申请号：US16062596

申请日：2016-01-18

Applicant: Simon LAU ,  Wolfgang BUSCHBECK ,  Applied Materials, Inc.

Inventor： Simon LAU ,  Wolfgang BUSCHBECK

IPC: H01L21/677 ,  C23C14/35 ,  C23C14/50 ,  C23C14/56

Abstract: An apparatus for transportation of a substrate carrier in a vacuum chamber is provided. The apparatus includes a first track providing a first transportation path for the substrate carrier, and a transfer device configured for contactlessly moving the substrate carrier from a first position on the first track to one or more second positions away from the first track. The one or more second positions include at least one of a position on a second track and a process position for processing of a substrate. The transfer device includes at least one first magnet device configured to provide a magnetic force acting on the substrate carrier to contactlessly move the substrate carrier from the first position to the one or more second positions.

公开(公告)号：US20220364223A1

公开(公告)日：2022-11-17

申请号：US17317115

申请日：2021-05-11

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Thomas DEPPISCH ,  Wolfgang BUSCHBECK

IPC: C23C14/54 ,  C23C16/46 ,  C23C14/56 ,  C23C16/458 ,  C23C14/50

Abstract: A roller for transporting a flexible substrate is described. The roller includes a first coolant supply for cooling a first part of the roller and a second coolant supply for cooling a second part and a third part of the roller. The first part is provided between the second part and the third part. Additionally, a vacuum processing apparatus including a roller and a method of cooling a roller are described.

公开(公告)号：US20240117484A1

公开(公告)日：2024-04-11

申请号：US18542356

申请日：2023-12-15

Applicant: Applied Materials, Inc.

Inventor： Wolfgang BUSCHBECK ,  Stefan BANGERT

IPC: C23C14/24 ,  C23C14/14 ,  C23C14/56

CPC classification number: C23C14/24 ,  C23C14/14 ,  C23C14/243 ,  C23C14/246 ,  C23C14/562

Abstract: An evaporation apparatus is described, particularly for evaporating a reactive material such as lithium. The evaporation apparatus includes an evaporation crucible for evaporating a liquid material, a material conduit for supplying the liquid material to the evaporation crucible, and a valve configured to close the material conduit by solidifying a part of the liquid material in the material conduit with a cooling device. The valve may include a cooling gas supply for a cooling gas, and the cooling device may be configured to cool the liquid material with the cooling gas. Further described are a vapor deposition apparatus for coating a substrate as well as an evaporation method.

公开(公告)号：US20220356028A1

公开(公告)日：2022-11-10

申请号：US17307216

申请日：2021-05-04

Applicant: Applied Materials, Inc.

Inventor： Andreas SAUER ,  Annemarie HLADIK ,  Bernhard KÖHLER ,  Thomas DEPPISCH ,  Claire ARMSTRONG ,  Wolfgang BUSCHBECK

IPC: B65H27/00 ,  B65H18/14 ,  B65H23/038

Abstract: A roller for transporting a flexible substrate is described. The roller includes a main body having a plurality of gas supply slits provided in an outer surface of the main body. The plurality of gas supply slits extends in a direction of a central rotation axis of the roller. Further, the roller includes a sleeve provided circumferentially around and in contact with the main body. The sleeve has a plurality of gas outlets extending in a radial direction (R) and being provided above the plurality of gas supply slits.

公开(公告)号：US20220090256A1

公开(公告)日：2022-03-24

申请号：US17024882

申请日：2020-09-18

Applicant: Applied Materials, Inc.

Inventor： Wolfgang BUSCHBECK ,  Stefan BANGERT

IPC: C23C14/24 ,  C23C14/14

Abstract: An evaporation apparatus (100) is described, particularly for evaporating a reactive material such as lithium. The evaporation apparatus (100) includes an evaporation crucible (110) for evaporating a liquid material (105), a material conduit (120) for supplying the liquid material (105) to the evaporation crucible (110), and a valve (150) configured to close the material conduit (120) by solidifying a part of the liquid material (105) in the material conduit (120) with a cooling device (152). The valve (150) may include a cooling gas supply (154) for a cooling gas (106), and the cooling device (152) may be configured to cool the liquid material (105) with the cooling gas (106). Further described are a vapor deposition apparatus (200) for coating a substrate as well as an evaporation method.