公开(公告)号：US20200165721A1

公开(公告)日：2020-05-28

申请号：US16075914

申请日：2016-02-12

申请人： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK ,  Applied Materials, Inc.

发明人： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK

IPC分类号： C23C14/56 ,  C23C16/54 ,  B65G39/18 ,  B05C9/14 ,  B05C1/08 ,  C23C16/458 ,  C23C16/511

摘要： A vacuum processing system for a flexible substrate is provided. The vacuum processing system includes a first chamber adapted for housing a supply roll for providing the flexible substrate; a second chamber adapted for housing a take-up roll for storing the flexible substrate after processing; a substrate transport arrangement including one or more guide rollers for guiding the flexible substrate from the first chamber to the second chamber; a maintenance zone between the first chamber and the second chamber wherein the maintenance zone allows for maintenance access to or of at least one of the first chamber and the second chamber; and a first process chamber for processing the flexible substrate.

公开(公告)号：US20200318233A1

公开(公告)日：2020-10-08

申请号：US16308695

申请日：2017-11-28

申请人： Edgar HABERKORN ,  Stefan LORENZ ,  Stefan HEIN ,  Neil MORRISON ,  Reiner KUKLA ,  Christof KURTHEN ,  Thomas DEPPISCH ,  Applied Materials, Inc.

发明人： Edgar HABERKORN ,  Stefan LORENZ ,  Stefan HEIN ,  Neil MORRISON ,  Reiner KUKLA ,  Christof KURTHEN ,  Thomas DEPPISCH

IPC分类号： C23C14/58 ,  C23C14/06 ,  C23C14/50 ,  C23C14/34

摘要： A deposition apparatus for coating a flexible substrate is described. The deposition apparatus includes a first spool chamber housing a storage spool for providing the flexible substrate, a deposition chamber arranged downstream from the first spool chamber, and a second spool chamber arranged downstream from the deposition chamber and housing a wind-up spool for winding the flexible substrate thereon after deposition. The deposition chamber includes a coating drum for guiding the flexible substrate past a plurality of deposition units including at least one deposition unit having a graphite target. Further, the deposition chamber includes a coating treatment device configured to densify a layer deposited on the flexible substrate.

公开(公告)号：US20210114832A1

公开(公告)日：2021-04-22

申请号：US17251683

申请日：2018-06-14

申请人： Applied Materials, Inc.

发明人： Neil MORRISON ,  Uwe HERMANNS

IPC分类号： B65H20/02 ,  B65H18/14 ,  B65H18/16

摘要： A roller device for guiding a flexible substrate is described. The roller device includes a support surface for contacting the flexible substrate, the support surface having a coating comprising an electronegative polymer. Further, a vacuum processing apparatus for processing a flexible substrate including the roller device and a method of processing a flexible substrate in the vacuum processing apparatus is described.

公开(公告)号：US20150020847A1

公开(公告)日：2015-01-22

申请号：US13965968

申请日：2013-08-13

申请人： APPLIED MATERIALS, INC.

发明人： Florian RIES ,  Stefan HEIN ,  Stefan LORENZ ,  Neil MORRISON ,  Tobias STOLLEY

IPC分类号： C23C16/44

CPC分类号： C23C16/4405 ,  H01J37/3277 ,  H01J37/32862 ,  Y10T428/18 ,  Y10T428/192

摘要： According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding a flexible substrate into the processing chamber.

摘要翻译： 根据本公开，提供了一种用于清洁柔性基板处理设备的处理室而不破坏处理室中的真空的方法。 用于清洁处理室的方法包括将牺牲箔引导到处理室中; 在处理室中启动第一泵过程; 等离子体清洁处理室，同时牺牲箔设置在处理室中; 在处理室中启动第二泵过程; 并将柔性基板引导到处理室中。

公开(公告)号：US20100186671A1

公开(公告)日：2010-07-29

申请号：US12358398

申请日：2009-01-23

申请人： Stefan HEIN ,  Andre HERZOG ,  Neil MORRISON ,  Jozef KUDELA

发明人： Stefan HEIN ,  Andre HERZOG ,  Neil MORRISON ,  Jozef KUDELA

IPC分类号： C23C16/54

CPC分类号： C23C16/24 ,  C23C16/455 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541

摘要： The invention relates to an arrangement for working substrates by means of plasma (PECVD), wherein at least two electrodes are provided which are located in a common plane and are spaced apart from one another. Between the particular electrodes are provided interspaces which serve as gas inlets or gas outlets.

摘要翻译： 本发明涉及一种通过等离子体（PECVD）工作衬底的装置，其中设置有至少两个电极，它们位于公共平面中并且彼此间隔开。 在特定电极之间提供用作气体入口或气体出口的间隙。

公开(公告)号：US20240248339A1

公开(公告)日：2024-07-25

申请号：US18438084

申请日：2024-02-09

申请人： Applied Materials, Inc.

发明人： Manivannan THOTHADRI ,  Harvey YOU ,  Helinda NOMINANDA ,  Neil MORRISON ,  Daniel Paul FORSTER ,  Arvinder CHADHA

IPC分类号： G02F1/1333 ,  G02B1/11 ,  G02B1/14

CPC分类号： G02F1/133331 ,  G02B1/11 ,  G02B1/14 ,  G02F1/133305 ,  G02F2201/50 ,  G02F2202/28

摘要： Embodiments described and discussed herein generally relate to flexible or foldable display devices, and more specifically to flexible cover lens assemblies. In one or more embodiments, a flexible cover lens assembly contains a glass layer, an adhesion promotion layer on the glass layer, an anti-reflectance layer disposed on the adhesion promotion layer, a dry hardcoat layer having a nano-indentation hardness in a range from about 1 GPa to about 5 GPa and disposed on the anti-reflectance layer, and an anti-fingerprint coating layer disposed on the dry hardcoat layer.

公开(公告)号：US20240184153A1

公开(公告)日：2024-06-06

申请号：US18437844

申请日：2024-02-09

申请人： Applied Materials, Inc.

发明人： Manivannan THOTHADRI ,  Harvey YOU ,  Helinda NOMINANDA ,  Neil MORRISON ,  Daniel Paul FORSTER ,  Arvinder CHADHA

IPC分类号： G02F1/1333 ,  G02B1/11 ,  G02B1/14

CPC分类号： G02F1/133331 ,  G02B1/11 ,  G02B1/14 ,  G02F1/133305 ,  G02F2201/50 ,  G02F2202/28

摘要： Embodiments described and discussed herein generally relate to flexible or foldable display devices, and more specifically to flexible cover lens assemblies. In one or more embodiments, a flexible cover lens assembly contains a glass layer, an adhesion promotion layer on the glass layer, an anti-reflectance layer disposed on the adhesion promotion layer, a dry hardcoat layer having a nano-indentation hardness in a range from about 1 GPa to about 5 GPa and disposed on the anti-reflectance layer, and an anti-fingerprint coating layer disposed on the dry hardcoat layer.

公开(公告)号：US20140208565A1

公开(公告)日：2014-07-31

申请号：US13871789

申请日：2013-04-26

申请人： Applied Materials, Inc.

发明人： Hans-Georg LOTZ ,  Neil MORRISON ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

IPC分类号： C23C16/458

CPC分类号： C23C16/458 ,  C23C14/562 ,  C23C16/45519 ,  C23C16/545 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32761 ,  H01J37/3277 ,  Y10T29/49826

摘要： An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

摘要翻译： 描述了在柔性基板上涂覆薄膜的设备。 该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及 适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通 气体分离单元的位置。

公开(公告)号：US20230113276A1

公开(公告)日：2023-04-13

申请号：US17946716

申请日：2022-09-16

申请人： Applied Materials, Inc.

发明人： Wei-Sheng LEI ,  Girish Kumar GOPALAKRISHNAN NAIR ,  Kent Qiujing ZHAO ,  Daniel STOCK ,  Tobias STOLLEY ,  Thomas DEPPISCH ,  Jean DELMAS ,  Kenneth S. LEDFORD ,  Subramanya P. HERLE ,  Kiran VACHHANI ,  Mahendran CHIDAMBARAM ,  Roland TRASSL ,  Neil MORRISON ,  Frank SCHNAPPENBERGER ,  Kevin Laughton CUNNINGHAM ,  Stefan BANGERT ,  James CUSHING ,  Visweswaren SIVARAMAKRISHNAN

IPC分类号： H01M50/102

摘要： Methods and apparatuses for processing lithium batteries with a laser source having a wide process window, high efficiency, and low cost are provided. The laser source is adapted to achieve high average power and a high frequency of picosecond pulses. The laser source can produce a line-shaped beam either in a fixed position or in scanning mode. The system can be operated in a dry room or vacuum environment. The system can include a debris removal mechanism, for example, inert gas flow, to the processing site to remove debris produced during the patterning process.

公开(公告)号：US20210260813A1

公开(公告)日：2021-08-26

申请号：US17255130

申请日：2018-06-28

申请人： Applied Materials, Inc.

发明人： Neil MORRISON

IPC分类号： B29C59/14 ,  B29C59/12

摘要： The present disclosure relates to a surface treatment method for a polymer film and to a use of a surface treated polymer film according to this method in the production of packaging material, in particular food packaging. The surface treatment method for a polymer film comprises providing information about at least the polymer film to a surface treatment device (102), adjusting at the surface treatment device at least one of a discharge of ions and a residence time of the polymer film in the surface treatment device based on the information (103), and applying the discharge of ions to a surface of the polymer film during the residence time of the polymer film in the surface treatment device to obtain a treated surface of the polymer film (104).