公开(公告)号：US20150020847A1

公开(公告)日：2015-01-22

申请号：US13965968

申请日：2013-08-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Florian RIES ,  Stefan HEIN ,  Stefan LORENZ ,  Neil MORRISON ,  Tobias STOLLEY

IPC: C23C16/44

CPC classification number: C23C16/4405 ,  H01J37/3277 ,  H01J37/32862 ,  Y10T428/18 ,  Y10T428/192

Abstract: According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding a flexible substrate into the processing chamber.

Abstract translation: 根据本公开，提供了一种用于清洁柔性基板处理设备的处理室而不破坏处理室中的真空的方法。 用于清洁处理室的方法包括将牺牲箔引导到处理室中; 在处理室中启动第一泵过程; 等离子体清洁处理室，同时牺牲箔设置在处理室中; 在处理室中启动第二泵过程; 并将柔性基板引导到处理室中。

公开(公告)号：US20200299842A1

公开(公告)日：2020-09-24

申请号：US16894256

申请日：2020-06-05

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Neil MORRISON

IPC: C23C16/54 ,  C23C16/44 ,  C23C16/509 ,  C23C16/455 ,  C23C14/56

Abstract: An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

公开(公告)号：US20200165721A1

公开(公告)日：2020-05-28

申请号：US16075914

申请日：2016-02-12

Applicant: Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK ,  Applied Materials, Inc.

Inventor： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK

IPC: C23C14/56 ,  C23C16/54 ,  B65G39/18 ,  B05C9/14 ,  B05C1/08 ,  C23C16/458 ,  C23C16/511

Abstract: A vacuum processing system for a flexible substrate is provided. The vacuum processing system includes a first chamber adapted for housing a supply roll for providing the flexible substrate; a second chamber adapted for housing a take-up roll for storing the flexible substrate after processing; a substrate transport arrangement including one or more guide rollers for guiding the flexible substrate from the first chamber to the second chamber; a maintenance zone between the first chamber and the second chamber wherein the maintenance zone allows for maintenance access to or of at least one of the first chamber and the second chamber; and a first process chamber for processing the flexible substrate.

公开(公告)号：US20230113276A1

公开(公告)日：2023-04-13

申请号：US17946716

申请日：2022-09-16

Applicant: Applied Materials, Inc.

Inventor： Wei-Sheng LEI ,  Girish Kumar GOPALAKRISHNAN NAIR ,  Kent Qiujing ZHAO ,  Daniel STOCK ,  Tobias STOLLEY ,  Thomas DEPPISCH ,  Jean DELMAS ,  Kenneth S. LEDFORD ,  Subramanya P. HERLE ,  Kiran VACHHANI ,  Mahendran CHIDAMBARAM ,  Roland TRASSL ,  Neil MORRISON ,  Frank SCHNAPPENBERGER ,  Kevin Laughton CUNNINGHAM ,  Stefan BANGERT ,  James CUSHING ,  Visweswaren SIVARAMAKRISHNAN

IPC: H01M50/102

Abstract: Methods and apparatuses for processing lithium batteries with a laser source having a wide process window, high efficiency, and low cost are provided. The laser source is adapted to achieve high average power and a high frequency of picosecond pulses. The laser source can produce a line-shaped beam either in a fixed position or in scanning mode. The system can be operated in a dry room or vacuum environment. The system can include a debris removal mechanism, for example, inert gas flow, to the processing site to remove debris produced during the patterning process.

公开(公告)号：US20190112706A1

公开(公告)日：2019-04-18

申请号：US16217027

申请日：2018-12-11

Applicant: Applied Materials, Inc.

Inventor： Hans-Georg LOTZ ,  Neil MORRISON ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

IPC: C23C16/458 ,  H01J37/32 ,  C23C14/56

Abstract: An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

公开(公告)号：US20180100236A1

公开(公告)日：2018-04-12

申请号：US15837893

申请日：2017-12-11

Applicant: Applied Materials, Inc.

Inventor： Neil Morrison ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

IPC: C23C16/54 ,  H01J37/32 ,  C23C16/455 ,  C23C16/50

Abstract: An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate along a surface of the substrate support through a first vacuum processing region and at least one second vacuum processing region, a first deposition sources corresponding to the first processing region and at least one second deposition source corresponding to the at least one second vacuum processing region. The apparatus further includes one or more vacuum flanges providing at least a further gas outlet between the first deposition source and the at least one second deposition source.

公开(公告)号：US20170058404A1

公开(公告)日：2017-03-02

申请号：US15351279

申请日：2016-11-14

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Morrison NEIL

IPC: C23C16/54 ,  C23C16/44

Abstract: An apparatus for processing a flexible substrate is described. The apparatus includes a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion, an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate having the thin film deposited thereon, wherein the unwinding shaft and the winding shaft are arranged in the first chamber portion, at least one gap sluice for separating the first chamber portion from the second chamber portion, wherein the gap sluice is configured such that the flexible substrate can move there through and the gap sluice can be opened and closed for providing a vacuum seal, a coating drum having a rotation axis and a curved outer surface for guiding the substrate along the curved outer surface through a first vacuum processing region and at least one second vacuum processing region, wherein a first portion of the coating drum is provided in the second chamber portion and the remaining portion of the coating drum is provided in the third chamber portion, a first processing station corresponding to the first processing region and at least one second processing station corresponding to the at least one second vacuum processing region, wherein the first processing station and the second processing station each includes a flange portion for providing a vacuum connection. Further, the third chamber portion has a convex shaped chamber wall portion, wherein the third chamber portion has at least two openings provided therein, particularly wherein the at least two openings are essentially parallel to the convex shaped chamber wall portion; and wherein the first processing station and the at least one second processing station are configured to be received in the at least two openings, wherein the flange portions of the first processing station and the second processing station provide a vacuum tight connection with the third chamber.

公开(公告)号：US20140212599A1

公开(公告)日：2014-07-31

申请号：US13871874

申请日：2013-04-26

Applicant: Applied Materials, Inc.

Inventor： Wolfgang BUSCHBECK ,  Florian RIES ,  Tobias STOLLEY

IPC: C23C16/52

CPC classification number: C23C16/52 ,  C23C14/562 ,  H01J37/32568 ,  H01J37/3277

Abstract: An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate through a vacuum processing region, a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode, and an actuator configured for adjusting the distance between the electrode and the outer surface.

Abstract translation: 描述了一种在衬底上沉积薄膜的装置。 该装置包括具有用于引导基板通过真空处理区域的外表面的基板支撑件，用于在真空处理区域中将薄膜沉积在基板上的等离子体沉积源，其中等离子体沉积源包括电极和致动器 被配置为调节电极和外表面之间的距离。

公开(公告)号：US20140208565A1

公开(公告)日：2014-07-31

申请号：US13871789

申请日：2013-04-26

Applicant: Applied Materials, Inc.

Inventor： Hans-Georg LOTZ ,  Neil MORRISON ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

IPC: C23C16/458

CPC classification number: C23C16/458 ,  C23C14/562 ,  C23C16/45519 ,  C23C16/545 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32761 ,  H01J37/3277 ,  Y10T29/49826

Abstract: An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

Abstract translation: 描述了在柔性基板上涂覆薄膜的设备。 该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及 适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通 气体分离单元的位置。