COMPOSITION FOR HYDROPHOBIC TREATMENT AND GLAZING
    1.
    发明申请
    COMPOSITION FOR HYDROPHOBIC TREATMENT AND GLAZING 有权
    组合物用于水处理和玻璃化

    公开(公告)号:US20090324968A1

    公开(公告)日:2009-12-31

    申请号:US12307927

    申请日:2007-07-10

    IPC分类号: B32B17/06 C09D5/00

    摘要: Hydrophobic treatment composition comprising one or more compounds, as a mixture, corresponding to the formula in which at least one R is a CaF2a+1 group, a being an integer, it being possible for another R to be an SiX3-bRCb1 group, b being 0, 1 or 2X being a hydrolysable group, such as alkoxy, hydroxyl or halo R1 being a hydrocarbon group, such as lower alkyl S is a hydrogen atom, an OH group, an alkyl group, in particular a lower alkyl group, such as CH3, or an OSiR2R3R4 group, R2, R3 and R4 being identical or different and consisting in particular of one of the abovementioned groups carried by an Si atom, such as (CH2)2—R, a hydrogen atom, an alkyl group or OSIR2R3R4, n is an integer≧1, the total number of Si atoms not exceeding 20. Process for treatment by this composition.Hydrophobic glass substrate thus obtained and its application, in particular as glazing.

    摘要翻译: 疏水性处理组合物,其包含一种或多种化合物,作为混合物,其中至少一个R为CaF 2 a + 1基团,a为整数,另外R为SiX 3-bRC b 1基团的式 0或1或2个X为可水解基团,例如烷氧基,羟基或卤素R 1为烃基,例如低级烷基S为氢原子,OH基团,烷基,特别是低级烷基, 例如CH 3或OSiR 2 R 3 R 4基团,R 2,R 3和R 4相同或不同,特别由上述基团之一由Si原子例如(CH 2)2 -R,氢原子,烷基 或OSIR2R3R4,n为整数> = 1,Si原子总数不超过20.用该组合物处理的方法。 这样得到的疏水玻璃基板及其应用,特别是玻璃。

    Hydrophobic treatment composition and glazing
    2.
    发明授权
    Hydrophobic treatment composition and glazing 有权
    疏水处理组合物和玻璃

    公开(公告)号:US08415016B2

    公开(公告)日:2013-04-09

    申请号:US12307927

    申请日:2007-07-10

    IPC分类号: B32B9/04

    摘要: Hydrophobic treatment composition comprising one or more compounds, as a mixture, corresponding to the formula in which at least one R is a CaF2a+1 group, a being an integer, it being possible for another R to be an SiX3-bRC1b group, b being 0, 1 or 2 X being a hydrolysable group, such as alkoxy, hydroxyl or halo R1 being a hydrocarbon group, such as lower alkyl S is a hydrogen atom, an OH group, an alkyl group, in particular a lower alkyl group, such as CH3, or an OSiR2R3R4 group, R2, R3 and R4 being identical or different and consisting in particular of one of the abovementioned groups carried by an Si atom, such as (CH2)2—R, a hydrogen atom, an alkyl group or OSIR2R3R4, n is an integer≧1, the total number of Si atoms not exceeding 20. Process for treatment by this composition. Hydrophobic glass substrate thus obtained and its application, in particular as glazing.

    摘要翻译: 疏水性处理组合物,其包含一种或多种化合物,作为其中至少一个R为CaF 2 a + 1基团的化合物的混合物,a为整数,另外R可为SiX 3-bRC 1 b基团,b 0或1或2个X为可水解基团,例如烷氧基,羟基或卤素R 1为烃基,例如低级烷基S为氢原子,OH基团,烷基,特别是低级烷基, 例如CH 3或OSiR 2 R 3 R 4基团,R 2,R 3和R 4相同或不同,特别由上述基团之一由Si原子例如(CH 2)2 -R,氢原子,烷基 或OSIR2R3R4,n为1以上的整数,Si原子数不超过20个。 这样得到的疏水玻璃基板及其应用,特别是玻璃。

    Process for manufacturing colloidal materials, colloidal materials and their uses
    3.
    发明授权
    Process for manufacturing colloidal materials, colloidal materials and their uses 有权
    制造胶体材料,胶体材料及其用途的方法

    公开(公告)号:US09011715B2

    公开(公告)日:2015-04-21

    申请号:US13063543

    申请日:2009-09-10

    IPC分类号: C09K11/06 C30B7/00 B01J13/00

    CPC分类号: B01J13/0026 B01J13/00

    摘要: A colloidal material and a process for manufacturing it and uses of the colloidal material for manufacturing optic devices. The colloidal material is of formula AnXm, wherein A is an element selected from groups II, III or IV of the periodic table; X is a metal selected from groups V or VI; and in the selection of the pair (A, X), the groups of the periodic table of A and X, respectively, are selected from the following combinations: (group II, group VI), (group III, group V) or (group IV, group VI); and n and m are such that AnXm is a neutral compound. The colloidal compound may be CdS, InP, or PbS. The process includes a step of solution phase decomposition of a mixture of X and a carboxylate of formula A(R—COO)p in the presence of a non- or weakly-coordinating solvent, and injecting an acetate salt or acetic acid in the mixture; wherein p is an integer between 1 and 2; R is a linear or branched C1-30alkyl group.

    摘要翻译: 胶体材料及其制造方法以及用于制造光学器件的胶体材料的用途。 胶体材料具有式AnXm,其中A是选自元素周期表II,III或IV族的元素; X是选自V或VI族的金属; 在选择对(A,X)中,分别选自A和X的周期表的组,其组合如下:(组II,组VI),(组III,组V)或( 第四组,第六组); 并且n和m使得AnXm是中性化合物。 胶体化合物可以是CdS,InP或PbS。 该方法包括在非配位或非配位溶剂存在下将式A(R-COO)p的X和羧酸酯的混合物溶解相分解的步骤,并在该混合物中注入乙酸盐或乙酸 ; 其中p是1和2之间的整数; R是直链或支链的C 1-3烷基。

    PROCESS FOR MANUFACTURING COLLOIDAL MATERIALS, COLLOIDAL MATERIALS AND THEIR USES
    4.
    发明申请
    PROCESS FOR MANUFACTURING COLLOIDAL MATERIALS, COLLOIDAL MATERIALS AND THEIR USES 有权
    制造胶体材料,胶体材料及其用途的方法

    公开(公告)号:US20110248222A1

    公开(公告)日:2011-10-13

    申请号:US13063543

    申请日:2009-09-10

    IPC分类号: H01B1/00 B82Y30/00

    CPC分类号: B01J13/0026 B01J13/00

    摘要: The present invention relates to a process for manufacturing a colloidal material, to colloidal materials obtainable by this process and to uses of said colloidal material for the manufacture of optic devices. The colloidal material obtainable by the process of the present invention is of formula AnXm, wherein A is an element selected from groups II, III or IV of the periodic table, wherein X is a metal selected from groups V or VI of the periodic table, and wherein, in the selection of the pair (A, X), the groups of the periodic table of A and X, respectively, are selected from the following combinations: (group II, group VI), (group III, group V) or (group IV, group VI); and wherein n and m are such that AnXm is a neutral compound. For example, the colloidal compound obtainable by the process of the present invention may be CdS, In P, or PbS. Other examples are provided below. The process of the present invention comprises a step of solution phase decomposition of a mixture of X and a carboxylate of formula A(R—COO)p in the presence of a non- or weakly-coordinating solvent, and a step of injecting an acetate salt or acetic acid in the mixture; wherein p is an integer between 1 and 2; R is a linear or branched C1-30alkyl group. The colloidal material of the present invention may be used for example for the manufacture of a laser or an optoelectronic device.

    摘要翻译: 本发明涉及一种胶体材料的制造方法,可通过该方法获得的胶体材料以及所述胶体材料用于制造光学装置的用途。 通过本发明的方法得到的胶态材料具有式AnXm,其中A是选自元素周期表的II,III或IV族的元素,其中X是选自元素周期表V或VI族的金属, 并且其中,在选择对(A,X)时,A和X的周期表分别分别选自以下组合:(组II,组VI),(组III,组V) 或(IV组,VI组); 并且其中n和m使得AnXm是中性化合物。 例如,可以通过本发明的方法获得的胶体化合物可以是CdS,In P或PbS。 以下提供其他示例。 本发明的方法包括在非配位或非配位溶剂的存在下,将式A(R-COO)p的X和羧酸酯的混合物溶解相分解的步骤和注入乙酸酯 盐或乙酸; 其中p是1和2之间的整数; R是直链或支链的C 1-3烷基。 本发明的胶体材料可用于例如制造激光或光电器件。

    PROCESS FOR MANUFACTURING COLLOIDAL NANOSHEETS BY LATERAL GROWTH OF NANOCRYSTALS
    5.
    发明申请
    PROCESS FOR MANUFACTURING COLLOIDAL NANOSHEETS BY LATERAL GROWTH OF NANOCRYSTALS 审中-公开
    通过纳米晶的生长制造胶体纳米粒子的方法

    公开(公告)号:US20130220405A1

    公开(公告)日:2013-08-29

    申请号:US13881450

    申请日:2011-10-24

    摘要: A process for manufacturing colloidal nanosheet, by lateral growth, on an initial colloidal nanocrystal, of a crystalline semiconductor material represented by the formula MnXy, where M is a transition metal and X a chalcogen. The process includes the following steps: The preparation of a first organic solution, non or barely coordinating used as a synthesis solvent and including at least one initial colloidal nanocrystal; The preparation of a second organic solution including precursors of M and X, and including an acetate salt. And the slow introduction over a predetermined time scale of a predetermined amount of the second solution in a predetermined amount of the first solution, at a predetermined temperature for the growth of nanosheets. The use of the obtained material is also presented.

    摘要翻译: 通过横向生长在初始胶体纳米晶体上制造由式MnXy表示的结晶半导体材料的胶态纳米片的方法,其中M是过渡金属,X是硫属元素。 该方法包括以下步骤:制备第一有机溶液,非或几乎不配位用作合成溶剂并包括至少一种初始胶体纳米晶体; 制备包含M和X的前体并包括乙酸盐的第二有机溶液。 并且在用于生长纳米片的预定温度下,以预定量的第一溶液在预定量的第二溶液中预定量的第二溶液缓慢引入。 还提供了所获得的材料的使用。