公开(公告)号：US07413036B2

公开(公告)日：2008-08-19

申请号：US10591549

申请日：2004-03-04

申请人： Arnold R. Law ,  Ajay Kumar

发明人： Arnold R. Law ,  Ajay Kumar

IPC分类号： E21B17/07

CPC分类号： E21B17/076

摘要： A telescoping sub (50) for mining operations and the like. The telescoping sub (50) includes a rotor (94) portion coupleadle to the rotary head of a drilling rig, and a stator (74) portion that is coupleable to a drill rod. The rotor (94) portion is slideadly coupled to the stator (74) portion and is moveable with respect thereto between an extended position and a retracted position. With the telescoping sub (50) in the retracted position, the drilling rig is operated to drill to a first depth. The drilling rig is then operated to move the rotor (94) portion to the extended position, and the drilling rig is operated to drill to a second depth that is greater than the first depth.

摘要翻译： 用于采矿作业的伸缩子（50）等。 伸缩子（50）包括到钻机的旋转头的转子（94）部分联接件和可耦合到钻杆的定子（74）部分。 转子（94）部分滑动地联接到定子（74）部分并且可以在延伸位置和缩回位置之间相对于其移动。 当伸缩式副（50）处于缩回位置时，钻机被操作以钻到第一深度。 然后操作钻机以将转子（94）部分移动到延伸位置，并且钻机被操作以钻到大于第一深度的第二深度。

公开(公告)号：US07325634B2

公开(公告)日：2008-02-05

申请号：US11165145

申请日：2005-06-23

申请人： Arnold R. Law ,  Ajay Kumar

发明人： Arnold R. Law ,  Ajay Kumar

IPC分类号： B60G17/04

CPC分类号： E21B7/024

摘要： A drilling machine includes a frame, two tracks, and a plurality of yokes interconnecting the frame and the tracks. Each yoke is pivotable with respect to the frame by the extension and retraction of a hydraulic cylinder. Each of a plurality of sensors senses a parameter indicative of force and generates a signal representing the force. A controller receives the force signals, and generates control signals to extend or retract the hydraulic cylinders when an associated force deviation for a hydraulic cylinder exceeds a predetermined magnitude.

摘要翻译： 钻机包括框架，两个轨道以及将框架和轨道互连的多个轭架。 每个轭通过液压缸的伸缩而相对于框架枢转。 多个传感器中的每一个感测指示力的参数并产生表示力的信号。 当液压缸的相关力偏差超过预定幅度时，控制器接收力信号，并且产生控制信号以延伸或缩回液压缸。

公开(公告)号：US07461712B2

公开(公告)日：2008-12-09

申请号：US11953434

申请日：2007-12-10

申请人： Arnold R. Law ,  Ajay Kumar

发明人： Arnold R. Law ,  Ajay Kumar

IPC分类号： B62D55/084

CPC分类号： E21B7/024

摘要： A drilling machine includes a frame, a tower that is supported by the frame, two tracks for movement over the ground, at least three yokes that interconnect the frame and the two tracks, at least three hydraulic cylinders, an inclinometer that senses the inclination of the frame and produces an output signal that is indicative of the inclination of the frame, and a controller that receives the output signal from the inclinometer. The tower includes a drill string. Each yoke is connected to the frame and one of the tracks. Each hydraulic cylinder is extendible and retractable in response to an associated control signal and connected to the frame and an associated yoke. The controller generates control signals for the hydraulic cylinders such that the hydraulic cylinders are controlled to extend or retract to maintain the frame in a level position.

摘要翻译： 钻机包括框架，由框架支撑的塔架，用于在地面上移动的两个轨道，至少三个将框架和两个轨道相互连接的轭架，至少三个液压缸，一个感测倾斜度 并且产生表示帧的倾斜度的输出信号，以及接收来自倾斜仪的输出信号的控制器。 该塔包括钻柱。 每个轭连接到框架和轨道之一。 每个液压缸响应于相关联的控制信号而可延伸和缩回，并连接到框架和相关联的轭。 控制器产生用于液压缸的控制信号，使得液压缸被控制以延伸或缩回以将框架保持在水平位置。

公开(公告)号：US07438143B2

公开(公告)日：2008-10-21

申请号：US11953438

申请日：2007-12-10

申请人： Arnold R. Law ,  Ajay Kumar

发明人： Arnold R. Law ,  Ajay Kumar

IPC分类号： B62D55/00

CPC分类号： E21B7/024

摘要： A drilling machine includes a frame, a tower that is supported by the frame, two tracks for movement over the ground, at least four yokes that interconnect the frame and the two tracks, a plurality of hydraulic cylinders, a plurality of sensors, and a controller. The tower includes a drill string. Each yoke is connected to the frame and one of the tracks. Each hydraulic cylinder is movable in response to a control signal and connected to the frame and a yoke. Each sensor senses a parameter indicative of force and generates an output signal that represents the force. The controller receives the output signals from the sensors, determines a center of gravity of the drilling machine, and generates the control signals for the hydraulic cylinders based on the center of gravity. Each hydraulic cylinder is controlled to move to maintain the center of gravity within a boundary area.

摘要翻译： 钻机包括框架，由框架支撑的塔架，用于在地面上移动的两个轨道，至少四个连接框架和两个轨道的轭，多个液压缸，多个传感器和 控制器。 该塔包括钻柱。 每个轭连接到框架和轨道之一。 每个液压缸可响应于控制信号而移动，并连接到框架和轭。 每个传感器感测指示力的参数，并产生表示力的输出信号。 控制器从传感器接收输出信号，确定钻机的重心，并根据重心生成液压缸的控制信号。 每个液压缸被控制以移动以将重心保持在边界区域内。

公开(公告)号：US07789918B2

公开(公告)日：2010-09-07

申请号：US11547458

申请日：2004-08-09

申请人： Deepak Kumar Tuli ,  Ajay Kumar Arora ,  Shanti Prakash ,  Rajiv Ranjan ,  Krishan Kumar Swami ,  Ajay Kumar ,  Rakesh Sarin ,  Ram Prakash Verma ,  Niranjan Raghunath Raje

发明人： Deepak Kumar Tuli ,  Ajay Kumar Arora ,  Shanti Prakash ,  Rajiv Ranjan ,  Krishan Kumar Swami ,  Ajay Kumar ,  Rakesh Sarin ,  Ram Prakash Verma ,  Niranjan Raghunath Raje

IPC分类号： C10L1/18 ,  C10L1/32 ,  C10M169/04

CPC分类号： C10L10/08 ,  C10L1/18 ,  C10L1/1881 ,  C10L1/19 ,  C10L1/191

摘要： The present invention relates to a additive composition for use as lubricity improver for low sulphur diesel, comprising c) 0.1-10% by weight of ester derivative derived from cashew nut shell liquid (CNSL esters) of formula (I); f) 0.1-10% by weight of ester derivative derived from cashew nut shell liquid of formula (II); g) 50-95% by weight of free fatty acid of the formula RCOOH in which R represents an alkyl/alkenyl group with 12 to 24 carbon atoms. h) 1-30% by weight of synthetic esters derived by esterifying tri, tetra, penta hydric alcohols with carboxylic acids such as lauric, palmitic, linoleic, ricinoleic etc.

摘要翻译： 本发明涉及一种用作低硫柴油的润滑改进剂的添加剂组合物，其包含c）0.1-10重量％衍生自式（I）的腰果壳液（CNSL酯）的酯衍生物; f）0.1-10重量％衍生自式（II）的腰果壳液的酯衍生物; g）50-95重量％的式RCOOH的游离脂肪酸，其中R表示具有12至24个碳原子的烷基/链烯基。 h）1-30重量％的通过酯化三，四，五羟基醇与羧酸如月桂酸，棕榈酸，亚油酸，蓖麻油酸等衍生的合成酯。

公开(公告)号：US20080098642A1

公开(公告)日：2008-05-01

申请号：US11547458

申请日：2004-08-09

申请人： Deepak Kumar Tuli ,  Ajay Kumar Arora ,  Shanti Prakash ,  Rajiv Ranjan ,  Krishan Kumar Swami ,  Ajay Kumar ,  Rakesh Sarin ,  Ram Prakash Verma ,  Niranjan Raghunath Raje

发明人： Deepak Kumar Tuli ,  Ajay Kumar Arora ,  Shanti Prakash ,  Rajiv Ranjan ,  Krishan Kumar Swami ,  Ajay Kumar ,  Rakesh Sarin ,  Ram Prakash Verma ,  Niranjan Raghunath Raje

IPC分类号： C10L1/18

CPC分类号： C10L10/08 ,  C10L1/18 ,  C10L1/1881 ,  C10L1/19 ,  C10L1/191

摘要： The present invention relates to a additive composition for use as lubricity improver for low sulphur diesel, comprising c) 0.1-10% by weight of ester derivative derived from cashew nut shell liquid (CNSL esters) of formula (I); f) 0.1-10% by weight of ester derivative derived from cashew nut shell liquid of formula (II); g) 50-95% by weight of free fatty acid of the formula RCOOH in which R represents an alkyl/alkenyl group with 12 to 24 carbon atoms. h) 1-30% by weight of synthetic esters derived by esterifying tri, tetra, penta hydric alcohols with carboxylic acids such as lauric, palmitic, linoleic, ricinoleic etc.

摘要翻译： 本发明涉及一种用作低硫柴油的润滑改进剂的添加剂组合物，其包含c）0.1-10重量％衍生自式（I）的腰果壳液（CNSL酯）的酯衍生物; f）0.1-10重量％衍生自式（II）的腰果壳液的酯衍生物; g）50-95重量％的式RCOOH的游离脂肪酸，其中R表示具有12至24个碳原子的烷基/链烯基。 h）1-30重量％的通过酯化三，四，五羟基醇与羧酸如月桂酸，棕榈酸，亚油酸，蓖麻油酸等衍生的合成酯。

公开(公告)号：US20170342086A1

公开(公告)日：2017-11-30

申请号：US15013616

申请日：2016-02-02

申请人： Ajay Kumar

发明人： Ajay Kumar

IPC分类号： C07D491/153 ,  G01N21/65 ,  A61K31/337 ,  G01N33/574 ,  A61K31/4741

CPC分类号： C07D491/153 ,  A61K31/337 ,  A61K31/4741 ,  A61K45/06 ,  G01N21/658 ,  G01N33/57496 ,  G01N2333/47 ,  G01N2333/914 ,  A61K2300/00

摘要： The disclosure provides compounds and methods for treating cancer by inhibiting the formation of cancer cells resistant to paclitaxel by preventing the formation of GBP1:PIM1 protein interaction during a chemotherapeutic treatment. These compounds and methods are able to treat cancer individually or in conjunction with paclitaxel.

公开(公告)号：US20160365283A1

公开(公告)日：2016-12-15

申请号：US14738389

申请日：2015-06-12

申请人： Wei-Sheng Lei ,  Mohammad Kamruzzaman Chowdhury ,  Brad Eaton ,  Ajay Kumar

发明人： Wei-Sheng Lei ,  Mohammad Kamruzzaman Chowdhury ,  Brad Eaton ,  Ajay Kumar

IPC分类号： H01L21/82 ,  H01L21/308 ,  H01J37/32 ,  H01L21/02 ,  H01L21/67 ,  H01L21/3065 ,  H01L21/268

CPC分类号： H01L21/82 ,  H01J37/32889 ,  H01J37/32899 ,  H01J2237/334 ,  H01J2237/335 ,  H01L21/02057 ,  H01L21/02076 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31105 ,  H01L21/31127 ,  H01L21/32131 ,  H01L21/67207 ,  H01L21/78

摘要： Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a method of dicing a semiconductor wafer including a plurality of integrated circuits includes forming a water soluble mask above the semiconductor wafer, the water soluble mask covering and protecting the integrated circuits. The method also includes baking the water soluble mask to increase the etch resistance of the water soluble mask. The method also includes, subsequent to baking the water soluble mask, patterning the water soluble mask with a laser scribing process to provide a water soluble patterned mask with gaps, exposing regions of the semiconductor wafer between the integrated circuits. The method also includes plasma etching the semiconductor wafer through the gaps in the water soluble patterned mask to singulate the integrated circuits.

摘要翻译： 对具有多个集成电路的每个晶片进行切割的半导体晶片的方法进行了说明。 在一个实例中，对包括多个集成电路的半导体晶片进行切割的方法包括在半导体晶片上形成水溶性掩模，所述水溶性掩模覆盖并保护集成电路。 该方法还包括烘烤水溶性面罩以增加水溶性面膜的耐蚀刻性。 该方法还包括在烘焙水溶性掩模之后，用激光划线工艺图案化水溶性掩模，以提供具有间隙的水溶性图案化掩模，暴露集成电路之间的半导体晶片的区域。 该方法还包括通过水溶性图案化掩模中的间隙等离子体蚀刻半导体晶片以对集成电路进行分离。

公开(公告)号：US20160315009A1

公开(公告)日：2016-10-27

申请号：US14697391

申请日：2015-04-27

申请人： Wei-Sheng Lei ,  Brad Eaton ,  Jungrae Park ,  Ajay Kumar ,  James S. Papanu ,  Prabhat Kumar

发明人： Wei-Sheng Lei ,  Brad Eaton ,  Jungrae Park ,  Ajay Kumar ,  James S. Papanu ,  Prabhat Kumar

IPC分类号： H01L21/78 ,  H01L21/683 ,  H01L21/268 ,  H01L21/67 ,  H01L21/308 ,  H01L21/3065

CPC分类号： H01L21/78 ,  H01L21/268 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/67069 ,  H01L21/67207 ,  H01L21/6836 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381

摘要： Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a method of dicing a semiconductor wafer having a plurality of integrated circuits on a front side of the semiconductor wafer includes adhering a back side the semiconductor wafer on the dicing tape of a substrate carrier. Subsequent to adhering the semiconductor wafer on a dicing tape, the dicing tape is treated with a UV-cure process. Subsequent to treating the dicing tape with the UV-cure process, a dicing mask is formed on the front side of the semiconductor wafer, the dicing mask covering and protecting the integrated circuits. The dicing mask is patterned with a laser scribing process to provide gaps in the dicing mask, the gaps exposing regions of the semiconductor wafer between the integrated circuits. The semiconductor wafer is plasma etched through the gaps in the dicing mask layer to singulate the integrated circuits.

摘要翻译： 对具有多个集成电路的每个晶片进行切割的半导体晶片的方法进行了说明。 在一个示例中，在半导体晶片的正面上切割具有多个集成电路的半导体晶片的方法包括将半导体晶片的背面粘附在基板载体的切割带上。 在将半导体晶片粘附在切割带上之后，用UV固化工艺处理切割带。 在通过UV固化处理处理切割带之后，在半导体晶片的前侧形成切割掩模，该切割掩模覆盖并保护集成电路。 用激光刻划工艺对切割掩模进行图案化，以在切割掩模之间提供间隙，在半导体晶片的间隙暴露在集成电路之间。 通过切割掩模层中的间隙对半导体晶片进行等离子体蚀刻，以对集成电路进行分离。

公开(公告)号：US20160086852A1

公开(公告)日：2016-03-24

申请号：US14491856

申请日：2014-09-19

申请人： James M. Holden ,  Alexander N. Lerner ,  Ajay Kumar ,  Aparna Iyer ,  Alan Hiroshi Ouye

发明人： James M. Holden ,  Alexander N. Lerner ,  Ajay Kumar ,  Aparna Iyer ,  Alan Hiroshi Ouye

IPC分类号： H01L21/78 ,  H01J37/32 ,  H01L21/67 ,  H01L21/683 ,  H01L21/3065 ,  H01L21/308

摘要： Methods of and carriers for dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a cover ring for protecting a carrier and substrate assembly during an etch process includes an inner opening having a diameter smaller than the diameter of a substrate of the carrier and substrate assembly. An outer frame surrounds the inner opening. The outer frame has a bevel for accommodating an outermost portion of the substrate of the carrier and substrate assembly.

摘要翻译： 描述了半导体晶片切割的方法和载体，每个晶片具有多个集成电路。 在一个示例中，用于在蚀刻工艺期间保护载体和基底组件的盖环包括直径小于载体和基底组件的基底的直径的内部开口。 外框围绕内开口。 外框架具有用于容纳载体和基底组件的基底的最外部分的斜面。