公开(公告)号：US20140235064A1

公开(公告)日：2014-08-21

申请号：US14240931

申请日：2012-08-17

申请人： Atsushi Matsui ,  Mayumi Kimura ,  Tsuguhiro Tago

发明人： Atsushi Matsui ,  Mayumi Kimura ,  Tsuguhiro Tago

IPC分类号： C09K13/08 ,  H01L21/306 ,  C09K13/06

CPC分类号： C09K13/08 ,  C09K13/00 ,  C09K13/06 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31144

摘要： This invention is concerning an etchant composition used to etch a silicon-containing film formed on a target substrate. The etchant composition includes at least one selected from the group consisting of an organic compound containing a hydroxyl group, an organic compound containing a carbonyl group, an inorganic acid and inorganic salt, hydrofluoric acid, ammonium fluoride and an organic acid.

摘要翻译： 本发明涉及用于蚀刻形成在目标基底上的含硅膜的蚀刻剂组合物。 蚀刻剂组合物包括选自含有羟基的有机化合物，含有羰基的有机化合物，无机酸和无机盐，氢氟酸，氟化铵和有机酸中的至少一种。

公开(公告)号：US09193904B2

公开(公告)日：2015-11-24

申请号：US14240931

申请日：2012-08-17

申请人： Atsushi Matsui ,  Mayumi Kimura ,  Tsuguhiro Tago

发明人： Atsushi Matsui ,  Mayumi Kimura ,  Tsuguhiro Tago

IPC分类号： C03C15/00 ,  C09K13/08 ,  H01L21/311 ,  C09K13/06 ,  H01L21/306 ,  C09K13/00

CPC分类号： C09K13/08 ,  C09K13/00 ,  C09K13/06 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/31144

摘要： This invention is concerning an etchant composition used to etch a silicon-containing film formed on a target substrate. The etchant composition includes at least one selected from the group consisting of an organic compound containing a hydroxyl group, an organic compound containing a carbonyl group, an inorganic acid and inorganic salt, hydrofluoric acid, ammonium fluoride and an organic acid.

摘要翻译： 本发明涉及用于蚀刻形成在目标衬底上的含硅膜的蚀刻剂组合物。 蚀刻剂组合物包括选自含有羟基的有机化合物，含有羰基的有机化合物，无机酸和无机盐，氢氟酸，氟化铵和有机酸中的至少一种。

公开(公告)号：US08545716B2

公开(公告)日：2013-10-01

申请号：US12438143

申请日：2008-07-16

申请人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

发明人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

IPC分类号： C09K13/06

CPC分类号： H01L21/32134 ,  C23F1/20 ,  H01L21/32139

摘要： A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness.A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate.The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt.In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.In addition, the etching liquid composition according to the present invention is used when the metal film is formed of aluminum or an aluminum alloy.

摘要翻译： 蚀刻具有良好可控性的铝膜或铝合金膜等金属膜，防止抗蚀剂渗色，具有适当的锥形构造和优异的平坦度。 使用含有磷酸，硝酸和有机酸盐的水溶液作为用于蚀刻基板上的金属膜的蚀刻液组合物。 有机酸盐由脂肪族一元羧酸，脂肪族多元羧酸，脂肪族二羧酸，芳香族单羧酸，芳香族多元羧酸，芳香族羟基羧酸等组成的组中选出的一种， 由铵盐，胺盐，季铵盐和碱金属盐组成的组。 另外，有机酸盐的浓度为0.1〜20重量％。 此外，当金属膜由铝或铝合金形成时，使用根据本发明的蚀刻液组合物。

公开(公告)号：US20100230631A1

公开(公告)日：2010-09-16

申请号：US12438143

申请日：2008-07-16

申请人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

发明人： Tsuguhiro Tago ,  Tomotake Matsuda ,  Mayumi Kimura ,  Tetsuo Aoyama

IPC分类号： C09K13/06

CPC分类号： H01L21/32134 ,  C23F1/20 ,  H01L21/32139

摘要： A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness.A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate.The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt.In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.In addition, the etching liquid composition according to the present invention is used when the metal film is formed of aluminum or an aluminum alloy.

摘要翻译： 蚀刻具有良好可控性的铝膜或铝合金膜等金属膜，防止抗蚀剂渗色，具有适当的锥形构造和优异的平坦度。 使用含有磷酸，硝酸和有机酸盐的水溶液作为用于蚀刻基板上的金属膜的蚀刻液组合物。 有机酸盐由脂肪族一元羧酸，脂肪族多元羧酸，脂肪族二羧酸，芳香族单羧酸，芳香族多元羧酸，芳香族羟基羧酸等组成的组中选出的一种， 由铵盐，胺盐，季铵盐和碱金属盐组成的组。 另外，有机酸盐的浓度为0.1〜20重量％。 此外，当金属膜由铝或铝合金形成时，使用根据本发明的蚀刻液组合物。

公开(公告)号：US20090218542A1

公开(公告)日：2009-09-03

申请号：US12393090

申请日：2009-02-26

申请人： Kenji Isami ,  Mayumi Kimura ,  Tetsuo Aoyama ,  Tsuguhiro Tago

发明人： Kenji Isami ,  Mayumi Kimura ,  Tetsuo Aoyama ,  Tsuguhiro Tago

IPC分类号： C09K13/02 ,  C09K13/00

CPC分类号： C09K13/00 ,  C09K13/02 ,  H01L21/30608

摘要： An etchant composition contains (a) an alkaline compound mixture of an organic alkaline compound and inorganic alkaline compound and (b) a silicon-containing compound. The organic alkaline compound is composed of one or more ingredients from quaternary ammonium hydroxide and ethylenediamine. The inorganic alkaline compound is composed of one or more ingredients from sodium hydroxide, potassium hydroxide, ammonia and hydrazine. The silicon-containing inorganic compound is composed of one or more ingredients from metal silicon, fumed silica, colloidal silica, silica gel, silica sol, diatomaceous earth, acid clay and activated clay, and the silicon-containing organic compound is composed of one or more ingredients from quaternary ammonium salts of alkyl silicate and quaternary ammonium salts of alkyl silicic acid.

摘要翻译： 蚀刻剂组合物包含（a）有机碱性化合物和无机碱性化合物的碱性化合物混合物和（b）含硅化合物。 有机碱性化合物由氢氧化季铵和乙二胺的一种或多种成分组成。 无机碱性化合物由一种或多种来自氢氧化钠，氢氧化钾，氨和肼的成分组成。 含硅无机化合物由金属硅，热解法二氧化硅，胶体二氧化硅，硅胶，二氧化硅溶胶，硅藻土，酸性粘土和活性白土中的一种或多种成分组成，含硅有机化合物由一种或多种 更多的成分来自烷基硅酸盐的季铵盐和烷基硅酸的季铵盐。

公开(公告)号：US20060094612A1

公开(公告)日：2006-05-04

申请号：US10980247

申请日：2004-11-04

申请人： Mayumi Kimura

发明人： Mayumi Kimura

IPC分类号： C11D7/32

CPC分类号： G03F7/425 ,  C11D3/0073 ,  C11D3/2086 ,  C11D3/30 ,  C11D3/43 ,  C11D7/265 ,  C11D7/266 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/5004 ,  C11D11/0047 ,  G03F7/426

摘要： A composition used for removing a photoresist, polymeric material, or residue from a substrate contains a corrosion inhibitor that is a derivative of gallic acid that is soluble in water-miscible organic solvents, water, at least one organic amine, and two or more water-miscible organic solvents. The composition may further contain a surfactant. Use of this composition reduces resist reattachment, reduces corrosion, and improves peelability.

摘要翻译： 用于从基材中除去光致抗蚀剂，聚合物材料或残留物的组合物含有腐蚀抑制剂，其是没食子酸的衍生物，其可溶于水可混溶的有机溶剂，水，至少一种有机胺和两种或多种水 可混溶的有机溶剂。 组合物还可以含有表面活性剂。 使用该组合物减少了抗蚀剂重新附着，减少了腐蚀，并且改善了剥离性。

公开(公告)号：US08309196B2

公开(公告)日：2012-11-13

申请号：US13217771

申请日：2011-08-25

申请人： Takashi Miyazawa ,  Yutaka Kurose ,  Hisashi Shoda ,  Kenichi Satake ,  Yukiko Takahashi ,  Mayumi Kimura ,  Naoyuki Uchida ,  Hideki Tamagawa

发明人： Takashi Miyazawa ,  Yutaka Kurose ,  Hisashi Shoda ,  Kenichi Satake ,  Yukiko Takahashi ,  Mayumi Kimura ,  Naoyuki Uchida ,  Hideki Tamagawa

IPC分类号： B32B3/02 ,  G11B7/24

CPC分类号： G11B7/249 ,  C09B45/18 ,  C09B45/20 ,  C09B45/22 ,  G11B7/245 ,  G11B7/246 ,  G11B7/2463 ,  G11B7/2467 ,  G11B7/247 ,  G11B7/2472 ,  G11B7/2475 ,  G11B7/248 ,  G11B7/2492 ,  G11B7/2531 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/2535 ,  G11B7/2536 ,  G11B7/2542 ,  G11B7/259

摘要： An optical recording medium having excellent light resistance that includes a substrate; and a recording layer which is provided on the substrate directly or on another layer provided on the substrate, wherein the recording layer is capable of recording and/or reading information by irradiating light thereon, the recording layer including a metal complex compound comprising an azo compound having a coupler component with a Meldrum's acid structure and a diazo component with a nitrogen-containing heterocyclic aromatic ring structure, and a metal ion coordinated to the azo compound.

摘要翻译： 一种具有优异的耐光性的光记录介质，包括基底; 以及记录层，其直接设置在基板上或设置在基板上的另一层上，其中记录层能够通过在其上照射光来记录和/或读取信息，所述记录层包括包含偶氮化合物的金属络合物 具有Meldrum酸结构的成色剂组分和具有含氮杂环芳族环结构的重氮组分和与偶氮化合物配位的金属离子。

公开(公告)号：US06955667B1

公开(公告)日：2005-10-18

申请号：US09147894

申请日：1997-10-22

申请人： Masahito Tanaka ,  Mayumi Kimura ,  Takao Nakayama ,  Mitsugu Hamajima ,  Minoru Nakanishi

发明人： Masahito Tanaka ,  Mayumi Kimura ,  Takao Nakayama ,  Mitsugu Hamajima ,  Minoru Nakanishi

IPC分类号： A61F13/53 ,  A61F13/15 ,  A61F13/472 ,  A61F13/49 ,  A61F13/539 ,  B32B5/22 ,  B32B27/00 ,  B32B27/12 ,  B32B27/16 ,  A61F13/20

CPC分类号： A61F13/4752

摘要： An absorbent article includes a liquid-permeable top layer, a liquid-impermeable back layer, and a liquid retentive absorbent member, interposed between the top layer and the back layer. The absorbent member is arranged to form an opposing pair of barrier cuffs which are within longitudinal edges of the top layer and extend along the longitudinal edges. A pocket portion is formed between the pair of barrier cuffs.

摘要翻译： 吸收性物品包括插入在顶层和背层之间的透液性顶层，液体不可渗透背层和液体保持性吸收体。 吸收构件布置成形成相对的一对阻挡箍，其在顶层的纵向边缘内并且沿着纵向边缘延伸。 在一对阻挡袖口之间形成袋状部分。

公开(公告)号：US06551297B2

公开(公告)日：2003-04-22

申请号：US09180479

申请日：1999-01-11

申请人： Masahito Tanaka ,  Mayumi Kimura ,  Hironori Kawasaki ,  Mitsugu Hamajima ,  Minoru Nakanishi ,  Jinko Noguchi

发明人： Masahito Tanaka ,  Mayumi Kimura ,  Hironori Kawasaki ,  Mitsugu Hamajima ,  Minoru Nakanishi ,  Jinko Noguchi

IPC分类号： A61F1318

CPC分类号： A61F13/4752

摘要： An absorbent article includes a liquid-permeable top layer, a liquid-impermeable back layer, and a liquid-retentive absorbent member interposed between the top layer and the back layer. The absorbent member is arranged such that a pair of absorbent barrier cuffs having a prescribed width are formed at respective left and right opposing side portions of the top layer in the width-wise direction thereof, and liquid-shrinkable members, which can elastically shrink upon absorption of liquid, are disposed within the barrier cuffs and extend in the longitudinal direction of the barrier cuffs.

摘要翻译： 吸收性物品包括透液性顶层，液体不可渗透背层，以及插入在顶层和背层之间的液体保持性吸收体。 吸收体的布置使得具有规定宽度的一对吸收性阻挡箍形成在顶层的宽度方向的左右相对侧部的左右侧部分，以及可收缩的液体收缩部件 吸收液体，设置在阻挡箍内，并且在阻挡箍的纵向方向上延伸。

公开(公告)号：US20070156107A1

公开(公告)日：2007-07-05

申请号：US11640909

申请日：2006-12-19

申请人： Mika Kimura ,  Mayumi Kimura ,  Shinsuke Nagahara

发明人： Mika Kimura ,  Mayumi Kimura ,  Shinsuke Nagahara

IPC分类号： A61F13/15

CPC分类号： D21H21/22 ,  A61F13/534 ,  A61F2013/530532 ,  D21H21/52 ,  D21H27/32

摘要： An absorbent sheet 10 of the invention is a thin sheet having a first surface 10A and a second surface 10B and containing a fibrous material 11 and superabsorbent polymer particles 12. The polymer particles 12 are dispersed in the thickness direction of the absorbent sheet 10 in a state of being held by the fibrous material 11. When the portion in the thickness direction of the absorbent sheet 10 where the polymer particles 12 are dispersed is divided into regions by at least one plane perpendicular to the thickness direction of the sheet 10, the average particle size of the superabsorbent polymer particles 12 dispersed in each region decreases from the region that is the nearest to the first surface 10A to the region that is the nearest to the second surface 10B of the absorbent sheet.

摘要翻译： 本发明的吸收性片材10是具有第一表面10A和第二表面10B并且含有纤维材料11和超吸收性聚合物颗粒12的薄片。 聚合物颗粒12在被纤维材料11保持的状态下分散在吸收性片材10的厚度方向上。 当分散有聚合物颗粒12的吸收性片材10的厚度方向上的部分通过与片材10的厚度方向垂直的至少一个平面分割成多个区域时，超吸收性聚合物颗粒12的平均粒度分散在 每个区域从最接近第一表面10A的区域减小到最接近吸收性片材的第二表面10B的区域。