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    Soluble polymers comprising unsaturation and process for preparation thereof
    6.
    发明申请
    Soluble polymers comprising unsaturation and process for preparation thereof 审中-公开
    包含不饱和键的可溶性聚合物及其制备方法

    公开(公告)号：US20050096443A1

    公开(公告)日：2005-05-05

    申请号：US10700511

    申请日：2003-11-05

    申请人： Mohan Kulkarni ,  Rohini Karmalkar ,  Sunita Satav

    发明人： Mohan Kulkarni ,  Rohini Karmalkar ,  Sunita Satav

    IPC分类号： C08F2/10 ,  C08F220/46

    CPC分类号： C08F2/10

    摘要： The present invention describes the synthesis of soluble copolymers containing multiple unsaturations. These copolymers contain reactive vinyl groups which can be further reacted in a second stage polymerization. The process involves copolymerization of a vinyl monomer with an inclusion complex of a monomer having multiple unsaturations and a cyclic macromolecular compound to yield soluble polymers. These polymers may be cast into films, membranes or may be converted in micro or nanoparticles and then crosslinked in a second step polymerization.

    摘要翻译： 本发明描述了含有多个不饱和基团的可溶性共聚物的合成。 这些共聚物含有可在第二阶段聚合中进一步反应的反应性乙烯基。 该方法包括乙烯基单体与具有多个不饱和单体的包合络合物和环状高分子化合物的共聚合以产生可溶性聚合物。 这些聚合物可以浇铸成膜，膜或者可以转化成微米或纳米颗粒，然后在第二步聚合中交联。

    Cobalt imprinted polymer composition for selective removal of cobalt, process for preparation thereof, and process for removal of cobalt
    7.
    发明申请
    Cobalt imprinted polymer composition for selective removal of cobalt, process for preparation thereof, and process for removal of cobalt 审中-公开
    用于选择性去除钴的钴印刷聚合物组合物，其制备方法和用于除去钴的方法

    公开(公告)号：US20050070676A1

    公开(公告)日：2005-03-31

    申请号：US10671868

    申请日：2003-09-29

    申请人： Mohan Kulkarni ,  Rohini Karmalkar

    发明人： Mohan Kulkarni ,  Rohini Karmalkar

    IPC分类号： C02F1/68 ,  C08F30/04 ,  C08F126/06

    CPC分类号： C02F1/683 ,  C02F2101/20 ,  C08F30/04

    摘要： The present invention provides a polymer composition for the selective removal of cobalt, a process for the preparation thereof and the process for removal of cobalt, using the said polymer composition. More particularly it relates to a cross-linked polymer composition prepared by the molecular imprinting technique. The preparation of the cross linked polymer involves selection of vinyl monomers bearing functional groups that bind to cobalt, formation of a complex of these monomers with cobalt and subsequent polymerization of the complex in presence of a crosslinker. The process for the removal of cobalt comprises treating the solution containing a mixture of cobalt and other metal ions with the polymer under conditions sufficient for cobalt to form a complex with the polymer and separating the polymer from the cobalt depleted solution.

    摘要翻译： 本发明提供一种用于选择性除去钴的聚合物组合物，其制备方法和使用所述聚合物组合物除去钴的方法。 更具体地说，涉及通过分子印迹技术制备的交联聚合物组合物。 交联聚合物的制备涉及选择具有结合钴的官能团的乙烯基单体，这些单体与钴的络合物的形成以及随后在交联剂存在下复合物的聚合。 除去钴的方法包括在足以使钴形成与聚合物的络合物并从贫钴溶液中分离聚合物的条件下，将含有钴和其它金属离子的混合物的溶液与聚合物一起处理。