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公开(公告)号：US20160325295A1
公开(公告)日：2016-11-10
申请号：US15137807
申请日：2016-04-25
CPC分类号： B05B13/0278 , B05C5/0254 , B05C5/0258 , B05C5/027 , B05C5/0279 , B05C17/00506 , H01L21/6715
摘要： Disclosed is a coating machine. The coating machine includes: a movable component, a plurality of nozzles and a pump, the plurality of nozzles are sequentially arranged along the length direction of the movable component, the pump is configured for pumping coating agents into the nozzles, the movable component can drive the nozzles to move, and coating agents are coated on substrates by the nozzles with the movement of the nozzles.
摘要翻译： 公开了一种涂布机。 涂布机包括：可移动部件，多个喷嘴和泵，沿着可移动部件的长度方向依次布置多个喷嘴，泵被配置为将涂覆剂泵送到喷嘴中，可移动部件可以驱动 移动的喷嘴和涂覆剂通过喷嘴的移动由喷嘴涂覆在基板上。
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公开(公告)号：US09760024B2
公开(公告)日：2017-09-12
申请号：US14912801
申请日：2015-07-22
发明人： Bin Wu , Zhongxing Yu
CPC分类号： G03F7/70733 , G03F1/50 , G03F7/20 , G03F7/7035 , G03F7/70716 , G03F7/70866
摘要： Embodiments of the present disclosure provide a mask device, an exposure apparatus and an exposure method, which enable a reduction in the possibility that the mask is scratched during exposure so as to protect the mask, and in turn a reduction in production cost of the semiconductor devices. The mask device comprises a mask carrier, a mask disposed on a lower surface of the mask carrier, and at least one protection unit provided on the mask carrier, wherein a lower end of the at least one protection unit is arranged to be lower than the lower surface of the mask during exposure. The mask device is applicable in exposure of a substrate to be exposed.
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公开(公告)号：US09715173B2
公开(公告)日：2017-07-25
申请号：US15145379
申请日：2016-05-03
发明人： Xuequan Yu , Bin Wu , Kun Li , Lizhi Ren , Wenjun Shen , Yadong Gao
CPC分类号： G03F7/0007 , G02F1/133516 , G02F2001/133519 , G03F1/42 , G03F7/22 , G03F7/70475 , G03F9/7084
摘要： An alignment exposure method and a method for fabricating a display substrate are disclosed. The alignment exposure method includes a first alignment exposure process and a second alignment exposure process. Multiple groups of alignment marks are provided at an edge of at least one side of the substrate in the first alignment exposure process. At least one group of mark structures are provided at an edge of at least one side of a mask employed in the second alignment exposure process. In multiple mask alignment processes in the second alignment exposure process, each group of the at least one group of the mark structures of the mask are aligned with groups of the alignment marks at a corresponding side of the substrate group by group. The alignment exposure method is employed to realize alignment exposure of a substrate with a size larger than a size of a mask.
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公开(公告)号：US09751709B2
公开(公告)日：2017-09-05
申请号：US15094455
申请日：2016-04-08
发明人： Kun Li , Wenjun Shen , Bin Wu , Xuequan Yu , Xiaodong Yu , Zhuyi Luo
CPC分类号： B65H5/062 , B65H7/02 , B65H2404/1441 , B65H2511/20 , B65H2511/224 , B65H2513/40 , B65H2515/34 , B65H2553/512 , B65H2557/264 , B65H2220/02 , B65H2220/03 , B65H2220/01
摘要： The invention discloses a clearance adjusting apparatus, a clearance adjusting method and a conveyance device. The clearance adjusting apparatus is used for adjusting a clearance between two opposite rollers and comprises: a driver for driving the roller to move up and down, at least one of the rollers being movable relative to the other; and a controller that stores a predetermined clearance scope being connected with the driver for controlling the driver to drive the movable roller to move up and down, so that the clearance between the two rollers falls into the predetermined clearance scope.
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公开(公告)号：US09709506B2
公开(公告)日：2017-07-18
申请号：US14912577
申请日：2015-08-11
发明人： Zhiqiang Wang , Bin Wu , Guangzhi Li , Xing Yue , Xuequan Yu , Jiajia Liu
CPC分类号： G01N21/88 , G01N21/55 , G01N21/95 , G01N2021/9513 , G01N2201/0853 , G01N2201/088 , H01L21/67288
摘要： The present invention relates to the technical field of display, and particularly relates to a substrate damage inspection apparatus, a production system and an inspection method. The substrate damage inspection apparatus comprises a drive unit, support rods, sensors and a controller, wherein the drive unit is connected with the support rods so as to drive the support rods to ascend or descend below a substrate to be detected; and the sensors are disposed on the support rods and communicatively connect with the controller, so as to emit light beams to the substrate to be detected, receive the light beams reflected by the substrate to be detected, and feed them back to the controller. By means of the drive unit and the support rods with the sensors, the substrate damage inspection apparatus realizes damage inspection for the substrate to be detected in a vertical direction. That is, a technical solution provided by the present invention allows for damage inspection for the substrate to be detected when it vertically moves. In addition, the substrate damage inspection apparatus is simple in structure and convenient to operate, thereby having strong utility value and significance of generalization.
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6.发明申请SUBSTRATE DAMAGE INSPECTION APPARATUS, PRODUCTION SYSTEM AND INSPECTION METHOD 有权基板损坏检查装置，生产系统和检查方法公开(公告)号：US20170038306A1
公开(公告)日：2017-02-09
申请号：US14912577
申请日：2015-08-11
发明人： Zhiqiang Wang , Bin Wu , Guangzhi Li , Xing Yue , Xuequan Yu , Jiajia Liu
CPC分类号： G01N21/88 , G01N21/55 , G01N21/95 , G01N2021/9513 , G01N2201/0853 , G01N2201/088 , H01L21/67288
摘要： The present invention relates to the technical field of display, and particularly relates to a substrate damage inspection apparatus, a production system and an inspection method. The substrate damage inspection apparatus comprises a drive unit, support rods, sensors and a controller, wherein the drive unit is connected with the support rods so as to drive the support rods to ascend or descend below a substrate to be detected; and the sensors are disposed on the support rods and communicatively connect with the controller, so as to emit light beams to the substrate to be detected, receive the light beams reflected by the substrate to be detected, and feed them back to the controller. By means of the drive unit and the support rods with the sensors, the substrate damage inspection apparatus realizes damage inspection for the substrate to be detected in a vertical direction. That is, a technical solution provided by the present invention allows for damage inspection for the substrate to be detected when it vertically moves. In addition, the substrate damage inspection apparatus is simple in structure and convenient to operate, thereby having strong utility value and significance of generalization.
摘要翻译： 本发明涉及显示技术领域，特别涉及基板损伤检查装置，生产系统和检查方法。 基板损伤检查装置包括驱动单元，支撑杆，传感器和控制器，其中驱动单元与支撑杆连接，以驱动支撑杆上升或下降到待检测基板下方; 并且传感器设置在支撑杆上并且与控制器通信地连接，以将光束发射到待检测的基板，接收由待检测的基板反射的光束，并将其馈送到控制器。 通过驱动单元和具有传感器的支撑杆，基板损伤检查装置对垂直方向上要检测的基板实现损伤检查。 也就是说，本发明提供的技术方案允许当垂直移动时要检测的基板的损伤检查。 另外，基板损伤检查装置结构简单，操作方便，具有很强的实用价值和泛化意义。
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公开(公告)号：US10207284B2
公开(公告)日：2019-02-19
申请号：US15137807
申请日：2016-04-25
IPC分类号： B05B13/02 , H01L21/67 , B05C5/02 , B05C17/005
摘要： Disclosed is a coating machine. The coating machine includes: a movable component, a plurality of nozzles and a pump, the plurality of nozzles are sequentially arranged along the length direction of the movable component, the pump is configured for pumping coating agents into the nozzles, the movable component can drive the nozzles to move, and coating agents are coated on substrates by the nozzles with the movement of the nozzles.
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8.发明授权公开(公告)号：US11249356B2
公开(公告)日：2022-02-15
申请号：US16642156
申请日：2019-03-27
发明人： Wei Qin , Yonggang Du , Xiangzhen Wang , Bin Wu , Guohua Xu
IPC分类号： G02F1/1362 , C03B17/06 , G02F1/1335 , H01L27/12
摘要： A base substrate includes a first base layer and an electrostatic resistant layer that are disposed in a stack.
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公开(公告)号：US20160349630A1
公开(公告)日：2016-12-01
申请号：US14912801
申请日：2015-07-22
发明人： Bin Wu , Zhongxing Yu
CPC分类号： G03F7/70733 , G03F1/50 , G03F7/20 , G03F7/7035 , G03F7/70716 , G03F7/70866
摘要： Embodiments of the present disclosure provide a mask device, an exposure apparatus and an exposure method, which enable a reduction in the possibility that the mask is scratched during exposure so as to protect the mask, and in turn a reduction in production cost of the semiconductor devices. The mask device comprises a mask carrier, a mask disposed on a lower surface of the mask carrier, and at least one protection unit provided on the mask carrier, wherein a lower end of the at least one protection unit is arranged to be lower than the lower surface of the mask during exposure. The mask device is applicable in exposure of a substrate to be exposed.
摘要翻译： 本公开的实施例提供了一种掩模装置，曝光装置和曝光方法，其能够降低在曝光期间掩模被刮伤以便保护掩模的可能性，并且进而降低半导体的制造成本 设备。 掩模装置包括掩模载体，设置在掩模载体的下表面上的掩模和设置在掩模载体上的至少一个保护单元，其中至少一个保护单元的下端布置成低于 曝光期间面罩的下表面。 掩模装置适用于待曝光的基板的曝光。
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公开(公告)号：US20160334674A1
公开(公告)日：2016-11-17
申请号：US15145379
申请日：2016-05-03
发明人： Xuequan Yu , Bin Wu , Kun Li , Lizhi Ren , Wenjun Shen , Yadong Gao
IPC分类号： G02F1/1337 , G03F7/00
CPC分类号： G03F7/0007 , G02F1/133516 , G02F2001/133519 , G03F1/42 , G03F7/22 , G03F7/70475 , G03F9/7084
摘要： An alignment exposure method and a method for fabricating a display substrate are disclosed. The alignment exposure method includes a first alignment exposure process and a second alignment exposure process. Multiple groups of alignment marks are provided at an edge of at least one side of the substrate in the first alignment exposure process. At least one group of mark structures are provided at an edge of at least one side of a mask employed in the second alignment exposure process. In multiple mask alignment processes in the second alignment exposure process, each group of the at least one group of the mark structures of the mask are aligned with groups of the alignment marks at a corresponding side of the substrate group by group. The alignment exposure method is employed to realize alignment exposure of a substrate with a size larger than a size of a mask.
摘要翻译： 公开了一种取向曝光方法及其制造方法。 对准曝光方法包括第一对准曝光处理和第二对准曝光处理。 在第一对准曝光过程中，在基板的至少一侧的边缘处设置多组对准标记。 在第二对准曝光处理中使用的掩模的至少一侧的边缘处提供至少一组标记结构。 在第二对准曝光处理中的多个掩模对准处理中，掩模的标记结构的至少一组中的每一组与基板的对应侧的对准侧的组对齐。 使用取向曝光方法来实现尺寸大于掩模尺寸的基板的对准曝光。
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