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    Method for making a lithographic plate
    1.
    发明授权
    Method for making a lithographic plate 失效
    用于生产平版印刷版的方法

    公开(公告)号：US07829261B2

    公开(公告)日：2010-11-09

    申请号：US11573916

    申请日：2005-08-23

    申请人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Detlef Pietsch

    发明人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Detlef Pietsch

    IPC分类号： B41N1/00 ,  G03F7/00 ,  G03F7/26

    CPC分类号： B41N3/08

    摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs

    摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个pK <5的酸性官能团的单体，其中酸性官能团可以作为游离基 酸基或盐的形式; （c）干燥。

    Photopolymer composition suitable for lithographic printing plates
    4.
    发明授权
    Photopolymer composition suitable for lithographic printing plates 有权
    适用于平版印刷版的光聚合物组合物

    公开(公告)号：US07955776B2

    公开(公告)日：2011-06-07

    申请号：US11995213

    申请日：2006-07-03

    申请人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    发明人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    IPC分类号： G03F7/26 ,  G03F7/00

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

    摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

    摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）式（I）的至少一种低聚物A，其中X 1，X 2和X 3独立地选自直链或环状的C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和两个或多个 上述更多的R 1，R 2和R 3独立地选自（II）和（III），条件是（1）在R1，R2和R3中的至少一个中n = 0，和（2）n> 2中的至少一个基团R 1，R 2和R 3中的至少一个，和（3）至少一个基团R 6与式（III）中的H不同。

    Photopolymer Composition Suitable for Lithographic Printing Plates
    5.
    发明申请
    Photopolymer Composition Suitable for Lithographic Printing Plates 有权
    适用于平版印刷版的光聚合物组合物

    公开(公告)号：US20080248424A1

    公开(公告)日：2008-10-09

    申请号：US11995213

    申请日：2006-07-03

    申请人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    发明人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    IPC分类号： G03F7/004 ,  G03F7/26

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

    摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

    摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链 或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族 基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。

    Method for Making a Lithographic Plate
    8.
    发明申请
    Method for Making a Lithographic Plate 失效
    制作平版印刷版的方法

    公开(公告)号：US20070254238A1

    公开(公告)日：2007-11-01

    申请号：US11573916

    申请日：2005-08-23

    申请人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhradt ,  Detlef Pietsch

    发明人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhradt ,  Detlef Pietsch

    IPC分类号： G03C1/00

    CPC分类号： B41N3/08

    摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs

    摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个具有pK <5的酸性官能团的单体，其中酸性 官能团可以作为游离酸基团或以盐的形式存在; （c）干燥。

    Process for Production of Lithographic Printing Plates
    10.
    发明申请
    Process for Production of Lithographic Printing Plates 审中-公开

    公开(公告)号：US20080145790A1

    公开(公告)日：2008-06-19

    申请号：US11815578

    申请日：2006-02-01

    申请人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    发明人： Harald Baumann ,  Ulrich Fiebag ,  Udo Dwars ,  Michael Flugel ,  Bernd Strehmel ,  Hans-Joachim Timpe

    IPC分类号： G03F7/12

    CPC分类号： G03F7/322

    摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.