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公开(公告)号：US07829261B2
公开(公告)日：2010-11-09
申请号：US11573916
申请日：2005-08-23
申请人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhardt , Detlef Pietsch
发明人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhardt , Detlef Pietsch
CPC分类号： B41N3/08
摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs
摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个pK <5的酸性官能团的单体，其中酸性官能团可以作为游离基 酸基或盐的形式; （c）干燥。
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公开(公告)号：US07955776B2
公开(公告)日：2011-06-07
申请号：US11995213
申请日：2006-07-03
申请人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
发明人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).
摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）式（I）的至少一种低聚物A，其中X 1，X 2和X 3独立地选自直链或环状的C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和两个或多个 上述更多的R 1，R 2和R 3独立地选自（II）和（III），条件是（1）在R1，R2和R3中的至少一个中n = 0，和（2）n> 2中的至少一个基团R 1，R 2和R 3中的至少一个，和（3）至少一个基团R 6与式（III）中的H不同。
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公开(公告)号：US20080248424A1
公开(公告)日：2008-10-09
申请号：US11995213
申请日：2006-07-03
申请人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
发明人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).
摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链 或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族 基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。
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公开(公告)号：US20070254238A1
公开(公告)日：2007-11-01
申请号：US11573916
申请日：2005-08-23
申请人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhradt , Detlef Pietsch
发明人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhradt , Detlef Pietsch
IPC分类号： G03C1/00
CPC分类号： B41N3/08
摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs
摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个具有pK <5的酸性官能团的单体，其中酸性 官能团可以作为游离酸基团或以盐的形式存在; （c）干燥。
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5.发明授权Lithographic printing plate precursors with oligomeric or polymeric sensitizers 失效具有低聚物或聚合物敏化剂的平版印刷版前体公开(公告)号：US07615323B2
公开(公告)日：2009-11-10
申请号：US11718809
申请日：2005-11-11
申请人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
发明人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.
摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于 结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。
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公开(公告)号：US20090022961A1
公开(公告)日：2009-01-22
申请号：US11574022
申请日：2004-09-01
申请人： Bernd Strehmel , Harald Baumann , Eiji Hayakawa , Koji Hayashi , Jianbing Huang , Hideo Sakurai , Saraiya Shashikant , Detlef Pietsch
发明人： Bernd Strehmel , Harald Baumann , Eiji Hayakawa , Koji Hayashi , Jianbing Huang , Hideo Sakurai , Saraiya Shashikant , Detlef Pietsch
CPC分类号： G03F7/11 , B41N1/086 , B41N1/14 , B41N3/036 , Y10T428/24802 , Y10T428/273 , Y10T428/31515 , Y10T428/31935
摘要： Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) an interlayer applied onto the aluminum oxide layer comprising a hydrophilic polymer comprising structural units derived from the following compounds: (a1) at least one compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (a2) at least one monomer capable of copolymerizing with the free-radical polymerizable structural unit of (a1) and furthermore comprising at least one acidic functional group with pKs
摘要翻译： 平版印刷基材包括（a）尺寸稳定的板状或箔状载体，（b）设置在载体（a）的至少一侧的氧化铝层，和（c）施加到氧化铝层上的中间层， 包含衍生自以下化合物的结构单元的亲水性聚合物：（a1）至少一种包含聚环氧烷链和至少一个可自由基聚合的结构单元的化合物，和（a2）至少一种能够与 （a1）的自由基可聚合结构单元，还包含至少一个pK <5的酸性官能团，其中酸性官能团可以游离酸基团或盐形式存在。
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7.发明申请Lithographic Printing Plate Precursors with Oligomeric Or Polymeric Sensitizers 失效具有低聚物或聚合物敏化剂的平版印刷版前体公开(公告)号：US20070269745A1
公开(公告)日：2007-11-22
申请号：US11718809
申请日：2005-11-11
申请人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
发明人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
IPC分类号： G03C1/00
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer
摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得 在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自 卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物
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8.发明授权公开(公告)号：US07442486B2
公开(公告)日：2008-10-28
申请号：US10544758
申请日：2004-02-20
申请人： Harald Baumann , Udo Dwars , Detlef Pietsch , Michael Flugel
发明人： Harald Baumann , Udo Dwars , Detlef Pietsch , Michael Flugel
摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.
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9.发明申请公开(公告)号：US20060234155A1
公开(公告)日：2006-10-19
申请号：US10544758
申请日：2004-02-20
申请人： Harald Baumann , Udo Dwars , Detlef Pietsch , Michael Flugel
发明人： Harald Baumann , Udo Dwars , Detlef Pietsch , Michael Flugel
IPC分类号： G03C1/00
摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.
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