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    Method for making lithographic plates
    1.
    发明授权
    Method for making lithographic plates 有权
    制作平版印刷版的方法

    公开(公告)号：US08361701B2

    公开(公告)日：2013-01-29

    申请号：US12677904

    申请日：2008-09-24

    申请人： Oliver Piestert ,  Harald Baumann ,  Ulrich Fiebag ,  Bernd Strehmel ,  Uwe Tondock ,  Philip Watkiss

    发明人： Oliver Piestert ,  Harald Baumann ,  Ulrich Fiebag ,  Bernd Strehmel ,  Uwe Tondock ,  Philip Watkiss

    IPC分类号： G03C5/26 ,  B41F7/00

    CPC分类号： G03F7/322

    摘要： Method for producing an imaged lithographic printing plate comprising the step of developing an imagewise exposed negative working precursor with a developer comprising an alkylene oxide derivative of formula (A), wherein R1 is a linear or branched C1 to C6 alkyl group or H, (n+m) is an integer from 2 to 30, and R2 R3 R4 and R5 are each independently selected from H, methyl and ethyl, with the proviso that at least one of R2 and R3 is not H, and with the further proviso that at least one of R4 and R5 is not H.

    摘要翻译： 一种成像平版印刷版的制造方法，其特征在于，包括用含有式（A）的烯化氧衍生物的显色剂显影成像曝光的负性前体的步骤，其中R1是直链或支链C1至C6烷基或H（n + m）是2至30的整数，并且R 2 R 3 R 4和R 5各自独立地选自H，甲基和乙基，条件是R 2和R 3中的至少一个不是H，条件是在 R4和R5中的至少一个不是H.

    PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION
    3.
    发明申请
    PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION 审中-公开
    在完成溶液中加工具有疏水性聚合物的平版印刷板

    公开(公告)号：US20110155009A1

    公开(公告)日：2011-06-30

    申请号：US12742459

    申请日：2008-11-19

    申请人： Bernd Strehmel ,  Christopher D. Simpson ,  Oliver Piestert ,  Harald Baumann

    发明人： Bernd Strehmel ,  Christopher D. Simpson ,  Oliver Piestert ,  Harald Baumann

    IPC分类号： B41N1/14 ,  B41N3/00

    CPC分类号： B41N3/08 ,  G03F7/40

    摘要： Process for the production of a lithographic printing plate, comprising (a) providing a lithographic printing plate precursor comprising (i) a substrate; (ii) a radiation-sensitive coating comprising one or more layers and (iii) optionally an oxygen-impermeable overcoat; (b) image-wise exposing the lithographic printing plate precursor to radiation of a wavelength to which the radiation-sensitive coating is sensitive; (c) optionally subjecting the image-wise exposed precursor to a preheat treatment and/or rinsing with water; (d) removing the non-image areas from the image-wise exposed precursor by means of an alkaline developer solution; (e) optionally subjecting the imaged precursor obtained in step (d) to rinsing with water; (f) treating the imaged lithographic printing plate obtained in step (d) or (e) with a finisher solution; and (g) optionally subjecting the finisher treated plate obtained in step (f) to at least one further process step selected from rinsing with water, drying and baking; characterized in that the finisher solution comprises 0.01 to 15 wt. %, based on the total weight of the finisher, of a hydrophilic polymer comprising: (m1) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from —COOH, —SO3H, —PO2H2 and PO3H2, and (m3) optionally alkylene oxide units —(CHR1—CH2—O)P—, wherein each R1 independently represents H or —CH3 and p is an integer from 1 to 50.

    摘要翻译： 制备平版印刷版的方法，包括（a）提供平版印刷版原版，其包含（i）基底; （ii）包含一层或多层的辐射敏感涂层和（iii）任选的不透氧外涂层; （b）将平版印刷版前体成像曝光于对辐射敏感涂层敏感的波长的辐射; （c）任选地使成像曝光的前体经受预热处理和/或用水冲洗; （d）通过碱性显影剂溶液从图像曝光的前体中除去非图像区域; （e）任选地使步骤（d）中获得的成像前体用水冲洗; （f）用整理剂溶液处理步骤（d）或（e）中获得的成像平版印刷版; 和（g）任选地将步骤（f）中获得的整理剂处理的板处理至少一个选自用水冲洗，干燥和烘烤的其它工艺步骤; 其特征在于整理剂溶液含有0.01至15wt。 （m1）伯，仲和/或叔氨基和（m2）选自-COOH，-SO 3 H，-P 2 H 2和PO 3 H 2的酸基的亲水性聚合物，以及 （m3）任选的环氧烷单元 - （CHR1-CH2-O）P-，其中每个R1独立地表示H或-CH3，p是1至50的整数。

    METHOD FOR MAKING LITHOGRAPHIC PLATES
    4.
    发明申请
    METHOD FOR MAKING LITHOGRAPHIC PLATES 有权
    制作平板的方法

    公开(公告)号：US20100304304A1

    公开(公告)日：2010-12-02

    申请号：US12677904

    申请日：2008-09-24

    申请人： Oliver Piestert ,  Harald Baumann ,  Ulrich Fiebag ,  Bernd Strehmel ,  Uwe Tondock ,  Philip Watkiss

    发明人： Oliver Piestert ,  Harald Baumann ,  Ulrich Fiebag ,  Bernd Strehmel ,  Uwe Tondock ,  Philip Watkiss

    IPC分类号： G03F7/20

    CPC分类号： G03F7/322

    摘要： Method for producing an imaged lithographic printing plate comprising the step of developing an imagewise exposed negative working precursor with a developer comprising an alkylene oxide derivative of formula (A), wherein R1 is a linear or branched C1 to C6 alkyl group or H, (n+m) is an integer from 2 to 30, and R2 R3 R4 and R5 are each independently selected from H, methyl and ethyl, with the proviso that at least one of R2 and R3 is not H, and with the further proviso that at least one of R4 and R5 is not H.

    摘要翻译： 一种成像平版印刷版的制造方法，其特征在于，包括用含有式（A）的烯化氧衍生物的显色剂显影成像曝光的负性前体的步骤，其中R1是直链或支链C1至C6烷基或H（n + m）是2至30的整数，并且R 2 R 3 R 4和R 5各自独立地选自H，甲基和乙基，条件是R 2和R 3中的至少一个不是H，条件是在 R4和R5中的至少一个不是H.

    Lithographic printing plate precursors with oligomeric or polymeric sensitizers
    6.
    发明授权
    Lithographic printing plate precursors with oligomeric or polymeric sensitizers 失效
    具有低聚物或聚合物敏化剂的平版印刷版前体

    公开(公告)号：US07615323B2

    公开(公告)日：2009-11-10

    申请号：US11718809

    申请日：2005-11-11

    申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    IPC分类号： G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  B41C1/10

    CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

    摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.

    摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于 结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。

    Photopolymer composition usable for lithographic plates
    8.
    发明授权
    Photopolymer composition usable for lithographic plates 有权
    可用于平版印刷版的光聚合物组合物

    公开(公告)号：US08119331B2

    公开(公告)日：2012-02-21

    申请号：US12159287

    申请日：2007-01-02

    申请人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    发明人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    IPC分类号： G03F7/09 ,  G03F7/30 ,  G03F7/004

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

    摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

    摘要翻译： 辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A， 至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体 基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。

    METHOD FOR AUTOMATED CONTROL OF PROCESSING PARAMETERS
    10.
    发明申请
    METHOD FOR AUTOMATED CONTROL OF PROCESSING PARAMETERS 审中-公开
    自动控制加工参数的方法

    公开(公告)号：US20110189600A1

    公开(公告)日：2011-08-04

    申请号：US12696088

    申请日：2010-01-29

    申请人： Lars Plumer ,  Pavel Korolik ,  Danny Koifman ,  Harald Baumann ,  Bernd Strehmel

    发明人： Lars Plumer ,  Pavel Korolik ,  Danny Koifman ,  Harald Baumann ,  Bernd Strehmel

    IPC分类号： G03F7/20

    CPC分类号： B41C1/1083

    摘要： The invention relates to processing imaged precursors such as lithographic printing plates. The invention relates specifically to adjusting a processing device for optimal processing performance using a plate recognition system that includes a senseing and authenication subsystem. The processor is automated to make adjustments according to the information provided.

    摘要翻译： 本发明涉及加工成像的前体，如平版印刷版。 本发明具体涉及使用包括感知和认知子系统的板识别系统来调整处理装置以获得最佳处理性能。 处理器可以根据所提供的信息进行自动调整。