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    Apparatus for defending against an attacking missile
    1.
    发明授权
    Apparatus for defending against an attacking missile 失效

    公开(公告)号：US5600434A

    公开(公告)日：1997-02-04

    申请号：US380058

    申请日：1995-01-30

    申请人： Berndt Warm ,  Detlev Wittmer ,  Matthias Noll

    发明人： Berndt Warm ,  Detlev Wittmer ,  Matthias Noll

    IPC分类号： F41G7/22 ,  F41H11/02 ,  G01S7/495 ,  B64D1/04 ,  G01C21/02 ,  G01J1/20

    CPC分类号： F41H13/0056 ,  F41G7/224 ,  F41H11/02 ,  G01S7/495

    摘要： Craft (11) generally and in particular the transport aircraft (11) which are used for humanitarian purposes and for supplying crisis reaction forces over militarily unknown territory and which have comparatively little manoeuverability are particularly endangered by partisans who operate out of cover with modern portable guided missiles (12), against whose homing heads (13) the flares which were previously discharged from aircraft (11) no longer afford an effective defence. Therefore those and other potentially endangered craft (11) are provided with easily interchangeably and autarchically equipped containers (17) from which the defence beam (16) of a laser source (21) in accordance with pre-guidance by a warning sensor (10), are directed by way of the tracking optical system (19) of a target tracking system (20) on to the approaching guided missile (12) whose homing head (13) is already locked on to heat sources such as for example the engines of the craft (11) to be protected. For quickly and reliably detecting the guided missile (12) which is initially only in the form of a point, against the clutter background, the tracking camera is so-to-speak scanned stroboscopically on to the pulsating reflections of the defence beam (16) at the missile (12). The energy which is emitted towards the attacking missile (12) disturbs the optronic detector function in the homing head (13) by the clock of a pulsed beam (16). Superimposed thereon, in the event of a closer approach, is overloading of the IR-detector by the beam frequency which is in the working band of the homing head (13) and finally thermal destruction of the homing head (13) if the attacking missile (12) has not already previously deflected out of its path of attack due to the failure of its target tracking regulating loop. A continuous-wave illumination beam (40) of lower power and which is spectrally adjacent and which tracks on to a glint somewhat away from the defence beam (16) also serves with its reflection energy for actuation of the topography of an adaptive optical system (42) for compensating for atmospheric propagation disturbances.

    Simulator for use in ophthalmological measurements
    2.
    发明授权
    Simulator for use in ophthalmological measurements 有权
    用于眼科测量的模拟器

    公开(公告)号：US08562133B2

    公开(公告)日：2013-10-22

    申请号：US12894314

    申请日：2010-09-30

    申请人： Stefan Schmid ,  Berndt Warm

    发明人： Stefan Schmid ,  Berndt Warm

    IPC分类号： A61B3/00 ,  A61B3/10

    CPC分类号： A61B3/11

    摘要： A simulator to be used in ophthalmological measurements includes a display apparatus and a control device. The control device is adapted to control the display apparatus in such a manner that the display apparatus displays an image that is adapted to simulate the arrangement of a pupillary midpoint relative to a reference structure.

    摘要翻译： 用于眼科测量的模拟器包括显示装置和控制装置。 控制装置适于以这样的方式控制显示装置，使得显示装置显示适于模拟相对于参考结构的瞳孔中点的布置的图像。

    Apparatus and method for processing material with focused electromagnetic radiation
    3.
    发明申请
    Apparatus and method for processing material with focused electromagnetic radiation 有权
    用聚焦电磁辐射处理材料的装置和方法

    公开(公告)号：US20120083771A1

    公开(公告)日：2012-04-05

    申请号：US12894375

    申请日：2010-09-30

    申请人： Berndt Warm ,  Peter Riedel ,  Claudia Gorschboth ,  Franziska Woittennek

    发明人： Berndt Warm ,  Peter Riedel ,  Claudia Gorschboth ,  Franziska Woittennek

    IPC分类号： A61F9/01 ,  G02B27/40

    CPC分类号： A61F9/00836

    摘要： An apparatus for processing material with focused electromagnetic radiation, comprises: a source emitting electromagnetic radiation, means for directing the radiation onto the material, means for focusing the radiation on or in the material, a unit for generating a pattern in the optical path of the electromagnetic radiation, an at least partially reflective surface in the optical path before the focus of the focused radiation, said pattern being imaged onto said at least partially reflective surface through at least part of said directing means and said focusing means, at least one detector onto which an image of the pattern is reflected by said surface and which generates electrical signals corresponding to said image, said image containing information on the position of the focus, a computer receiving said electrical signals and programmed to process said image so as to generate an electrical signal depending on the focal position, and a divergence adjustment element arranged in said optical path and adapted to receive said electrical signal of the computer so as to change a divergence of the electromagnetic radiation depending on said signal.

    摘要翻译： 一种用于处理具有聚焦电磁辐射的材料的设备，包括：发射电磁辐射的源，用于将辐射引导到材料上的装置，用于将辐射聚焦在材料上或其中的装置，用于在该光学系统的光路中产生图案的单元 电磁辐射，在聚焦辐射的聚焦之前的光路中的至少部分反射的表面，所述图案通过所述引导装置和所述聚焦装置的至少一部分成像到所述至少部分反射表面上，至少一个检测器 其中所述图案的图像被所述表面反射并且产生对应于所述图像的电信号，所述图像包含关于焦点位置的信息，接收所述电信号的计算机，并被编程以处理所述图像，以便产生电 信号取决于焦点位置，发散调节元件以sai布置 d光路，并且适于接收计算机的所述电信号，以便根据所述信号改变电磁辐射的发散。

    IMAGE PROCESSING METHOD FOR DETERMINING FOCUS DEPTH OF A REFRACTIVE LASER
    6.
    发明申请
    IMAGE PROCESSING METHOD FOR DETERMINING FOCUS DEPTH OF A REFRACTIVE LASER 有权
    用于确定反射激光的焦点深度的图像处理方法

    公开(公告)号：US20150036899A1

    公开(公告)日：2015-02-05

    申请号：US14366654

    申请日：2011-12-29

    申请人： Berndt Warm

    发明人： Berndt Warm

    IPC分类号： A61F9/008 ,  G06T7/00

    CPC分类号： A61F9/00825 ,  A61F2009/00844 ,  A61F2009/00855 ,  G06T7/521

    摘要： The present invention relates to a laser apparatus, system, and method for determining a depth of a focus point of a laser beam. An interface device is coupleable to the laser apparatus and has an applanation element comprising a front surface and a back surface. A laser beam having a predefined shape is focussed through the applanation element at a focus point. A superimposed image of a spurious reflection, which is reflected from the front surface of the applanation element, with a standard reflection, which is reflected from the back surface of the applanation element, is detected. The spurious reflection is then filtered out of the superimposed image. Based on the remaining standard reflection, the depth of the focus point of the laser beam can be determined.

    摘要翻译： 本发明涉及一种用于确定激光束的焦点深度的激光装置，系统和方法。 接口装置可耦合到激光装置，并且具有包括前表面和后表面的压平元件。 具有预定形状的激光束在焦点处聚焦通过压平元件。 检测从压延元件的背面反射的标准反射从压延元件的前表面反射的伪反射的叠加图像。 然后将杂散反射从叠加的图像中滤出。 基于剩余的标准反射，可以确定激光束的焦点的深度。

    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    9.
    发明申请
    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置的照明系统

    公开(公告)号：US20110181850A1

    公开(公告)日：2011-07-28

    申请号：US13044160

    申请日：2011-03-09

    申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

    摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

    摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

    Illumination system of a microlithographic projection exposure apparatus having a temperature control device
    10.
    发明授权
    Illumination system of a microlithographic projection exposure apparatus having a temperature control device 有权
    具有温度控制装置的微光刻投影曝光装置的照明系统

    公开(公告)号：US08797507B2

    公开(公告)日：2014-08-05

    申请号：US13044160

    申请日：2011-03-09

    申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    IPC分类号： G03B27/52 ,  G03B27/54

    CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

    摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

    摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。