公开(公告)号：US10139724B2

公开(公告)日：2018-11-27

申请号：US14839147

申请日：2015-08-28

申请人： Board of Regents The University of Texas System

发明人： C. Grant Willson ,  Christopher John Ellison ,  Takehiro Sleshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

IPC分类号： G03F1/50 ,  B05D1/00 ,  B05D5/00 ,  B05D7/00 ,  B81C1/00 ,  G03F7/00 ,  C09D137/00 ,  B82Y10/00 ,  B82Y40/00 ,  C09D167/00

摘要： The concepts described herein involve the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

公开(公告)号：US09157008B2

公开(公告)日：2015-10-13

申请号：US13761918

申请日：2013-02-07

申请人： Board of Regents The University of Texas System

发明人： Carlton Grant Willson ,  Christopher John Ellison ,  Takehiro Seshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

IPC分类号： G03F7/00 ,  B81C1/00 ,  C09D137/00 ,  B05D1/00 ,  B05D5/00 ,  B05D7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F1/50 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D7/56 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  C09D167/00 ,  G03F7/0002 ,  Y10T428/24802 ,  Y10T428/31663 ,  Y10T428/31855

摘要： Random copolymer top coats are described that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films.

摘要翻译： 描述了可以将旋涂在嵌段共聚物薄膜上的无规共聚物顶涂层，并用于控制顶部涂层 - 嵌段共聚物界面的界面能。 顶涂层可溶于弱碱水溶液，一旦沉积在嵌段共聚物薄膜上就可以改变表面能。 使用自组装嵌段共聚物来生产先进的平版印刷图案依赖于它们在薄膜中的取向控制。

公开(公告)号：US20130344242A1

公开(公告)日：2013-12-26

申请号：US13922011

申请日：2013-06-19

申请人： Board of Regents, The University of Texas System

发明人： Carlton Grant Willson ,  Christopher John Ellison ,  Takehiro Seshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch ,  Michael Maher

IPC分类号： C09D137/00

CPC分类号： B05D7/56 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  G03F7/0002

摘要： The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae perpendicular to the plane of the block copolymer film is required for most applications. The preferred method to achieve orientation is by heating. The present invention involves the use of polarity-switching top coats to control block copolymer thin film orientation by heating. The top coats can be spin coated onto block copolymer thin films from polar casting solvents and they change composition upon thermal annealing to become “neutral”. Top coats allow for the facile orientation control of block copolymers which would otherwise not be possible by heating alone.

摘要翻译： 使用自组装嵌段共聚物结构产生先进的光刻图案依赖于这些结构在薄膜中的取向的控制。 特别地，对于大多数应用，需要垂直于嵌段共聚物膜的平面的圆柱体和薄片的取向。 实现取向的优选方法是通过加热。 本发明涉及使用极性转换顶涂层通过加热控制嵌段共聚物薄膜取向。 顶涂层可以从极性浇铸溶剂中旋涂到嵌段共聚物薄膜上，并且它们在热退火时改变组成以变成“中性”。 顶涂层允许嵌段共聚物的容易取向控制，否则通过单独加热将不可能。

公开(公告)号：US20150232689A1

公开(公告)日：2015-08-20

申请号：US14698253

申请日：2015-04-28

申请人： Board of Regents,The University of Texas System

发明人： Carlton Grant Willson ,  William J. Durand ,  Christopher John Ellison ,  Christopher M. Bates ,  Takehiro Seshimo ,  Julia Cushen ,  Logan J. Santos ,  Leon Dean ,  Erica L. Rausch

IPC分类号： C09D153/00 ,  C03C17/30 ,  C03C17/34

CPC分类号： C09D153/00 ,  B29C43/32 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/30 ,  C03C17/3405 ,  C03C2218/152 ,  C23C16/44 ,  G03F7/0002 ,  Y10S977/788 ,  Y10S977/809 ,  Y10S977/811 ,  Y10S977/839 ,  Y10S977/888 ,  Y10S977/89 ,  Y10S977/891 ,  Y10T428/24802 ,  Y10T428/31504 ,  Y10T428/31663 ,  Y10T428/31931

摘要： The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

摘要翻译： 本发明使用真空沉积的材料薄膜来产生与下面的嵌段共聚物膜的不同区域非优先相互作用的界面。 非优选界面防止形成润湿层并影响嵌段共聚物中结构域的取向。 沉积的聚合物的目的是在嵌段共聚物膜中产生可用作光刻图案的纳米结构特征。

公开(公告)号：US10167410B2

公开(公告)日：2019-01-01

申请号：US14698253

申请日：2015-04-28

申请人： Board of Regents, The University of Texas System

发明人： C. Grant Wilson ,  William J. Durand ,  Christopher John Ellison ,  Christopher M. Bates ,  Takehiro Seshimo ,  Julia Cushen ,  Logan J. Santos ,  Leon Dean ,  Erica L. Rausch

IPC分类号： C09D153/00 ,  C03C17/34 ,  C03C17/30

摘要： Vacuum deposited thin films of material are used to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nano structured features in a block copolymer film that can serve as lithographic patterns.

公开(公告)号：US20150370159A1

公开(公告)日：2015-12-24

申请号：US14839147

申请日：2015-08-28

申请人： Board of Regents The University of Texas System

发明人： Carlton Grant Willson ,  Christopher John Ellison ,  Takehiro Sleshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

IPC分类号： G03F1/50 ,  C09D167/00

CPC分类号： G03F1/50 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D7/56 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  C09D167/00 ,  G03F7/0002 ,  Y10T428/24802 ,  Y10T428/31663 ,  Y10T428/31855

摘要： The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

摘要翻译： 本发明涉及使用可以旋涂在嵌段共聚物薄膜上并用于控制顶部涂层 - 嵌段共聚物界面的界面能的无规共聚物顶涂层。 顶涂层可溶于弱碱水溶液，一旦沉积在嵌段共聚物薄膜上就可以改变表面能。 使用自组装嵌段共聚物来生产先进的平版印刷图案依赖于它们在薄膜中的取向控制。 顶涂层可能允许嵌段共聚物的容易取向控制，否则这将是相当具有挑战性的。