公开(公告)号：US20060038968A1

公开(公告)日：2006-02-23

申请号：US10921348

申请日：2004-08-19

申请人： Nicolaas Kemper ,  Henrikus Marie Cox ,  Sjoerd Nicolaas Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Kate ,  Jeroen Johannes Sophia Mertens ,  Frits Der Meulen ,  Franciscus Herman Maria Teunissen ,  Jan-Gerard Van Der Toorn ,  Martinus Cornelis Verhagen ,  Stefan Belfroid ,  Johannes Smeulers

发明人： Nicolaas Kemper ,  Henrikus Marie Cox ,  Sjoerd Nicolaas Donders ,  Roelof Frederick De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Kate ,  Jeroen Johannes Sophia Mertens ,  Frits Der Meulen ,  Franciscus Herman Maria Teunissen ,  Jan-Gerard Van Der Toorn ,  Martinus Cornelis Verhagen ,  Stefan Belfroid ,  Johannes Smeulers

IPC分类号： G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20060290908A1

公开(公告)日：2006-12-28

申请号：US11167563

申请日：2005-06-28

申请人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

公开(公告)号：US20060158627A1

公开(公告)日：2006-07-20

申请号：US11330394

申请日：2006-01-12

申请人： Nicolaas Kemper ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Frits Meulen

发明人： Nicolaas Kemper ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Frits Meulen

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.

摘要翻译： 构造成在投影系统和基板之间的空间中容纳液体的液体限制结构在其下表面中具有凹口，该凹部对于相对低的压力源和相对高的压力源是开放的，并且液体和/或气体 从液体限制结构和基板之间提取。

公开(公告)号：US20060250601A1

公开(公告)日：2006-11-09

申请号：US11120186

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/58

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US20070114451A1

公开(公告)日：2007-05-24

申请号：US11603228

申请日：2006-11-22

申请人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

发明人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

IPC分类号： G21G5/00

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20050243292A1

公开(公告)日：2005-11-03

申请号：US10835856

申请日：2004-05-03

申请人： Johannes Jacobus Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： H01L21/027 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7034 ,  G03F7/70341

摘要： A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously.

摘要翻译： 在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。

公开(公告)号：US20050219483A1

公开(公告)日：2005-10-06

申请号：US11092964

申请日：2005-03-30

申请人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7096 ,  G03F7/70341

摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

摘要翻译： 公开了一种浸没式光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充投影系统的最终元件和基板台之间的空间与第一液体，以及测量系统，其被配置为测量每个 多个点在基板上，测量系统布置成使得通过第二液体进行测量，第二液体不由液体供应系统供应。

公开(公告)号：US20060082746A1

公开(公告)日：2006-04-20

申请号：US10966108

申请日：2004-10-18

申请人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

发明人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

IPC分类号： G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70341

摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US20060232756A1

公开(公告)日：2006-10-19

申请号：US11239480

申请日：2005-09-30

申请人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

发明人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Theodorus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen ,  Sjoerd Nicolaas Donders

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。

公开(公告)号：US20060017893A1

公开(公告)日：2006-01-26

申请号：US10895998

申请日：2004-07-22

申请人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Bob Streefkerk

发明人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Bob Streefkerk

IPC分类号： G03B27/52

CPC分类号： G03F7/707 ,  G03F7/70341

摘要： In an immersion-type lithographic apparatus, in which a surface of a substrate is immersed in liquid during an exposure operation, the substrate is held against a substrate table. On completion of the exposure operation, the substrate is lifted clear of the substrate table. In order to overcome a tendency caused by a film of residual liquid to cause the substrate to stick to the substrate table, pins used to lift the substrate are arranged and operated so that, at least initially, force is applied to the substrate at a location offset from its central axis.

摘要翻译： 在曝光操作中将基板的表面浸入液体的浸渍式光刻设备中，将基板保持在基板台上。 在完成曝光操作时，将衬底提升离开衬底台。 为了克服由残留液体的膜导致基板粘附到基板台上的倾向，布置和操作用于提升基板的销，使得至少最初将力施加到基板的位置 偏离其中心轴。