摘要:
Disclosed herein is a 3D teleconferencing apparatus and method enabling eye contact. The 3D teleconferencing apparatus enabling eye contact according to the present invention includes an image acquisition unit for acquiring depth images and color images by manipulating cameras in real time in consideration of images obtained by capturing a subject that is a teleconference participant and images received over a network and corresponding to a counterpart involved in the teleconference; a full face generation unit for generating a final depth image and a final color image corresponding to a full face of the participant for eye contact using the depth images and the color images; and a 3D image generation unit for generating a 3D image corresponding to the counterpart and displaying the 3D image on a display device.
摘要:
Disclosed herein is a 3D teleconferencing apparatus and method enabling eye contact. The 3D teleconferencing apparatus enabling eye contact according to the present invention includes an image acquisition unit for acquiring depth images and color images by manipulating cameras in real time in consideration of images obtained by capturing a subject that is a teleconference participant and images received over a network and corresponding to a counterpart involved in the teleconference; a full face generation unit for generating a final depth image and a final color image corresponding to a full face of the participant for eye contact using the depth images and the color images; and a 3D image generation unit for generating a 3D image corresponding to the counterpart and displaying the 3D image on a display device.
摘要:
A silicon light-receiving device is provided. In the device, a substrate is based on n-type or p-type silicon. A doped region is ultra-shallowly doped with the opposite type dopant to the dopant type of the substrate on one side of the substrate so that a photoelectric conversion effect for light in a wavelength range of 100-1100 nm is generated by a quantum confinement effect in the p-n junction with the substrate. First and second electrodes are formed on the substrate so as to be electrically connected to the doped region. Due to the ultra-shallow doped region on the silicon substrate, a quantum confinement effect is generated in the p-n junction. Even though silicon is used as a semiconductor material, the quantum efficiency of the silicon light-receiving device is far higher than that of a conventional solar cell, owing to the quantum confinement effect. The silicon light-receiving device can also be formed to absorb light in a particular or large wavelength band, and used as a solar cell.
摘要:
The invention relates to nucleic acid sequences encoding a bovine tumor necrosis factor receptor-I (TNF-RI). Also within the invention is a soluble bovine TNF-RI, which is a potent inhibitor of bovine tumor necrosis factor-α (TNF-α). The invention demonstrates that soluble bovine TNF-RI has therapeutic value as an inhibitor of TNF in cattle suffering from coliform mastitis or other inflammatory disease.
摘要:
A method of manufacturing a silicon optoelectronic device, a silicon optoelectronic device manufactured by the method, and an image input and/or output apparatus including the silicon optoelectronic device are provided. The method includes preparing an n- or p-type silicon-based substrate, forming a microdefect pattern along a surface of the substrate by etching, forming a control film with an opening on the microdefect pattern, and forming a doping region on the surface of the substrate having the microdefect pattern in such a way that a predetermined dopant of the opposite type to the substrate is injected onto the substrate through the opening of the control film to be doped to a depth so that a photoelectric conversion effect leading to light emission and/or reception by quantum confinement effect in the p-n junction occurs. The silicon optoelectronic device has superior light-emitting efficiency, can be used as at least one of a light-emitting device and a light-receiving device, and has high wavelength selectivity. In addition, the silicon optoelectronic device panel having the two-dimensional array of the silicon optoelectronic devices can be applied in the image input and/or output apparatus capable of directly displaying an image and/or inputting optical information in a screen.
摘要:
A gate structure using nanodots as a trap site, a semiconductor device having the gate structure and methods of fabricating the same are provided. The gate structure may include a tunneling layer, a plurality of nanodots on the tunneling layer, and a control insulating layer including a high-k dielectric layer on the tunneling layer and the nanodots. A semiconductor memory device may further include a semiconductor substrate, the gate structure according to example embodiments on the semiconductor substrate and a first impurity region and a second impurity region in the semiconductor substrate, wherein the gate structure is in contact with the first and second impurity regions.
摘要:
A silicon light-receiving device is provided. In the device, a substrate is based on n-type or p-type silicon. A doped region is ultra-shallowly doped with the opposite type dopant to the dopant type of the substrate on one side of the substrate so that a photoelectric conversion effect for light in a wavelength range of 100-1100 nm is generated by a quantum confinement effect in the p-n junction with the substrate. First and second electrodes are formed on the substrate so as to be electrically connected to the doped region. Due to the ultra-shallow doped region on the silicon substrate, a quantum confinement effect is generated in the p-n junction. Even though silicon is used as a semiconductor material, the quantum efficiency of the silicon light-receiving device is far higher than that of a conventional solar cell, owing to the quantum confinement effect. The silicon light-receiving device can also be formed to absorb light in a particular or large wavelength band, and used as a solar cell.
摘要:
There are provided a method and an apparatus for generating a multi-viewpoint depth map, and a method for generating a disparity of a multi-viewpoint image. A method for generating a multi-viewpoint depth map according to the present invention includes the steps of: (a) acquiring a multi-viewpoint image constituted by a plurality of images by using a plurality of cameras (b) acquiring an image and depth information by using a depth camera; (c) estimating coordinates of the same point in a space in the plurality of images by using the acquired depth information; (d) determining disparities in the plurality of images with respect to in the same point by searching a predetermined region around the estimated coordinates; and (e) generating a multi-viewpoint depth map by using the determined disparities. According to the above-mentioned present invention, it is possible to generate a multi-viewpoint depth map within a shorter time and generate a multi-viewpoint depth map having higher quality than a multi-viewpoint depth map generated by using known stereo matching.
摘要:
A gate structure using nanodots as a trap site, a semiconductor device having the gate structure and methods of fabricating the same are provided. The gate structure may include a tunneling layer, a plurality of nanodots on the tunneling layer, and a control insulating layer including a high-k dielectric layer on the tunneling layer and the nanodots. A semiconductor memory device may further include a semiconductor substrate, the gate structure according to example embodiments on the semiconductor substrate and a first impurity region and a second impurity region in the semiconductor substrate, wherein the gate structure is in contact with the first and second impurity regions.
摘要:
Provided is a gate structure including a multi-tunneling layer and method of fabricating the same. Also provided is a nanodot semiconductor memory device including such gate structure and method of fabricating the same. The gate structure may include a first insulation layer, a second insulation layer, a charge storage layer including nanodots and formed on the second insulation layer, a third insulation layer formed on the charge storage layer, and a gate electrode layer formed on the third insulation layer. There may also be a nanodot semiconductor memory device including a semiconductor substrate, in which a first impurity region and a second impurity region may be formed, and including the gate structure formed on the semiconductor substrate which contacts the first and second impurity regions. The second insulation layer may be formed on the first insulation layer and may include a material whose energy level may be lower than an energy level of the conduction band of the first insulation layer and higher an energy level of the valence band of the first insulation layer.