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    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
    5.
    发明申请
    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 审中-公开
    具有不同厚度的模板以便于排出位于基板和模板之间的气体

    公开(公告)号：US20100291257A1

    公开(公告)日：2010-11-18

    申请号：US12838852

    申请日：2010-07-19

    申请人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    发明人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    IPC分类号： B28B11/08

    CPC分类号： H01L21/67126 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/6715

    摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.

    摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
    6.
    发明申请
    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 有权
    具有不同厚度的模板以便于排出位于基板和模板之间的气体

    公开(公告)号：US20110171340A1

    公开(公告)日：2011-07-14

    申请号：US13073533

    申请日：2011-03-28

    申请人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    发明人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    IPC分类号： B29C59/02

    CPC分类号： H01L21/67126 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/6715

    摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.

    摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
    7.
    发明申请
    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 审中-公开
    具有不同厚度的模板以便于排出位于基板和模板之间的气体

    公开(公告)号：US20080160129A1

    公开(公告)日：2008-07-03

    申请号：US11744698

    申请日：2007-05-04

    申请人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    发明人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    IPC分类号： B29C59/02

    CPC分类号： H01L21/67126 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/6715

    摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.

    摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

    Apparatus to vary dimensions of a substrate during nano-scale manufacturing
    8.
    发明授权
    Apparatus to vary dimensions of a substrate during nano-scale manufacturing 有权
    用于在纳米级制造期间改变衬底尺寸的装置

    公开(公告)号：US07170589B2

    公开(公告)日：2007-01-30

    申请号：US11142839

    申请日：2005-06-01

    申请人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan K Nimmakayala ,  Mario J. Meissl ,  Sidlgata V. Sreenivasan

    发明人： Anshuman Cherala ,  Byung-Jin Choi ,  Pawan K Nimmakayala ,  Mario J. Meissl ,  Sidlgata V. Sreenivasan

    IPC分类号： G03B27/58 ,  G03B27/42

    CPC分类号： G03F7/0002 ,  B82Y10/00

    摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.

    摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

    Systems for magnification and distortion correction for imprint lithography processes
    9.
    发明授权
    Systems for magnification and distortion correction for imprint lithography processes 有权
    用于压印光刻工艺的放大和失真校正系统

    公开(公告)号：US07150622B2

    公开(公告)日：2006-12-19

    申请号：US10616294

    申请日：2003-07-09

    申请人： Byung-Jin Choi ,  Sidlgata V. Sreenivasan ,  Mario J. Meissl

    发明人： Byung-Jin Choi ,  Sidlgata V. Sreenivasan ,  Mario J. Meissl

    IPC分类号： B28B11/08

    CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.

    摘要翻译： 本发明涉及一种改变模板尺寸的系统，以便衰减如果不是防止由模板形成的底层图案的失真。 为此，该系统具有压缩装置，该压缩装置包括一对间隔开的接触构件，以在一对间隔开的接触构件之间压缩模板的周边表面。 压缩装置包括第一和第二主体，每个具有接触构件和致动器臂。 致动器臂中的一个联接到第一主体以响应于邻近致动器臂设置的气囊的体积的变化而围绕轴线往复运动。 以这种方式，可以改变两个接触构件之间的距离。