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1.发明申请Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 审中-公开具有不同厚度的模板以便于排出位于基板和模板之间的气体公开(公告)号：US20100291257A1
公开(公告)日：2010-11-18
申请号：US12838852
申请日：2010-07-19
IPC分类号： B28B11/08
CPC分类号： H01L21/67126 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6715
摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。
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2.发明申请Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 有权具有不同厚度的模板以便于排出位于基板和模板之间的气体公开(公告)号：US20110171340A1
公开(公告)日：2011-07-14
申请号：US13073533
申请日：2011-03-28
IPC分类号： B29C59/02
CPC分类号： H01L21/67126 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6715
摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。
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3.发明申请Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 审中-公开具有不同厚度的模板以便于排出位于基板和模板之间的气体公开(公告)号：US20080160129A1
公开(公告)日：2008-07-03
申请号：US11744698
申请日：2007-05-04
IPC分类号： B29C59/02
CPC分类号： H01L21/67126 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6715
摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。
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4.发明授权公开(公告)号：US07635445B2
公开(公告)日：2009-12-22
申请号：US11108208
申请日：2005-04-18
申请人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6838 , Y10S977/887
摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.
摘要翻译： 本发明涉及一种将包含在模板中的模具与设置在基板上的层分离的方法，该方法尤其包括向模板施加分离力以将模板与层分离; 并且促进基板中的局部变形以减小实现分离所需的分离力。
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5.发明授权Imprint lithography substrate processing tool for modulating shapes of substrates 有权用于调制基板形状的压印光刻基板处理工具公开(公告)号：US07224443B2
公开(公告)日：2007-05-29
申请号：US11389731
申请日：2006-03-27
申请人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
发明人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
IPC分类号： G03B27/62 , G03B27/42 , G03B27/60 , H01L21/4763
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
摘要翻译： 本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。 夹持系统包括具有第一和第二相对侧的卡盘体。 侧面在其间延伸。 第一侧包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部。 第一支撑区域使第二支撑区域和第一和第二凹槽成像。 第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。 第二面和侧面限定外表面。 主体包括使第一和第二凹槽与外表面之一流体连通的通道。
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6.发明授权公开(公告)号：US07170589B2
公开(公告)日：2007-01-30
申请号：US11142839
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan K Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan K Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B82Y10/00
摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。
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7.发明授权Systems for magnification and distortion correction for imprint lithography processes 有权用于压印光刻工艺的放大和失真校正系统公开(公告)号：US07150622B2
公开(公告)日：2006-12-19
申请号：US10616294
申请日：2003-07-09
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.
摘要翻译： 本发明涉及一种改变模板尺寸的系统，以便衰减如果不是防止由模板形成的底层图案的失真。 为此，该系统具有压缩装置，该压缩装置包括一对间隔开的接触构件，以在一对间隔开的接触构件之间压缩模板的周边表面。 压缩装置包括第一和第二主体，每个具有接触构件和致动器臂。 致动器臂中的一个联接到第一主体以响应于邻近致动器臂设置的气囊的体积的变化而围绕轴线往复运动。 以这种方式，可以改变两个接触构件之间的距离。
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8.发明授权公开(公告)号：US07420654B2
公开(公告)日：2008-09-02
申请号：US11142834
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan K. Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan K. Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/58
摘要： The present invention is directed toward a method to vary dimensions of a substrate supported by a chuck. The method includes applying compressive forces to the substrate with the actuator assembly while facilitating movement of the actuator assembly with respect to the substrate to minimize reactive forces generated in response to the compressive forces being sensed by the chuck.
摘要翻译： 本发明涉及一种改变由卡盘支撑的基底的尺寸的方法。 该方法包括使用致动器组件向基板施加压缩力，同时促进致动器组件相对于基板的移动，以最小化响应于卡盘感测到的压缩力产生的反作用力。
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9.发明授权公开(公告)号：US07298456B2
公开(公告)日：2007-11-20
申请号：US11142808
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan K. Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan K. Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/58
摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting Forces sensed by the substrate chuck generated in response to the compressive forces.
摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的衬底卡盘感测到的结果力的大小。
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公开(公告)号：US09223202B2
公开(公告)日：2015-12-29
申请号：US11774710
申请日：2007-07-09
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Carlton Grant Willson , Mattherw E. Colburn , Todd C. Bailey , John G. Ekerdt
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Carlton Grant Willson , Mattherw E. Colburn , Todd C. Bailey , John G. Ekerdt
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/16 , G03F7/164 , H01L2224/29012 , H01L2224/3003 , H01L2224/3016 , H01L2924/01067 , H01L2924/1461 , H01L2924/00
摘要： Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
摘要翻译： 本文公开了一种用于在板状材料或基板的表面上分配流体的自动流体分配方法和系统，其包括用于压印光刻工艺的半导体晶片。 分配方法使用流体分配器和可在流体分配器尖端基底之间产生相对侧向运动的基底台。 本文还描述了使用基本上未图案化的平面模板在衬底上创建平面表面的方法和装置。
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