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公开(公告)号：US08870396B2
公开(公告)日：2014-10-28
申请号：US13667862
申请日：2012-11-02
申请人： Carl Zeiss SMT GmbH
发明人： Julian Kaller , Wilfried Clauss , Michael Gerhard
CPC分类号： G02B5/08 , C03B19/06 , C03B19/09 , C03C3/06 , C03C10/00 , C03C14/00 , C03C2201/42 , G03F7/70891
摘要： For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials.
摘要翻译： 为了生产用于EUV光刻的反射镜，建议在15℃的温差和Dgr; T的平均相对热纵向膨胀不超过10ppb的基底和在20℃之间的范围内的零交叉温度 对于此目的，选择具有低热膨胀系数和相对热膨胀作为温度的函数的相反梯度的至少一种第一和第二材料，并通过混合和粘合这些材料来生产基底。
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公开(公告)号：US09459538B2
公开(公告)日：2016-10-04
申请号：US14534644
申请日：2014-11-06
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/702 , G02B5/0891 , G02B7/182 , G03F7/70825
摘要： A lithography apparatus is disclosed, having at least one mirror arrangement which includes a mirror substrate including a front side with a reflecting surface, a side wall, which extends along a circumference of the mirror substrate from a rear side of the mirror substrate, and mounting elements to mount the mirror arrangement on a structural element of the lithography apparatus. The rear side of the mirror substrate and an inner side of the side wall delimit a cavity. Each of the mounting elements is connected to the mirror arrangement at a connection surface. The relation S/D>0.5 is satisfied at least one of the connection surfaces, wherein D denotes a thickness of the side wall at the connection surface and S denotes the length of the shortest path through the mirror material from the centroid of the connection surface to the rear side of the mirror substrate.
摘要翻译： 公开了一种光刻设备，其具有至少一个反射镜装置，该反射镜装置包括反射镜基板，该反射镜基板包括具有反射表面的前侧，从该反射镜基板的后侧沿着该反射镜基板的圆周延伸的侧壁， 用于将镜装置安装在光刻设备的结构元件上的元件。 镜面基板的后侧和侧壁的内侧限定空腔。 每个安装元件在连接表面处连接到反射镜装置。 关系S / D> 0.5满足至少一个连接表面，其中D表示连接表面处的侧壁的厚度，S表示从连接表面的质心通过镜子材料的最短路径的长度 到镜基板的后侧。
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公开(公告)号：US09238590B2
公开(公告)日：2016-01-19
申请号：US14204009
申请日：2014-03-11
申请人： CARL ZEISS SMT GmbH
发明人： Wilfried Clauss
IPC分类号： C03C23/00 , C03C17/00 , B05D3/06 , C03B32/00 , C03C17/40 , G02B1/12 , G02B5/08 , G02B7/18 , G03F7/20 , G21K1/06
CPC分类号： C03C23/0005 , C03B32/005 , C03B2201/42 , C03C17/00 , C03C17/40 , C03C2218/31 , G02B1/12 , G02B5/0891 , G02B7/181 , G03F7/70316 , G03F7/7095 , G21K1/062
摘要： A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.
摘要翻译： 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。
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公开(公告)号：US20150055112A1
公开(公告)日：2015-02-26
申请号：US14534644
申请日：2014-11-06
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/702 , G02B5/0891 , G02B7/182 , G03F7/70825
摘要： A lithography apparatus is disclosed, having at least one mirror arrangement which includes a mirror substrate including a front side with a reflecting surface, a side wall, which extends along a circumference of the mirror substrate from a rear side of the mirror substrate, and mounting elements to mount the mirror arrangement on a structural element of the lithography apparatus. The rear side of the mirror substrate and an inner side of the side wall delimit a cavity. Each of the mounting elements is connected to the mirror arrangement at a connection surface. The relation S/D>0.5 is satisfied at least one of the connection surfaces, wherein D denotes a thickness of the side wall at the connection surface and S denotes the length of the shortest path through the mirror material from the centroid of the connection surface to the rear side of the mirror substrate.
摘要翻译： 公开了一种光刻设备，其具有至少一个反射镜装置，该反射镜装置包括反射镜基板，该反射镜基板包括具有反射表面的前侧，从该反射镜基板的后侧沿着该反射镜基板的圆周延伸的侧壁， 用于将反射镜装置安装在光刻设备的结构元件上的元件。 镜面基板的后侧和侧壁的内侧限定空腔。 每个安装元件在连接表面处连接到反射镜装置。 关系S / D> 0.5满足至少一个连接表面，其中D表示连接表面处的侧壁的厚度，S表示从连接表面的质心通过镜子材料的最短路径的长度 到镜基板的后侧。
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