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18 条记录 (耗时 0.012 秒)

    Bis-oxalic acid ester amides for use as ultraviolet stabilizers
    2.
    发明授权
    Bis-oxalic acid ester amides for use as ultraviolet stabilizers 失效
    用作超紫外线稳定剂的双酚A酸酯乳剂

    公开(公告)号：US3639249A

    公开(公告)日：1972-02-01

    申请号：US3639249D

    申请日：1968-05-13

    申请人： CIBA LTD

    发明人： LUETHI CHRISTIAN ,  BILAND HANS RUDOLF ,  DUENNENBERGER MAX

    IPC分类号： A61K8/42 ,  A61Q17/04 ,  C09K15/22 ,  C11B5/00 ,  D06M13/418 ,  G03C1/815 ,  F21V9/06

    CPC分类号： C11B5/0057 ,  A61K8/42 ,  A61Q17/04 ,  C09K15/22 ,  D06M13/418 ,  G03C1/8155

    摘要： The present invention provides a process for protecting organic materials that can be damaged by ultraviolet light from the effects of ultraviolet rays, characterized in that a bis-oxalic acid amide ester is incorporated with, or applied to the surface of the materials to be protected, or a filter layer containing the bis-oxalic acid amide esters is placed in front of said materials, the said bis-oxalic acid amide ester corresponding to the formula A1-O-CO-CO-NH-W1-NH-CO-CO-O-B1 in which A1 and B1 are identical or different and each represents an organic residue and should not displace the absorption maximum of these compounds to values above 370 Mu ; W1 represents an organic residue and should not displace the absorption maximum of these compounds to values above 370 Mu ; W1 represents an organic residue, and X1 represents an alkylene group containing one to four carbon atoms or a bridge member -O-, -S-, -N- or -SO2-. Furthermore the invention discloses a certain class of novel symmetric bis-oxalic acid amide esters as defined by formula (6) of the specification and a process for the manufacture of the symmetric bis-oxalic acid amide esters defined above.

    摘要翻译： 本发明提供了一种保护有机材料的方法，所述有机材料可能受到紫外线的影响而受到紫外线的损害，其特征在于双草酸酰胺酯与待保护的材料的表面结合或应用于被保护材料的表面， 或将含有双草酸酰胺酯的过滤层置于所述材料的前面，所述双草酸酰胺酯对应于式A1-O-CO-CO-NH-W1-NH-CO-CO- O-B1其中A1和B1相同或不同，各自表示有机残基，不应将这些化合物的吸收最大值置换为370多个值; W1代表有机残留物，不应将这些化合物的吸收最大值置换为370多个值; W1表示有机残基，X 1表示碳原子数1〜4的亚烷基或桥状基团-O-，-S - ， - -N-或-SO 2 - 。

    Triazine compounds
    3.
    发明授权
    Triazine compounds 失效
    TRIAZINE化合物

    公开(公告)号：US3594375A

    公开(公告)日：1971-07-20

    申请号：US3594375D

    申请日：1968-11-26

    申请人： CIBA LTD

    发明人： SCHELLENBAUM MAX ,  DUENNENBERGER MAX

    IPC分类号： C07D251/18 ,  C08K5/3492 ,  D06M16/00 ,  C07D55/20

    CPC分类号： C07D251/18 ,  C08K5/3492 ,  D06M16/00

    摘要： THE PRESENT INVENTION IS CONCERNED WITH A NEW ARYLGUANAMINES WHEREIN ONE CARBON ATOM OF THE TRIAZINE RING IS LINKED DIRECTLY TO A BENZENE RING, THE SECOND CARBON ATOM IS LINKED BY AN -NH- GROUP TO A BENZENE RING AND THE THIRD CARBON ATOM IS LINKED TO AN - HN- ALKYLENE GROUP, THE LATTER BEING BOUND TO THE NITROGEN ATOMS OF A TERTIARY AMINO GROUP. THE NEW ARYLGUANAMINES ARE USEFUL FOR CONTROLLING HARMFUL MICROORGANISMS.

    Salicylic acid omicron-hydroxyphenylamides
    5.
    发明授权
    Salicylic acid omicron-hydroxyphenylamides 失效
    亚油酸奥莫康 - 羟基苯甲酸

    公开(公告)号：US3576869A

    公开(公告)日：1971-04-27

    申请号：US3576869D

    申请日：1968-07-16

    申请人： CIBA LTD

    发明人： SCHELLENBAUM MAX ,  DUENNENBERGER MAX

    IPC分类号： A01N37/40 ,  D06M16/00 ,  C07C103/30

    CPC分类号： D06M16/00 ,  A01N37/40

    摘要： THIS INVENTION PROVIDES NEW SALICYCLIC O-HYDROXYPHENYLAMIDES OF THE GENERAL FORMULA

    R-CO-NH-R''

    WHEREIN R AND R'' EACH REPRESENTS A PHENYL GROUP WITH AN ORTHO HYDROXY GROUP. R MAY BE FURTHER SUBSTITUTED IN 3 TO 5 POSITION BY CHLORINE OR BROMINE AND R'' IS FURTHER SUBSTITUTED IN 4'' OR 5'' POSITION BY TRIFLUOROMETHYL ALKYL, CYCLOALKYL, ARYL AND ARALKYL RESIDUES.

    Novel phenyl and naphthalene substituted oxalic acid diamides useful as protection agents against ultraviolet irradiation
    6.
    发明授权
    Novel phenyl and naphthalene substituted oxalic acid diamides useful as protection agents against ultraviolet irradiation 失效
    新型苯乙烯和萘磺酸取代的羟基酸作为防紫外线辐射的保护剂

    公开(公告)号：US3626008A

    公开(公告)日：1971-12-07

    申请号：US3626008D

    申请日：1968-03-14

    申请人： CIBA LTD

    发明人： BILAND HANS RUDOLF ,  LUETHI CHRISTIAN ,  DUENNENBERGER MAX

    IPC分类号： C07C233/00 ,  C07C233/16 ,  C07D295/12 ,  C08K5/18 ,  C08L23/02 ,  C08L27/00 ,  C08L67/00 ,  C08L75/04 ,  C09D7/00 ,  C09D167/06 ,  C09K15/22 ,  C09K15/30

    CPC分类号： C07C251/72 ,  C07C243/00 ,  C07C255/00 ,  C09K15/22 ,  C09K15/30

    摘要： The present invention provides a process for protecting organic materials which may be damaged by exposure to ultraviolet rays, from damage by ultraviolet irradiation, characterized in that an oxalic acid diamide derivative is incorporated with or applied to the surface of the materials to be protected or in front of said materials a filter layer is placed that contains such oxalic acid diamide derivative of the formula: Ar1-NH-CO-CO-B1 in which Ar1 represents a benzene or naphthalene residue, which may be substituted by phenyl, benzazolyl, cyclohexyl, benzoyloxy or aliphatic groups with not more than 20 carbon atoms, and wherein B1 represents a residue of the partial formula- NH-D1 or

    WHERE D1 stands for a possibly substituted alkyl group, alkenyl, hydroxyl, cycloalkyl, carboxylic or sulfonic acid group or a functional derivative thereof; Q represents a member selected from the group consisting of hydrogen, hydroxyalkyl, alkoxyalkyl and Q+W represents a piperidino and a morpholino residue and W stands for a member selected from the group consisting of hydroxyalkyl, alkoxyalkyl, acyl, a carboxylic group, a sulfonic acid group, a functional derivative thereof, a residue of the formula- NHWx (where Wx is hydrogen, alkyl, acyl or phenyl), and an aminoalkyl group whose amino group may be alkylated, cycloalkylated or arylated.

    Process for protecting organic material from the action of ultraviolet rays
    10.
    发明授权
    Process for protecting organic material from the action of ultraviolet rays 失效
    保护有机材料从超紫外线的作用

    公开(公告)号：US3529982A

    公开(公告)日：1970-09-22

    申请号：US3529982D

    申请日：1967-02-06

    申请人： CIBA LTD

    发明人： LUETHI CHRISTIAN ,  DUENNENBERGER MAX ,  BILAND HANS RUDOLF

    IPC分类号： A61K8/42 ,  A61Q17/04 ,  C07C233/16 ,  C08K5/20 ,  C09K15/22 ,  G03C1/815 ,  C08F45/60 ,  B44D1/00 ,  C08G51/60

    CPC分类号： G03C1/8155 ,  A61K8/42 ,  A61Q17/04 ,  C07C233/16 ,  C08K5/20 ,  C09K15/22

    摘要： This invention refers to a process for protecting organic materials that can be damaged by ultraviolet rays, from the action of ultraviolet rays, wherein asymmetrical oxalic acid diarylamides of the general formula A-NH-CO-CO-NH-B where A and B are different from each other and each represents a benzene or naphthalene residue, these residues A and B (a) being free from hydroxyl groups in the ortho-positions to the amide nitrogen atom and (b) containing if desired substituents that contain no more than 20 carbon atoms and do not displace the absorption maximum of the compound towards values above 400 m mu , are applied to said materials, as well as compositions containing said oxalic acid diarylamides.

    摘要翻译： 本发明涉及一种通过紫外线作用保护可被紫外线损伤的有机材料的方法，其中通式A-NH-CO-CO-NH-B的不对称草酸二芳基酰胺A和B为 彼此不同，各自表示苯或萘残基，这些残基A和B（a）在酰胺氮原子的邻位不含羟基，（b）如果需要，含有不超过20个 碳原子，并且不将化合物的吸收最大值置换为高于400μm的值，施加到所述材料以及含有所述草酸二芳基酰胺的组合物。