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    UV and DUV expanded cold mirrors
    2.
    发明授权
    UV and DUV expanded cold mirrors 有权

    公开(公告)号：US09696467B2

    公开(公告)日：2017-07-04

    申请号：US14602550

    申请日：2015-01-22

    Applicant: Corning Incorporated

    Inventor： Horst Schreiber ,  Jue Wang

    IPC: G02B5/08 ,  G02B5/20 ,  G02B1/10 ,  G02B1/12 ,  G02B5/28

    CPC classification number: G02B5/0891 ,  G02B1/10 ,  G02B1/12 ,  G02B5/0833 ,  G02B5/283

    Abstract: An expanded cold mirror is provided. The mirror includes a substrate and a coating deposited on the substrate. The coating includes a first coating stack comprising at least one period of a low refractive index metal oxide coating layer and a high refractive index metal oxide coating layer, a second coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal oxide layer, and a third coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal fluoride coating layer.

    WAVEGUIDE FOR TRANSMITTING LIGHT
    4.
    发明申请
    WAVEGUIDE FOR TRANSMITTING LIGHT 审中-公开

    公开(公告)号：US20200257120A1

    公开(公告)日：2020-08-13

    申请号：US16778912

    申请日：2020-01-31

    Applicant: CORNING INCORPORATED

    Inventor： Michael Lucien Genier ,  Mark Francis Krol ,  Michael John Moore ,  Horst Schreiber

    IPC: G02B27/01 ,  F21V8/00

    Abstract: An optical device includes a stack that includes a first curved optical element stacked with a second curved optical element. The second curved optical element propagates light by total internal reflection. The stack also includes an incoupling diffractive grating that incouples the light into the second optical element and an outcoupling diffractive grating optically coupled to the incoupling diffractive grating through the second curved optical element. The outcoupling diffractive grating directs the light. The first curved optical element has a first refractive index, the second curved optical element has a second refractive index, and the first refractive index is different from the second refractive index by approximately 0.15 to 1.2.

    Medical device disinfecting system and method
    5.
    发明授权
    Medical device disinfecting system and method 有权

    公开(公告)号：US10543058B2

    公开(公告)日：2020-01-28

    申请号：US15753824

    申请日：2016-08-18

    Applicant: Corning Incorporated

    Inventor： Anthony Sebastian Bauco ,  Kevin Wallace Bennett ,  William Spencer Klubben, III ,  Horst Schreiber

    IPC: A61B90/70 ,  A61L2/10 ,  A61L2/08 ,  G02B6/02

    Abstract: A system for disinfecting a medical device is provided. The system includes a light source that generates light having at least one wavelength between about 100 nm and about 500 nm. The system further includes at least one cylindrical optical diffuser disposed in optical communication with at least one interior channel of a medical device, the at least one cylindrical optical diffuser having an outer surface and an end optically coupled to the light source. The at least one cylindrical optical diffuser is configured to scatter guided light through the outer surface to form a light diffuser portion having a length that emits substantially uniform radiation over its length.

    Plasma ion assisted deposition of Mo/Si multilayer EUV coatings
    6.
    发明授权
    Plasma ion assisted deposition of Mo/Si multilayer EUV coatings 有权
    Mo / Si多层EUV涂层的等离子体离子辅助沉积

    公开(公告)号：US08817367B2

    公开(公告)日：2014-08-26

    申请号：US13956816

    申请日：2013-08-01

    Applicant: Corning Incorporated

    Inventor： Horst Schreiber ,  Jue Wang

    IPC: G02B5/08 ,  C23C14/58 ,  G03F1/24 ,  G02B5/28 ,  B82Y40/00 ,  C23C14/22 ,  B82Y10/00 ,  C03C17/36

    CPC classification number: G02B5/283 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/3636 ,  C03C17/40 ,  C03C2218/32 ,  C23C14/22 ,  C23C14/5833 ,  C23C14/5873 ,  G02B5/0891 ,  G03F1/24

    Abstract: The disclosure is directed to multilayer Mo/Si coatings for reflective mirrors used in extreme ultraviolet lithographic systems and to a method of making such mirrors using plasma ion assisted deposition (PIAD) techniques. The coating are deposited on a substrate suitable for EUV lithography, and are Mo/Si coating consisting of 40-100 Mo/Si periods, each period consisting on a Mo layer followed by a Si layer. Each of the individual Mo and Si layers is deposited to a specified or target thickness in the range of 2 nm to 5 nm, and the thicknesses are controlled to ±0.1 nm. A plasma from a plasma source is used to densify and smooth the substrate prior to deposition of the coating, and each layer of the coating is plasma densified and smoothed.

    Abstract translation: 本公开涉及用于极紫外光刻系统的反射镜的多层Mo / Si涂层以及使用等离子体离子辅助沉积（PIAD）技术制造这种反射镜的方法。 涂层沉积在适用于EUV光刻的基板上，并且是由40-100Mo / Si周期组成的Mo / Si涂层，每个周期由Mo层和Si层组成。 将各个Mo和Si层分别沉积到2nm至5nm范围内的规定或目标厚度，并将其厚度控制在±0.1nm。 使用来自等离子体源的等离子体在沉积涂层之前使衬底致密化和平滑化，并且涂层的每层是等离子体致密化和平滑化的。

    Silica-modified-fluoride broad angle anti-reflection coatings
    9.
    发明授权
    Silica-modified-fluoride broad angle anti-reflection coatings 有权
    二氧化硅改性氟化物广角防反射涂料

    公开(公告)号：US09482790B2

    公开(公告)日：2016-11-01

    申请号：US13834008

    申请日：2013-03-15

    Applicant: CORNING INCORPORATED

    Inventor： Michael Jerome Cangemi ,  Paul Gerard Dewa ,  Joseph D Malach ,  Paul Francis Michaloski ,  Horst Schreiber ,  Jue Wang

    IPC: G02B1/11 ,  G02B1/115 ,  G02B1/10 ,  G03F7/20

    CPC classification number: G02B1/115 ,  G02B1/10 ,  G02B1/105 ,  G03F7/7015 ,  G03F7/70958

    Abstract: The disclosure is directed to a coating consisting of a binary metal fluoride coating consisting a high refractive index metal fluoride layer on top of a substrate, a low refractive index metal fluoride layer on top of the high refractive index layer and layer of SiO2 or F—SiO2 containing 0.2 wt % to 4.5 (2000 ppm to 45,000 ppm) F on top of the low refractive index layer. In one embodiment the F content of F—SiO2 is in the range of 5000 ppm to 10,000 ppm F. The high index and low index materials are each deposited to a thickness of less than or equal to 0.9 quarter wave, and the capping material is deposited to a thickness in the range of 5 nm to 25 nm. The disclosure is also directed to optical elements having the foregoing coating and a method of making the coating.

    Abstract translation: 本发明涉及一种由二元金属氟化物涂层组成的涂层，该涂层由基底顶部的高折射率金属氟化物层，高折射率层顶部的低折射率金属氟化物层和SiO 2或F- 在低折射率层的顶部含有0.2重量％〜4.5（2000ppm〜45,000ppm）F的SiO 2。 在一个实施方案中，F-SiO 2的F含量在5000ppm至10,000ppm F的范围内。高折射率和低折射率材料各自沉积至小于或等于0.9的1/4波长，并且封盖材料为 沉积到5nm至25nm范围内的厚度。 本发明还涉及具有上述涂层的光学元件和制备该涂层的方法。

    Medical device disinfecting system and method
    10.
    发明授权
    Medical device disinfecting system and method 有权

    公开(公告)号：US10856952B2

    公开(公告)日：2020-12-08

    申请号：US16715327

    申请日：2019-12-16

    Applicant: CORNING INCORPORATED

    Inventor： Anthony Sebastian Bauco ,  Kevin Wallace Bennett ,  William Spencer Klubben, III ,  Horst Schreiber

    IPC: A61B90/70 ,  A61L2/10 ,  A61L2/08 ,  F21V8/00 ,  G02B6/02

    Abstract: A system for disinfecting a medical device is provided. The system includes a light source that generates light having at least one wavelength between about 100 nm and about 500 nm. The system further includes at least one cylindrical optical diffuser disposed in optical communication with at least one interior channel of a medical device, the at least one cylindrical optical diffuser having an outer surface and an end optically coupled to the light source. The at least one cylindrical optical diffuser is configured to scatter guided light through the outer surface to form a light diffuser portion having a length that emits substantially uniform radiation over its length.

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