GAS SENSOR
    2.
    发明申请

    公开(公告)号:US20220031228A1

    公开(公告)日:2022-02-03

    申请号:US17389765

    申请日:2021-07-30

    IPC分类号: A61B5/00 H01L51/00

    摘要: A device for analyzing gas emitted from skin includes: an enclosure for collecting the gas emitted from skin, the enclosure having: an inlet through which a carrier gas is flown; and an outlet through which the carrier gas and the gas emitted from skin is flown into a vertical gas sensor, such that the vertical gas sensor has: a substrate; a collector layer; an emitter layer positively biased relative to the collector; a metal grid with a metal layer having openings, the metal grid located in between, but not in direct contact with, the collector and emitter; and an organic semiconductor (OSC) layer located in between the collector and emitter.

    METHODS FOR ETCHING GLASS-BASED SUBSTRATES

    公开(公告)号:US20230064818A1

    公开(公告)日:2023-03-02

    申请号:US17893398

    申请日:2022-08-23

    IPC分类号: C03C15/00

    摘要: Glass-based substrates are described herein that may be processed by methods including applying a cover article onto a glass-based substrate, submerging the glass-based substrate in an etchant, and maintaining the submersion of the glass-based substrate in the etchant. The glass-based substrate may include a covered surface portion and an exposed surface portion. At least a portion of the covered surface portion may be in direct contact with the cover article. The covered surface portion may not be in contact with the etchant and the exposed surface portion may be in direct contact with the etchant. The etchant may contact the exposed surface portion and the cover article fora time sufficient to etch the exposed surface portion. The cover article may provide a barrier between the etchant and the covered surface portion for the entirety of the submerging.