Surface and site-specific polymerization by direct-write lithography
    1.
    发明授权
    Surface and site-specific polymerization by direct-write lithography 失效
    通过直写光刻技术进行表面和位点特异性聚合

    公开(公告)号:US07326380B2

    公开(公告)日:2008-02-05

    申请号:US10893543

    申请日:2004-07-19

    IPC分类号: B29C35/08

    摘要: Polymeric microstructures and nanostructures can be prepared with use of a tip to pattern a surface. A tip can be used to pattern a structure which can initiate polymerization. The structure can be then exposed to monomer to induce polymerization at the structure. Alternatively, a tip can be used to pattern a surface with a monomer in which the surface is treated with polymerization catalyst so that polymerization occurs at the patterning site. Ring-opening metathesis polymerization can be carried out with use of the tip to control the polymerization. The tip can be a sharp tip as used in for example an atomic force microscope tip. Norbornene types of monomers can be used. Biological macromolecules can be also prepared.

    摘要翻译: 可以使用尖端来制备聚合物微结构和纳米结构以对表面进行图案化。 尖端可用于图案化可引发聚合的结构。 然后将该结构暴露于单体以在结构处引发聚合。 或者,可以使用尖端来用表面用聚合催化剂处理的单体对表面进行图案化,使得在图案化位点发生聚合。 可以使用尖端进行开环易位聚合以控制聚合。 尖端可以是例如原子力显微镜尖端中使用的尖锐尖端。 可以使用降冰片烯类型的单体。 还可制备生物大分子。

    SURFACE AND SITE-SPECIFIC POLYMERIZATION BY DIRECT-WRITE LITHOGRAPHY
    2.
    发明申请
    SURFACE AND SITE-SPECIFIC POLYMERIZATION BY DIRECT-WRITE LITHOGRAPHY 失效
    通过直写写地图的表面和位点特异性聚合

    公开(公告)号:US20080167202A1

    公开(公告)日:2008-07-10

    申请号:US11966764

    申请日:2007-12-28

    IPC分类号: C40B40/14 B05D5/00

    摘要: Polymeric microstructures and nanostructures can be prepared with use of a tip to pattern a surface. A tip can be used to pattern a structure which can initiate polymerization. The structure can be then exposed to monomer to induce polymerization at the structure. Alternatively, a tip can be used to pattern a surface with a monomer in which the surface is treated with polymerization catalyst so that polymerization occurs at the patterning site. Ring-opening metathesis polymerization can be carried out with use of the tip to control the polymerization. The tip can be a sharp tip as used in for example an atomic force microscope tip. Norbornene types of monomers can be used. Biological macromolecules can be also prepared.

    摘要翻译: 可以使用尖端来制备聚合物微结构和纳米结构以对表面进行图案化。 尖端可用于图案化可引发聚合的结构。 然后将该结构暴露于单体以在结构处引发聚合。 或者,可以使用尖端来用表面用聚合催化剂处理的单体对表面进行图案化,使得在图案化位点发生聚合。 可以使用尖端进行开环易位聚合以控制聚合。 尖端可以是例如原子力显微镜尖端中使用的尖锐尖端。 可以使用降冰片烯类型的单体。 还可制备生物大分子。

    Surface and site-specific polymerization by direct-write lithography
    3.
    发明授权
    Surface and site-specific polymerization by direct-write lithography 失效
    通过直写光刻技术进行表面和位点特异性聚合

    公开(公告)号:US08012400B2

    公开(公告)日:2011-09-06

    申请号:US11966764

    申请日:2007-12-28

    IPC分类号: B29C35/08

    摘要: Polymeric microstructures and nanostructures can be prepared with use of a tip to pattern a surface. A tip can be used to pattern a structure which can initiate polymerization. The structure can be then exposed to monomer to induce polymerization at the structure. Alternatively, a tip can be used to pattern a surface with a monomer in which the surface is treated with polymerization catalyst so that polymerization occurs at the patterning site. Ring-opening metathesis polymerization can be carried out with use of the tip to control the polymerization. The tip can be a sharp tip as used in for example an atomic force microscope tip. Norbornene types of monomers can be used. Biological macromolecules can be also prepared.

    摘要翻译: 可以使用尖端来制备聚合物微结构和纳米结构以对表面进行图案化。 尖端可用于图案化可引发聚合的结构。 然后将该结构暴露于单体以在结构处引发聚合。 或者,可以使用尖端来用表面用聚合催化剂处理的单体对表面进行图案化,使得在图案化位点发生聚合。 可以使用尖端进行开环易位聚合以控制聚合。 尖端可以是例如原子力显微镜尖端中使用的尖锐尖端。 可以使用降冰片烯类型的单体。 还可制备生物大分子。

    Patterning of solid state features by direct write nanolithographic printing
    4.
    发明授权
    Patterning of solid state features by direct write nanolithographic printing 有权
    通过直写纳米光刻印刷图案固态特征

    公开(公告)号:US07811635B2

    公开(公告)日:2010-10-12

    申请号:US11847263

    申请日:2007-08-29

    IPC分类号: B05D5/00 B05D3/02

    摘要: The present invention includes a method of fabricating organic/inorganic composite nanostructures on a substrate comprising depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography. The nanostructures comprises arrays of lines and/or dots having widths/diameters less than 1 micron. The present invention also includes a device comprising an organic/inorganic composite nanoscale region chemically bonded to a substrate, wherein the nanoscale region, wherein the nanoscale region has a nanometer scale dimension other than height.

    摘要翻译: 本发明包括在衬底上制造有机/无机复合纳米结构的方法,其包括使用浸渍笔纳米光刻法在衬底上沉积具有嵌段共聚物和无机前体的溶液。 纳米结构包括具有小于1微米的宽度/直径的线和/或点的阵列。 本发明还包括一种包括化学键合到基底上的有机/无机复合纳米尺度区域的器件,其中所述纳米尺度区域,其中所述纳米尺度区域具有除了高度之外的纳米尺度尺寸。

    Patterning of solid state features by direct write nanolithographic printing
    5.
    发明授权
    Patterning of solid state features by direct write nanolithographic printing 失效
    通过直写纳米光刻印刷图案固态特征

    公开(公告)号:US07273636B2

    公开(公告)日:2007-09-25

    申请号:US10320721

    申请日:2002-12-17

    IPC分类号: B05D5/00 B05D3/02

    摘要: The present invention includes a method of fabricating organic/inorganic composite nanostructures on a substrate comprising depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography. The process can comprise providing a substrate, providing a nanoscopic tip having an inking composition thereon, wherein the inking composition comprises at least one metal oxide precursor; and transferring the inking composition from the nanoscopic tip to the substrate to form a deposit on the substrate comprising at least one metal oxide precursor, and optionally further comprising the step of converting the metal oxide precursor on the substrate to form the metal oxide. The nanostructures comprises arrays of lines and/or dots having widths/diameters less than 1 micron. The present invention also includes a device comprising an organic/inorganic composite nanoscale region chemically bonded to a substrate, wherein the nanoscale region, wherein the nanoscale region has a nanometer scale dimension other than height.

    摘要翻译: 本发明包括在衬底上制造有机/无机复合纳米结构的方法,其包括使用浸渍笔纳米光刻法在衬底上沉积具有嵌段共聚物和无机前体的溶液。 该方法可以包括提供衬底,提供其上具有着色组合物的纳米级尖端,其中所述着墨组合物包含至少一种金属氧化物前体; 以及将所述上墨组合物从所述纳米级尖端转移到所述基底以在包含至少一种金属氧化物前体的所述基底上形成沉积物,并且任选地还包括将所述基底上的所述金属氧化物前体转化以形成所述金属氧化物的步骤。 纳米结构包括具有小于1微米的宽度/直径的线和/或点的阵列。 本发明还包括一种包括化学键合到基底上的有机/无机复合纳米尺度区域的器件,其中所述纳米尺度区域,其中所述纳米尺度区域具有除了高度之外的纳米尺度尺寸。

    Patterning magnetic nanostructures
    7.
    发明授权
    Patterning magnetic nanostructures 失效
    图案磁性纳米结构

    公开(公告)号:US07223438B2

    公开(公告)日:2007-05-29

    申请号:US10663976

    申请日:2003-09-17

    IPC分类号: B05D5/12

    CPC分类号: B82Y25/00 H01F1/009

    摘要: A direct-write method for fabricating magnetic nanostructures, including hard magnetic nanostructures of barium hexaferrite, BaFe, based on nanolithographic printing and a sol-gel process. This method utilizes a conventional atomic force microscope tip, coated with a magnetic material precursor solution, to generate patterns that can be post-treated at elevated temperature to generate magnetic features consisting of barium ferrite in its hexagonal magnetoplumbite (M-type) structure. Features ranging from several hundred nm down to below 100 nm were generated and studied using AFM, magnetic force microscopy, and X-ray photoelectron spectroscopy. The approach offers a new way for patterning functional inorganic magnetic nanostructures with deliberate control over feature size and shape, as well as interfeature distance and location.

    摘要翻译: 一种用于制造磁纳米结构的直写方法,包括基于纳米光刻印刷的六方铁钡钡硬质纳米结构和BaFe,以及溶胶 - 凝胶法。 该方法利用传统的原子力显微镜尖端,涂覆有磁性材料前体溶液,以产生可在升高的温度下进行后处理的图案,以产生由六方晶磁石(M型)结构的钡铁氧体组成的磁特征。 使用AFM,磁力显微镜和X射线光电子能谱技术生产并研究了从几百nm到低于100nm的特征。 该方法提供了一种新颖的方式来对功能性无机磁性纳米结构进行图案化,并有意识地控制特征尺寸和形状,以及间隔距离和位置。

    Surface and site-specific polymerization by direct-write lithography
    8.
    发明申请
    Surface and site-specific polymerization by direct-write lithography 失效
    通过直写光刻技术进行表面和位点特异性聚合

    公开(公告)号:US20050272885A1

    公开(公告)日:2005-12-08

    申请号:US10893543

    申请日:2004-07-19

    摘要: Polymeric microstructures and nanostructures can be prepared with use of a tip to pattern a surface. A tip can be used to pattern a structure which can initiate polymerization. The structure can be then exposed to monomer to induce polymerization at the structure. Alternatively, a tip can be used to pattern a surface with a monomer in which the surface is treated with polymerization catalyst so that polymerization occurs at the patterning site. Ring-opening metathesis polymerization can be carried out with use of the tip to control the polymerization. The tip can be a sharp tip as used in for example an atomic force microscope tip. Norbornene types of monomers can be used. Biological macromolecules can be also prepared.

    摘要翻译: 可以使用尖端来制备聚合物微结构和纳米结构以对表面进行图案化。 尖端可用于图案化可引发聚合的结构。 然后将该结构暴露于单体以在结构处引发聚合。 或者,可以使用尖端来用表面用聚合催化剂处理的单体对表面进行图案化,使得在图案化位点发生聚合。 可以使用尖端进行开环易位聚合以控制聚合。 尖端可以是例如原子力显微镜尖端中使用的尖锐尖端。 可以使用降冰片烯类型的单体。 还可制备生物大分子。

    Temperature controlling device of heating element and method thereof
    9.
    发明授权
    Temperature controlling device of heating element and method thereof 有权
    加热元件的温度控制装置及其方法

    公开(公告)号:US08165725B2

    公开(公告)日:2012-04-24

    申请号:US11887081

    申请日:2006-03-21

    申请人: Xiaogang Liu

    发明人: Xiaogang Liu

    CPC分类号: G05D23/19

    摘要: A kind of temperature controlling device of heating element and method thereof detect the actual temperature of heating body of the heating element, and calculate the descending gradient and frequency of temperature based on the detected actual temperature. The norm signal is formed based on the actual temperature, descending gradient and frequency of the temperature to control the switch power as to achieve the split second control for the electric power of the heating element.

    摘要翻译: 一种加热元件的温度控制装置及其方法,检测加热元件的加热体的实际温度,并根据检测到的实际温度计算出降温梯度和温度的频率。 基于实际温度,下降梯度和温度频率形成范数信号,以控制开关功率,以实现对加热元件的电力的分裂第二控制。

    PATTERNING OF SOLID STATE FEATURES BY DIRECT WRITE NANOLITHOGRAPHIC PRINTING
    10.
    发明申请
    PATTERNING OF SOLID STATE FEATURES BY DIRECT WRITE NANOLITHOGRAPHIC PRINTING 有权
    通过直写写纳印刷印刷固体状态特征

    公开(公告)号:US20080044575A1

    公开(公告)日:2008-02-21

    申请号:US11847263

    申请日:2007-08-29

    IPC分类号: B05D5/00

    摘要: The present invention includes a method of fabricating organic/inorganic composite nanostructures on a substrate comprising depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography. The nanostructures comprises arrays of lines and/or dots having widths/diameters less than 1 micron. The present invention also includes a device comprising an organic/inorganic composite nanoscale region chemically bonded to a substrate, wherein the nanoscale region, wherein the nanoscale region has a nanometer scale dimension other than height.

    摘要翻译: 本发明包括在衬底上制造有机/无机复合纳米结构的方法,其包括使用浸渍笔纳米光刻法在衬底上沉积具有嵌段共聚物和无机前体的溶液。 纳米结构包括具有小于1微米的宽度/直径的线和/或点的阵列。 本发明还包括一种包括化学键合到基底上的有机/无机复合纳米尺度区域的器件,其中所述纳米尺度区域,其中所述纳米尺度区域具有除了高度之外的纳米尺度尺寸。