公开(公告)号：US08308865B2

公开(公告)日：2012-11-13

申请号：US12248367

申请日：2008-10-09

申请人： Changsung Sean Kim ,  Jong Pa Hong ,  Kyung Ho Lee

发明人： Changsung Sean Kim ,  Jong Pa Hong ,  Kyung Ho Lee

IPC分类号： C23C16/455 ,  C23C16/52 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45514 ,  C23C16/45565 ,  C23C16/45572 ,  C23C16/45574

摘要： A showerhead for chemical vapor deposition (CVD) includes a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber, and at least one support member passing through and coupled with the head and the reaction chamber so as to support the head.

摘要翻译： 用于化学气相沉积（CVD）的喷头包括头部，其存储反应气体，并将储存的反应气体输送到反应室;以及至少一个支撑构件，其通过并与头部和反应室结合，以支撑 头。

公开(公告)号：US20090260572A1

公开(公告)日：2009-10-22

申请号：US12263781

申请日：2008-11-03

申请人： Changsung Sean Kim ,  Sang Duk Yoo ,  Jong Pa Hong ,  Won Shin Lee

发明人： Changsung Sean Kim ,  Sang Duk Yoo ,  Jong Pa Hong ,  Won Shin Lee

IPC分类号： C23C16/455 ,  C23C16/458

CPC分类号： C23C16/45508 ,  C23C16/45574

摘要： There is provided a chemical vapor deposition apparatus including: a chamber including a reactor where a deposition object is deposited; a first supplier including a plurality of gas pipes allowing a first gas to be jetted into the reactor in a substantially horizontal direction; a second supplier including a plurality of holes of a predetermined size having the gas pipes inserted therein, respectively; a supply flow path formed between each of the gas pipes and each of the holes, the supply flow path allowing a second gas to be supplied into the reactor in a substantially horizontal direction.

摘要翻译： 提供了一种化学气相沉积设备，其包括：包括沉积物体的反应器的室; 第一供应商包括允许第一气体在大致水平方向上喷射到反应器中的多个气体管道; 第二供应商包括分别插入有气体管的预定尺寸的多个孔; 在每个气体管道和每个孔之间形成的供应流动路径，供应流动路径允许第二气体沿大致水平的方向供应到反应器中。

公开(公告)号：US20100024727A1

公开(公告)日：2010-02-04

申请号：US12407347

申请日：2009-03-19

申请人： Changsung Sean Kim ,  Young Sun Won ,  Jong Pa Hong ,  Yong Il Kwon ,  Ji Hye Shim

发明人： Changsung Sean Kim ,  Young Sun Won ,  Jong Pa Hong ,  Yong Il Kwon ,  Ji Hye Shim

IPC分类号： C23C16/44

CPC分类号： C23C16/45502 ,  C23C16/45565

摘要： Provided is a showerhead that can inject a reaction gas into a reaction chamber in a manner such that the injected reaction gas form a spiral vortex flow field. Therefore, the injected reaction gas can be mixed within a shorter distance, and thus the effective deposition radius of a wafer can be increased so that uniform-density deposition can be performed on the entire surface of the wafer using the mixed reaction gas.

摘要翻译： 提供一种喷射器，其能够以使得注入的反应气体形成螺旋涡流场的方式将反应气体注入反应室。 因此，注入的反应气体可以在更短的距离内混合，从而可以提高晶片的有效沉积半径，从而可以使用混合反应气体在晶片的整个表面上进行均匀的浓度沉积。

公开(公告)号：US08298338B2

公开(公告)日：2012-10-30

申请号：US12259709

申请日：2008-10-28

申请人： Changsung Sean Kim ,  Sang Duk Yoo ,  Jong Pa Hong ,  Ji Hye Shim ,  Won Shin Lee

发明人： Changsung Sean Kim ,  Sang Duk Yoo ,  Jong Pa Hong ,  Ji Hye Shim ,  Won Shin Lee

IPC分类号： C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45508 ,  C23C16/4412 ,  C23C16/45504 ,  C23C16/45574 ,  C23C16/4558 ,  C23C16/45582 ,  C23C16/45591 ,  C23C16/4584

摘要： Provided is a chemical vapor deposition apparatus. The apparatus includes a reaction chamber, a gas introduction unit, and a gas exhaust unit. The reaction chamber includes a susceptor on which a wafer is loaded and a reaction furnace in which the wafer is processed by chemical vapor deposition. The gas introduction unit is disposed at an outer wall of the reaction chamber to supply reaction gas from an outside of the reaction furnace to a center portion of the reaction furnace. The gas exhaust unit is disposed at a center portion of the reaction chamber to discharge the reaction gas to an upper or lower outside of the reaction chamber after the reaction gas is used for a reaction in the reaction furnace. Therefore, the gas density inside the chamber can be kept at a substantially uniform state even when process pressure is increased for growing a high-temperature deposition layer.

摘要翻译： 提供了一种化学气相沉积设备。 该装置包括反应室，气体引入单元和排气单元。 反应室包括其上装载有晶片的基座和通过化学气相沉积处理晶片的反应炉。 气体引入单元设置在反应室的外壁处，以将反应气体从反应炉的外部供应到反应炉的中心部分。 在反应气体用于反应炉中的反应之后，排气单元设置在反应室的中心部分，以将反应气体排出到反应室的上部或下部。 因此，即使当生长高温沉积层的工艺压力增加时，室内的气体密度也可以保持在基本均匀的状态。

公开(公告)号：US08277561B2

公开(公告)日：2012-10-02

申请号：US12257131

申请日：2008-10-23

申请人： Changsung Sean Kim ,  Chang Hwan Choi ,  Jong Pa Hong ,  Joong El Kim

发明人： Changsung Sean Kim ,  Chang Hwan Choi ,  Jong Pa Hong ,  Joong El Kim

IPC分类号： C23C16/455 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45591 ,  C23C16/45508 ,  C23C16/45574 ,  C23C16/45582 ,  C23C16/45585

摘要： There is provided a chemical vapor deposition apparatus improved in structure such that a reaction gas introduced into a reactor where deposition is performed flows at a substantially uniform rate to ensure a thin film is grown substantially uniformly on the deposition object. The chemical vapor deposition apparatus includes: a chamber; a reactor provided in the chamber to have a deposition object deposited therein; and a reservoir storing a reaction gas fed from the outside to introduce the reaction gas to the reactor, the reservoir having a cross-sectional area changing according to a flow path of the introduced reaction gas.

摘要翻译： 提供一种结构改进的化学气相沉积装置，使得引入到进行沉积的反应器中的反应气体以大致均匀的速率流动，以确保薄膜基本上均匀地生长在沉积物体上。 化学气相沉积装置包括：室; 设置在所述室中以使沉积物体沉积在其中的反应器; 以及储存器，储存从外部供给的反应气体，以将反应气体引入反应器，所述储存器具有根据引入的反应气体的流动路径而变化的横截面积。

公开(公告)号：US20090288604A1

公开(公告)日：2009-11-26

申请号：US12177037

申请日：2008-07-21

申请人： Changsung Sean Kim ,  Jong Pa Hong ,  Joong El Ghim

发明人： Changsung Sean Kim ,  Jong Pa Hong ,  Joong El Ghim

IPC分类号： C23C16/455 ,  C23C16/00 ,  C23C16/458

CPC分类号： C23C16/45508 ,  C23C16/45512 ,  C23C16/45589

摘要： Provided is a chemical vapor deposition apparatus including a reaction chamber; a susceptor that is provided in the reaction chamber and has a plurality of wafers mounted thereon; a rotation driving unit that rotates the susceptor; a gas inlet that is provided in the reaction chamber and introduces reaction gas into the reaction chamber from the outside of the reaction chamber; a gas outlet that is provided in the reaction chamber and discharges the reaction gas, of which the reaction is finished, from the inside of the reaction chamber along the rotation-axis direction of the susceptor; and a variable gas-flow adjusting unit that is provided between the gas inlet and the gas outlet and is formed by superimposing a plurality of gas jetting plates having a plurality of holes.

摘要翻译： 提供了一种包括反应室的化学气相沉积设备; 设置在所述反应室中并具有安装在其上的多个晶片的感受体; 旋转所述基座的旋转驱动单元; 设置在反应室中的气体入口，并将反应气体从反应室的外部引入到反应室中; 设置在反应室中的气体出口，其从反应室内部沿着基座的旋转轴方向排出反应结束的反应气体; 以及可变气体流量调节单元，其设置在气体入口和气体出口之间，并且通过叠加多个具有多个孔的气体喷射板而形成。

公开(公告)号：US20120306296A1

公开(公告)日：2012-12-06

申请号：US13232522

申请日：2011-09-14

申请人： Changsung Sean Kim ,  Chang Hwan Choi ,  Han Kyung Bae

发明人： Changsung Sean Kim ,  Chang Hwan Choi ,  Han Kyung Bae

IPC分类号： H02K37/06

CPC分类号： H02K1/2786 ,  H02K19/103 ,  H02K21/38

摘要： Disclosed herein is a switched reluctance motor in which an outer rotor provided with a plurality of salient poles protruded at equidistance along an inner peripheral surface thereof; and a stator provided in the outer rotor, provided with a plurality of stator cores including main salient poles protruded toward the salient poles of the outer rotor and including coils wound therearound and auxiliary salient poles positioned at both sides of the main salient poles, and having phase windings in which the coils are wound around the main salient poles are provided, a magnetic flux is bisected in the main salient pole and flows into the auxiliary salient poles of adjacent phase windings, such that a short magnetic flux route is implemented, thereby making it possible to reduce core loss, and a magnet is also provided, thereby making it possible to improve torque characteristics.

摘要翻译： 这里公开了一种开关磁阻电动机，其中外转子设置有沿其内周面等距地突出的多个凸极; 设置在所述外转子中的定子，所述定子设置有多个定子铁芯，所述多个定子铁芯包括朝向所述外转子的凸极突出的主凸极，并且包括卷绕在其周围的线圈和位于所述主凸极两侧的辅助凸极，并且具有 设置线圈缠绕在主凸极上的相绕组，在主凸极中将磁通二等分，并流入相邻相绕组的辅助凸极，从而实现短磁通路径，从而使 可以减小铁心损耗，并且还提供磁体，从而可以提高转矩特性。

公开(公告)号：US20120058026A1

公开(公告)日：2012-03-08

申请号：US12929170

申请日：2011-01-05

申请人： Suk Ho Song ,  Changsung Sean Kim ,  Sang Jin Kim

发明人： Suk Ho Song ,  Changsung Sean Kim ,  Sang Jin Kim

IPC分类号： B01L3/00 ,  B23P11/00

CPC分类号： B01L3/502715 ,  B01L3/0268 ,  B01L2200/027 ,  B01L2200/10 ,  B01L2400/0439 ,  B01L2400/0442 ,  Y10T137/0402

摘要： There are disclosed a microfluidic ejection device and a method of manufacturing the same. The microfluidic ejection device includes a flow path plate having an inlet into which a microfluid is drawn, a pressure chamber connected with the inlet and having formed therein, a plurality of chamber units divided by a plurality of partitions, and a nozzle connected with the pressure chamber and ejecting the microfluid by integrating the microfluid, having passed through the plurality of chamber units, into a single flow path; and actuators formed on an upper portion of the flow path plate so as to respectively correspond to the plurality of chamber units and providing driving force for ejecting the microfluid from the pressure chamber to the nozzle. The microfluidic ejection device has superior microfluidic ejection performance because variations in pressure within the pressure chamber can be accurately adjusted.

摘要翻译： 公开了一种微流体喷射装置及其制造方法。 微流体喷射装置包括具有引入微流体的入口的流路板，与入口连接并形成在其中的压力室，由多个隔板分隔开的多个室单元和与压力相连的喷嘴 并通过将已经通过多个室单元的微流体积分成单个流路来喷射微流体; 以及形成在流路板的上部上的致动器，以分别对应于多个室单元，并提供用于将微流体从压力室喷射到喷嘴的驱动力。 微流体喷射装置具有优异的微流体喷射性能，因为可以精确地调节压力室内的压力变化。

公开(公告)号：US08689916B2

公开(公告)日：2014-04-08

申请号：US13405802

申请日：2012-02-27

申请人： Changsung Sean Kim ,  Jang Hyeok Won ,  Han Kyung Bae ,  Yong Wan Cho ,  Jin Su Seok

发明人： Changsung Sean Kim ,  Jang Hyeok Won ,  Han Kyung Bae ,  Yong Wan Cho ,  Jin Su Seok

IPC分类号： B60K7/00

CPC分类号： H02K5/20 ,  B60K7/0007 ,  B60K2007/0038 ,  B60K2007/0092 ,  B60L2220/14 ,  B60L2220/44 ,  B60L2220/50 ,  B60Y2300/20 ,  H02K1/2786 ,  H02K7/006 ,  H02K11/33 ,  H02K16/00 ,  Y02T10/641

摘要： An apparatus is provided for driving wheels for an in-wheel system, including: a driving shaft which is the center of rotatable driving; a fixation supporter rotatably supporting the driving shaft and coupled to the driving shaft; an in-wheel motor generating rotational power, which is coupled to the inside of a wheel in which a tire is mounted on one driving shaft in a shaft direction of the fixation supporter; and a balancing member formed on the other driving shaft in the shaft direction of the fixation supporter and formed at a position corresponding to the wheel coupled with the in-wheel motor. According to the present invention, an eccentricity phenomenon which is caused due to inclination of a wheel and a motor in one direction of a fixation supporter can he prevented in an apparatus of driving wheels for an in-wheel system.

摘要翻译： 一种用于车轮系统的驱动轮的装置，包括：作为可旋转驱动的中心的驱动轴; 固定支撑件，其可旋转地支撑所述驱动轴并联接到所述驱动轴; 产生旋转动力的轮内电动机，其联接到轮胎的内侧，轮胎安装在固定支撑件的轴向上的一个驱动轴上; 以及平衡构件，其在固定支撑件的轴向上形成在另一个驱动轴上，并且形成在与与轮内电动机耦合的轮对应的位置。 根据本发明，由于在固定支撑件的一个方向上的轮和电动机的倾斜引起的偏心现象可以在用于轮内系统的驱动轮的装置中被防止。

公开(公告)号：US20120306298A1

公开(公告)日：2012-12-06

申请号：US13340285

申请日：2011-12-29

申请人： Changsung Sean Kim ,  Se Yeun Hwang ,  Chang Hwan Choi ,  Han Kyung Bae ,  Guen Hong Lee

发明人： Changsung Sean Kim ,  Se Yeun Hwang ,  Chang Hwan Choi ,  Han Kyung Bae ,  Guen Hong Lee

IPC分类号： H02K19/10

CPC分类号： H02K1/141 ,  H02K1/146 ,  H02K16/00 ,  H02K16/02 ,  H02K19/103

摘要： Disclosed herein is a switched reluctance motor comprising: an outer rotor provided with a plurality of salient poles protruded at equidistance along an inner peripheral surface thereof; and a stator provided in the outer rotor, including a plurality of stator cores including a pair of stator salient poles protruded toward the salient pole of the outer rotor and a stator yoke connecting and supporting stator salient poles to each other, and having phase windings in which coils are wound around the stator salient poles, wherein a magnetic flux generated by applying a current to the phase winding flows through the pair of stator salient poles and the salient pole of the outer rotor.

摘要翻译： 本发明公开了一种开关磁阻电动机，包括：外转子，其设置有沿其内周面等距离突出的多个凸极; 以及设置在所述外转子中的定子，包括多个定子铁芯，所述多个定子铁芯包括朝向所述外转子的凸极突出的一对定子凸极，以及将定子凸极彼此连接并支撑的定子线圈， 哪些线圈缠绕在定子凸极上，其中通过向相绕组施加电流而产生的磁通流过一对定子凸极和外转子的凸极。