公开(公告)号：US5629918A

公开(公告)日：1997-05-13

申请号：US377018

申请日：1995-01-20

申请人： Chih-Ming Ho ,  Denny K. Miu ,  Jeremy Tzong-Shyng Leu ,  Raanan Miller ,  Amish Desai ,  Chang Liu ,  Tom Tsao ,  Yu-Chong Tai

发明人： Chih-Ming Ho ,  Denny K. Miu ,  Jeremy Tzong-Shyng Leu ,  Raanan Miller ,  Amish Desai ,  Chang Liu ,  Tom Tsao ,  Yu-Chong Tai

IPC分类号： B44C1/22

CPC分类号： H02K99/00

摘要： A surface micromachined micromagnetic actuator is provided with a flap capable of achieving large deflections above 100 microns using magnetic force as the actuating force. The flap is coupled by one or more beams to a substrate and is cantilevered over the substrate. A Permalloy layer or a magnetic coil is disposed on the flap such that when the flap is placed in a magnetic field, it can be caused to selectively interact and rotate out of the plane of the magnetic actuator. The cantilevered flap is released from the underlying substrate by etching out an underlying sacrificial layer disposed between the flap and the substrate. The etched out and now cantilevered flap is magnetically actuated to maintain it out of contact with the substrate while the just etched device is dried in order to obtain high release yields.

摘要翻译： 表面微加工微磁致动器设置有能够使用磁力作为致动力来实现高于100微米的大偏转的挡板。 翼片通过一个或多个梁耦合到基底并且在基底上悬臂。 坡度合金层或磁性线圈设置在翼片上，使得当翼片被放置在磁场中时，可以使其选择性地相互作用并旋转出磁致动器的平面。 通过蚀刻设置在翼片和基底之间的下面的牺牲层，将悬臂翼片从下面的基底释放。 蚀刻出来的和现在的悬臂翼片被磁力驱动，以保持其与基底不接触，同时刚刚蚀刻的装置被干燥以获得高的释放产率。

公开(公告)号：US06639713B2

公开(公告)日：2003-10-28

申请号：US09843024

申请日：2001-04-25

申请人： Chen-Wei Chiu ,  Aramais Avakian ,  Tom Tsao ,  Fukang Jiang ,  Jeff Dickson ,  Yu-Chong Tai

发明人： Chen-Wei Chiu ,  Aramais Avakian ,  Tom Tsao ,  Fukang Jiang ,  Jeff Dickson ,  Yu-Chong Tai

IPC分类号： G02F129

CPC分类号： G02B6/3566 ,  B81B3/0051 ,  B81B2201/031 ,  B81B2201/045 ,  B81B2203/0118 ,  B81B2203/058 ,  B81C1/00214 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/3572 ,  G02B6/3576 ,  G02B6/3584 ,  G02B6/3594

摘要： An apparatus at least partially intercepts a plurality of light beams propagating along a respective plurality of beam paths. The apparatus includes a single crystal silicon substrate and an array including a plurality of modules. Each module includes a reflector comprising single crystal silicon and a reflector surface lying in a reflector plane substantially perpendicular to the substrate surface. Each module further includes a reflector support which mounts the reflector to move substantially within the reflector plane with a displacement component along the surface normal direction of the substrate surface. Each module further includes a reflector driver responsive to electrical current to selectively move the reflector between a first position and a second position.

公开(公告)号：US06709886B2

公开(公告)日：2004-03-23

申请号：US09843025

申请日：2001-04-25

申请人： Chen-Wei Chiu ,  Tom Tsao ,  Fukang Jiang

发明人： Chen-Wei Chiu ,  Tom Tsao ,  Fukang Jiang

IPC分类号： H01L2100

CPC分类号： G02B6/3566 ,  B81B3/0072 ,  B81B2201/042 ,  B81C1/0015 ,  B81C1/00182 ,  G02B6/3512 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/3572 ,  G02B6/3576 ,  G02B6/3584 ,  G02B6/3594 ,  G02B26/0833 ,  G02B26/085 ,  G02B26/0866

摘要： A method for fabricating a module for at least partially intercepting a light beam propagating along a beam path includes providing a single crystal silicon substrate with a first substrate surface and a second substrate surface. The method further includes forming a reflector support layer on the first substrate surface. The method further includes forming a support frame and at least one reflector by etching the substrate from the second substrate surface. The method further includes forming at least one electrical conduit on the reflector support layer. The method further includes forming a reflector support by etching the reflector support layer from the first substrate surface, the reflector support mechanically coupled to the support frame and the reflector, the reflector support movable such that the reflector is movable substantially perpendicularly to the first substrate surface.

摘要翻译： 一种用于制造用于至少部分地截取沿着光束路径传播的光束的模块的方法包括：提供具有第一衬底表面和第二衬底表面的单晶硅衬底。 该方法还包括在第一衬底表面上形成反射器支撑层。 该方法还包括通过从第二衬底表面蚀刻衬底来形成支撑框架和至少一个反射器。 该方法还包括在反射器支撑层上形成至少一个电导管。 该方法还包括通过从第一衬底表面蚀刻反射器支撑层来形成反射器支撑件，反射器支撑件机械地联接到支撑框架和反射器，反射器支撑件可移动，使得反射器可基本上垂直于第一衬底表面移动 。