公开(公告)号：US20130112914A1

公开(公告)日：2013-05-09

申请号：US13617160

申请日：2012-09-14

申请人： Choong-Ho HAN ,  Sang-Kyun KIM ,  Ye-Hwan KIM ,  Joon-Sang PARK ,  Jin-Woo BAE ,  Won-Jun LEE ,  Kyoung-Moon KANG ,  Jae-Dong LEE

发明人： Choong-Ho HAN ,  Sang-Kyun KIM ,  Ye-Hwan KIM ,  Joon-Sang PARK ,  Jin-Woo BAE ,  Won-Jun LEE ,  Kyoung-Moon KANG ,  Jae-Dong LEE

IPC分类号： C09K13/00

CPC分类号： C09K3/1463 ,  C09G1/02 ,  C09K3/1472 ,  H01L27/2436 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/143 ,  H01L45/144 ,  H01L45/148 ,  H01L45/1683

摘要： A slurry composition includes an abrasive agent, an oxidizing agent, and a first adsorption inhibitor including a polyethylene oxide copolymer. A method of manufacturing a phase change memory device may include providing a substrate including an interlayer insulating film having a trench and a phase change material layer on the interlayer insulating film filling the trench, and performing chemical mechanical polishing on the phase change material layer using the slurry composition to form a phase change material pattern layer.

摘要翻译： 浆料组合物包括研磨剂，氧化剂和包含聚环氧乙烷共聚物的第一吸附抑制剂。 制造相变存储器件的方法可以包括在填充沟槽的层间绝缘膜上提供包括具有沟槽和相变材料层的层间绝缘膜的衬底，并且使用相变材料层对相变材料层进行化学机械抛光 浆料组成以形成相变材料图案层。

公开(公告)号：US20080227296A1

公开(公告)日：2008-09-18

申请号：US12128675

申请日：2008-05-29

申请人： Jae-Hyun SO ,  Sung-Taek MOON ,  Dong-Jun LEE ,  Nam-Soo KIM ,  Bong-Su AHN ,  Kyoung-Moon KANG

发明人： Jae-Hyun SO ,  Sung-Taek MOON ,  Dong-Jun LEE ,  Nam-Soo KIM ,  Bong-Su AHN ,  Kyoung-Moon KANG

IPC分类号： C09K13/00 ,  H01L21/461

CPC分类号： H01L21/7684 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/3212

摘要： A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol.

摘要翻译： 浆料组合物包括酸性水溶液和两性表面活性剂和二醇化合物中的一种或两种。 两性表面活性剂的实例包括甜菜碱化合物和氨基酸化合物，氨基酸化合物的实例包括赖氨酸，脯氨酸和精氨酸。 二醇化合物的实例包括二甘醇，乙二醇和聚乙二醇。

公开(公告)号：US20080014838A1

公开(公告)日：2008-01-17

申请号：US11861490

申请日：2007-09-26

申请人： Nam-Soo KIM ,  Sang-Mun CHON ,  Young-Sam LIM ,  Kyoung-Moon KANG ,  Sei-Cheol LEE ,  Jae-Hyun SO ,  Dong-Jun LEE

发明人： Nam-Soo KIM ,  Sang-Mun CHON ,  Young-Sam LIM ,  Kyoung-Moon KANG ,  Sei-Cheol LEE ,  Jae-Hyun SO ,  Dong-Jun LEE

IPC分类号： B24B1/00

CPC分类号： H01L21/31053 ,  C08L101/02 ,  C09G1/02

摘要： An additive composition for a slurry contains a first salt of polymeric acid including a first polymeric acid having a first weight average molecular weight and a first base material, and a second salt of polymeric acid including a second polymeric acid having a second weight average molecular weight and a second base material. A slurry composition is prepared by mixing the additive composition, a polishing particle composition, and water. When implementing a chemical mechanical polishing using the slurry composition, a favorable polishing selectivity is realized.

摘要翻译： 用于浆料的添加剂组合物包含聚合酸的第一盐，其包含具有第一重均分子量和第一基础材料的第一聚合酸和包含第二聚合酸的第二盐，所述第二聚合酸具有第二重均分子量 和第二基材。 通过混合添加剂组合物，抛光颗粒组合物和水来制备浆料组合物。 当使用浆料组合物进行化学机械抛光时，实现了良好的抛光选择性。

公开(公告)号：US20080081542A1

公开(公告)日：2008-04-03

申请号：US11853735

申请日：2007-09-11

申请人： Gi-Sik HONG ,  Dong-Jun LEE ,  Nam-Soo KIM ,  Kyoung-Moon KANG

发明人： Gi-Sik HONG ,  Dong-Jun LEE ,  Nam-Soo KIM ,  Kyoung-Moon KANG

IPC分类号： B24B29/02 ,  B24D3/04

CPC分类号： C09K3/1463 ,  C09G1/02 ,  C09K3/1436 ,  H01L21/31053

摘要： In a slurry composition and a method of polishing a layer using the slurry composition, the slurry composition includes from about 3 to 20 percent by weight of an abrasive, from about 0.1 to 3 percent by weight of an ionic surfactant, from about 0.01 to 0.1 percent by weight of a nonionic surfactant, from about 0.01 to 1 percent by weight of a polish accelerating agent including an amino acid compound, and a remainder of an aqueous solution including a basic pH-controlling agent and water. The slurry composition including the nonionic surfactant and the polish accelerating agent may be used for speedily polishing a stepped upper portion of a silicon oxide layer, and may also enable a lower portion of the silicon oxide layer to function as a polish stop layer.

摘要翻译： 在浆料组合物和使用浆料组合物抛光层的方法中，浆料组合物包括约3-20重量％的研磨剂，约0.1-3重量％的离子表面活性剂，约0.01至0.1重量％ 重量百分比的非离子表面活性剂，约0.01至1％重量的包含氨基酸化合物的抛光促进剂，以及剩余的包含碱性pH控制剂和水的水溶液。 包括非离子表面活性剂和抛光促进剂的浆料组合物可以用于快速抛光氧化硅层的阶梯状上部，并且还可以使氧化硅层的下部用作抛光停止层。

公开(公告)号：US20070167117A1

公开(公告)日：2007-07-19

申请号：US11466425

申请日：2006-08-22

申请人： Sung-Taek MOON ,  Dong-Jun LEE ,  Kyoung-Moon KANG ,  Nam-Soo KIM ,  Bong-Su AHN

发明人： Sung-Taek MOON ,  Dong-Jun LEE ,  Kyoung-Moon KANG ,  Nam-Soo KIM ,  Bong-Su AHN

IPC分类号： B24B7/00 ,  B24B29/00 ,  B24B21/18

CPC分类号： B24B53/017 ,  B24B53/14

摘要： The present invention relates to a conditioner device for polishing pad and a chemical mechanical polishing (CMP) apparatus having the same. The conditioner device of the present invention comprises a rotable support plate including a support plate surface comprising a center area located about the rotational axis of the support plate, a mid area surrounding the center area, and a peripheral area surrounding the mid area, a plurality of conditioning zones located within a portion of the mid area of the support plate surface. A plurality of hard particles which are densely arranged within the conditioning zones and are attached to the support plate surface. A plurality of passages defined by the conditioning zones within which a slurry flows, the passages occupying a portion of the mid area which is not occupied by the conditioning zones, the center area and the peripheral area.

摘要翻译： 本发明涉及一种用于抛光垫的调节装置和具有该抛光垫的化学机械抛光（CMP）装置。 本发明的调节装置包括可旋转支撑板，其包括支撑板表面，该支撑板表面包括围绕支撑板的旋转轴线的中心区域，围绕中心区域的中间区域和围绕中间区域的周边区域，多个 位于支撑板表面的中部区域的一部分内的调理区。 多个坚硬颗粒密集地布置在调理区内并附着在支撑板表面上。 由浆料流过的调节区限定的多个通道，通道占据中部区域的未被调节区域，中心区域和周边区域占据的部分。