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    Fabricating perpendicular write elements in perpendicular magnetic recording heads
    7.
    发明授权
    Fabricating perpendicular write elements in perpendicular magnetic recording heads 失效
    在垂直磁记录头中制造垂直写入元件

    公开(公告)号：US07648731B2

    公开(公告)日：2010-01-19

    申请号：US11380154

    申请日：2006-04-25

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    IPC分类号： B05D5/12

    CPC分类号： G11B5/1278 ,  G11B5/3163

    摘要： Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.

    摘要翻译： 讨论了制造垂直磁记录头垂直写入元件的方法。 在写入元件制造中，根据许多期望的方法之一制造写入极。 制造期间的写入极通常被硬掩模和光刻软掩模覆盖。 根据本文描述的方法，例如通过化学蚀刻去除软掩模。 然后去除硬掩模，例如通过CMP和离子蚀刻，以暴露写入极。 然后可以将屏蔽间隙材料沉积在写入极上以限定写入极和后部屏蔽之间的屏蔽间隙。 然后可以将后挡板材料沉积在屏蔽间隙材料上以形成对应于写入极的后挡板。

    FABRICATING PERPENDICULAR WRITE ELEMENTS IN PERPENDICULAR MAGNETIC RECORDING HEADS
    8.
    发明申请
    FABRICATING PERPENDICULAR WRITE ELEMENTS IN PERPENDICULAR MAGNETIC RECORDING HEADS 失效
    在完整的磁记录头中制作完整的写入元素

    公开(公告)号：US20080145524A1

    公开(公告)日：2008-06-19

    申请号：US11380154

    申请日：2006-04-25

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    IPC分类号： B05D5/12

    CPC分类号： G11B5/1278 ,  G11B5/3163

    摘要： Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.

    摘要翻译： 讨论了制造垂直磁记录头垂直写入元件的方法。 在写入元件制造中，根据许多期望的方法之一制造写入极。 制造期间的写入极通常被硬掩模和光刻软掩模覆盖。 根据本文描述的方法，例如通过化学蚀刻去除软掩模。 然后去除硬掩模，例如通过CMP和离子蚀刻，以暴露写入极。 然后可以将屏蔽间隙材料沉积在写入极上以限定写入极和后部屏蔽之间的屏蔽间隙。 然后可以将后挡板材料沉积在屏蔽间隙材料上以形成对应于写入极的后挡板。

    Process for self-aligned flare point and shield throat definition prior to main pole patterning
    10.
    发明授权
    Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
    在主极图案化之前，自对准耀斑和屏蔽喉定义的过程

    公开(公告)号：US07881010B2

    公开(公告)日：2011-02-01

    申请号：US11956277

    申请日：2007-12-13

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/187

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

    摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。