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公开(公告)号：US20070038972A1
公开(公告)日：2007-02-15
申请号：US11200256
申请日：2005-08-09
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： The invention relates to a method for optimizing a mask layout pattern comprising at least one structural feature. First a desired layout pattern is provided. Based on the desired layout pattern, an optimized reference diffraction coefficient is provided. After selecting an initial mask geometry having polygon-shaped structures, initial diffraction coefficients are calculated. A difference based on the reference diffraction coefficient and initial diffraction coefficients is used to optimize the initial geometry in order to provide a mask layout pattern.
摘要翻译： 本发明涉及一种用于优化包括至少一个结构特征的掩模布局图案的方法。 首先提供所需的布局图案。 基于期望的布局图案，提供优化的参考衍射系数。 在选择具有多边形结构的初始掩模几何形状之后，计算初始衍射系数。 使用基于参考衍射系数和初始衍射系数的差异来优化初始几何以提供掩模布局图案。
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公开(公告)号：US07370313B2
公开(公告)日：2008-05-06
申请号：US11200256
申请日：2005-08-09
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： The invention relates to a method for optimizing a mask layout pattern comprising at least one structural feature. First a desired layout pattern is provided. Based on the desired layout pattern, an optimized reference diffraction coefficient is provided. After selecting an initial mask geometry having polygon-shaped structures, initial diffraction coefficients are calculated. A difference based on the reference diffraction coefficient and initial diffraction coefficients is used to optimize the initial geometry in order to provide a mask layout pattern.
摘要翻译： 本发明涉及一种用于优化包括至少一个结构特征的掩模布局图案的方法。 首先提供所需的布局图案。 基于期望的布局图案，提供优化的参考衍射系数。 在选择具有多边形结构的初始掩模几何形状之后，计算初始衍射系数。 使用基于参考衍射系数和初始衍射系数的差异来优化初始几何以提供掩模布局图案。
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公开(公告)号：US20100266939A1
公开(公告)日：2010-10-21
申请号：US12761876
申请日：2010-04-16
申请人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
发明人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
IPC分类号： G03F1/00
摘要： A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.
摘要翻译： 平版印刷掩模包括包括凹槽的第一层，包含区域的第二层和包围区段的凹槽状结构。 形成第一层和第二层以便减小第二层内的电位差。 形成光刻掩模的方法包括形成第一层和第二层以将第二层设置在第一层上，将第二层图案化以包括封闭这些区段的区段，区域和沟槽状结构，以及在第一层中形成凹槽 层在未被第二层覆盖的部分。 形成第一层和第二层，以在形成第一层中的槽的步骤期间减小第二层内的电位差。
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公开(公告)号：US08293431B2
公开(公告)日：2012-10-23
申请号：US12761876
申请日：2010-04-16
申请人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
发明人： Haiko Rolff , Carla Byloos , Christoph Noelscher , Nicolo Morgana , Roderick Koehle , Molela Moukara , Ralf Neubauer , Rainer Pforr , Dominique Savignac
IPC分类号： G03F1/40
摘要： A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.
摘要翻译： 平版印刷掩模包括包括凹槽的第一层，包含区域的第二层和包围区段的凹槽状结构。 形成第一层和第二层以便减小第二层内的电位差。 形成光刻掩模的方法包括形成第一层和第二层以将第二层设置在第一层上，将第二层图案化以包括封闭这些区段的区段，区域和沟槽状结构，以及在第一层中形成凹槽 层在未被第二层覆盖的部分。 形成第一层和第二层，以在形成第一层中的槽的步骤期间减小第二层内的电位差。
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公开(公告)号：US08715909B2
公开(公告)日：2014-05-06
申请号：US11868374
申请日：2007-10-05
IPC分类号： G03F7/20
CPC分类号： G03F7/70466 , G03F1/26 , G03F1/70 , G03F7/70208 , G03F7/70283
摘要： Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or pattern orientation dependent process window optimization employing one mask with polarization rotating film on the backside.
摘要翻译： 公开了多光束光刻系统和使用其的制造半导体器件的方法。 例如，该方法利用玻璃上镀铬的电场边界的不重合或分布在两个掩模上的相移掩模特征，用于优化光刻工艺窗口，旁瓣抑制或使用一个掩模的图案取向依赖的工艺窗口优化 背面有偏振旋转胶片。
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6.发明授权Optical information recording medium, optical information recording apparatus and method 失效光信息记录介质，光信息记录装置和方法公开(公告)号：US07319656B2
公开(公告)日：2008-01-15
申请号：US10810654
申请日：2004-03-29
IPC分类号： G11B7/00
CPC分类号： G11B7/00456 , G11B5/00 , G11B5/004 , G11B5/5526 , G11B7/0045 , G11B7/1267 , G11B7/24 , G11B7/24094 , G11B7/26 , G11B7/261 , G11B7/28 , G11B23/40
摘要： The present invention is applicable to a recording apparatus of a CD or DVD, a recording method thereof and a recording medium, and an object of the present invention is to clearly record a second information such as characters and figures between two recording levels in an optical disk. The second information is recorded in a predetermined area in a radius direction and a angular direction on the optical information recording medium, and further, the second information is recorded according to a change of a pit width based on a change of power of the laser beam, a change of a pit length based on an on/off control of the laser beam, or a change of depression or bulge of the pit based on a change in the vicinity of the on/off control of the laser beam. Whereby it is possible to record the second information such as a watermark pattern or a visible image, which is capable of being confirmed by seeing a disk.
摘要翻译： 本发明可应用于CD或DVD的记录装置，其记录方法和记录介质，并且本发明的目的是在光学中清楚地记录两个记录水平之间的字符和数字的第二信息 磁盘。 第二信息被记录在光信息记录介质上的半径方向和角度方向上的预定区域中，此外，根据基于激光束的功率变化的凹坑宽度的变化来记录第二信息 基于激光束的开/关控制的凹坑长度的变化，或者基于激光束的开/关控制附近的变化来改变凹坑的凹陷或凸起。 由此可以记录能够通过观看盘来确认的水印图案或可见图像的第二信息。
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7.发明申请OPTICAL INFORMATION RECORDING MEDIUM, OPTICAL INFORMATION RECORDING APPARATUS AND METHOD 失效光信息记录介质，光信息记录装置和方法公开(公告)号：US20070153666A1
公开(公告)日：2007-07-05
申请号：US11685657
申请日：2007-03-13
IPC分类号： G11B7/00
CPC分类号： G11B7/00456 , G11B5/00 , G11B5/004 , G11B5/5526 , G11B7/0045 , G11B7/1267 , G11B7/24 , G11B7/24094 , G11B7/26 , G11B7/261 , G11B7/28 , G11B23/40
摘要： The present invention is applicable to a recording apparatus of a CD or DVD, a recording method thereof and a recording medium, and an object of the present invention is to clearly record a second information such as characters and figures between two recording levels in an optical disk. The second information is recorded in a predetermined area in a radius direction and a angular direction on the optical information recording medium, and further, the second information is recorded according to a change of a pit width based on a change of power of the laser beam, a change of a pit length based on an on/off control of the laser beam, or a change of depression or bulge of the pit based on a change in the vicinity of the on/off control of the laser beam. Whereby it is possible to record the second information such as a watermark pattern or a visible image, which is capable of being confirmed by seeing a disk.
摘要翻译： 本发明可应用于CD或DVD的记录装置，其记录方法和记录介质，并且本发明的目的是在光学中清楚地记录两个记录水平之间的字符和数字的第二信息 磁盘。 第二信息被记录在光信息记录介质上的半径方向和角度方向上的预定区域中，此外，根据基于激光束的功率变化的凹坑宽度的变化来记录第二信息 基于激光束的开/关控制的凹坑长度的变化，或者基于激光束的开/关控制附近的变化来改变凹坑的凹陷或凸起。 由此可以记录能够通过观看盘来确认的水印图案或可见图像的第二信息。
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公开(公告)号：US07424144B2
公开(公告)日：2008-09-09
申请号：US10894640
申请日：2004-07-20
申请人： Roderick Koehle , Martin Verbeek
发明人： Roderick Koehle , Martin Verbeek
CPC分类号： G03F1/84 , Y10S977/84
摘要： The invention, which relates to a method for checking periodic structures on lithography masks, in which an image of the structure of the lithography mask is generated by an imaging optic of a microscope, provides a method for inspecting structures on lithography masks which is used to represent deviations in the periodic structure of a lithography mask, a better demarcation of the periodic structure from a deviation being achieved. The parameters of wavelength λ, the numerical aperture NA and the coherence of the illumination σ of the imaging optic of the microscope are chosen such that the inequality P ≤ λ NA ( 1 + σ ) describing the resolution limit for a periodic structure having the period P is fulfilled, and in that the image of the structure that is generated in this way is evaluated for deviations in the periodic structure.
摘要翻译： 本发明涉及一种用于检查光刻掩模上的周期性结构的方法，其中通过显微镜的成像光学器件产生光刻掩模的结构的图像，提供了一种用于检查光刻掩模上的结构的方法，其用于 表示光刻掩模的周期性结构中的偏差，周期性结构与实现偏差的更好的分界。 选择波长λ的参数，数值孔径NA和显微镜成像光学器件的照明西格玛的相干性，使得不等式
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公开(公告)号：US20050048379A1
公开(公告)日：2005-03-03
申请号：US10894640
申请日：2004-07-20
申请人： Roderick Koehle , Martin Verbeek
发明人： Roderick Koehle , Martin Verbeek
CPC分类号： G03F1/84 , Y10S977/84
摘要： The invention, which relates to a method for checking periodic structures on lithography masks, in which an image of the structure of the lithography mask is generated by an imaging optic of a microscope, provides a method for inspecting structures on lithography masks which is used to represent deviations in the periodic structure of a lithography mask, a better demarcation of the periodic structure from a deviation being achieved. The parameters of wavelength λ, the numerical aperture NA and the coherence of the illumination σ of the imaging optic of the microscope are chosen such that the inequality P≦λ/NA(1+σ) describing the resolution limit for a periodic structure having the period P is fulfilled, and in that the image of the structure that is generated in this way is evaluated for deviations in the periodic structure.
摘要翻译： 本发明涉及一种用于检查光刻掩模上的周期性结构的方法，其中通过显微镜的成像光学器件产生光刻掩模的结构的图像，提供了一种用于检查光刻掩模上的结构的方法，其用于 表示光刻掩模的周期性结构中的偏差，周期性结构与实现偏差的更好的分界。 选择波长λ的参数，数值孔径NA和显微镜成像光学器件的照明西格玛的相干性，使得描述具有周期性结构的分辨率极限的不等式P <=λ/ NA（1 + sigma）具有 满足周期P，并且以这种方式生成的结构的图像被评估周期性结构中的偏差。
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10.发明授权公开(公告)号：US06259666B1
公开(公告)日：2001-07-10
申请号：US09211826
申请日：1998-12-15
申请人： Seiji Kobayashi , Roderick Koehle
发明人： Seiji Kobayashi , Roderick Koehle
IPC分类号： G11B700
CPC分类号： G11B7/0045 , G11B7/26 , G11B23/40
摘要： An optical information recording apparatus, an optical information recording method and an optical information recording medium according to the present invention enable second information such as character information, graphic information and the like to be recorded on a disk as a large laser output difference, thereby making it possible to record the second information clearly. The optical information recording apparatus comprises a modulation signal generating device (modulating circuit 4) for generating a modulation signal SB which changes in response to first information SA, a time change signal generating device (staircase generating circuit 7) for generating a time change signal SF which changes in accordance with second information SE, a light amount changing device (optical modulator 10A) for changing a light amount of laser beam in accordance with the time change signal SF and an optical modulation device (optical modulator 10B) for turning on and off a laser beam L1 obtained from the light amount changing device 10A in accordance with the modulation signal SB and wherein the light amount of laser beam is changed slowly by the second information SE.
摘要翻译： 根据本发明的光学信息记录装置，光学信息记录方法和光学信息记录介质使诸如字符信息，图形信息等的第二信息能够被记录在盘上作为大的激光输出差异，从而使 可以清楚地记录第二个信息。 光信息记录装置包括用于产生响应于第一信息SA而改变的调制信号SB的调制信号发生装置（调制电路4），用于产生时变信号SF的时变信号发生装置（阶梯产生电路7） 其根据第二信息SE变化，用于根据时变信号SF改变激光束的光量的光量改变装置（光调制器10A）和用于打开和关闭的光调制装置（光调制器10B） 根据调制信号SB从光量变换装置10A获得的激光束L1，其中激光束的光量由第二信息SE缓慢变化。
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