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公开(公告)号：US20130244179A1
公开(公告)日：2013-09-19
申请号：US13820608
申请日：2011-11-29
IPC分类号： C08F234/02 , B29C41/22
CPC分类号： B29C41/22 , C08F234/02 , C08G61/12 , C08G2261/46 , G03F7/0037 , G03F7/038 , G03F7/38
摘要： The invention includes a novel light-activated polymerizable composition, wherein reversible crosslinks may be converted into irreversible crosslinks using a fully controllable physical and/or chemical process. The invention further includes methods of photofixing a light sensitive material or patterning an article comprising a light sensitive material.
摘要翻译： 本发明包括一种新的光活化可聚合组合物，其中可逆的交联可以使用完全可控的物理和/或化学方法转化为不可逆的交联。 本发明还包括对感光材料进行光固化或图案化包含感光材料的制品的方法。
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公开(公告)号：US09012127B2
公开(公告)日：2015-04-21
申请号：US13820608
申请日：2011-11-29
CPC分类号： B29C41/22 , C08F234/02 , C08G61/12 , C08G2261/46 , G03F7/0037 , G03F7/038 , G03F7/38
摘要： The invention includes a novel light-activated polymerizable composition, wherein reversible crosslinks may be converted into irreversible crosslinks using a fully controllable physical and/or chemical process. The invention further includes methods of photofixing a light sensitive material or patterning an article comprising a light sensitive material.
摘要翻译： 本发明包括一种新的光活化可聚合组合物，其中可逆的交联可以使用完全可控的物理和/或化学方法转化为不可逆的交联。 本发明还包括对感光材料进行光固化或图案化包含感光材料的制品的方法。
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公开(公告)号：US20130323642A1
公开(公告)日：2013-12-05
申请号：US13990218
申请日：2011-11-28
IPC分类号： G03F7/008 , C07D249/04 , G03F7/20
CPC分类号： G03F7/0085 , C07D249/04 , G03F7/20
摘要： The present invention includes a composition comprising an alkyne-based substrate, an azide-based substrate, a Cu(II) salt and a photoinducible reducing agent. The present invention further includes a method of immobilizing a chemical structure in a given pattern onto a section of the surface of a solid substrate, using the photoinducible Cu(I)-catalyzed azide-alkyne cycloaddition Click reaction.
摘要翻译： 本发明包括一种包含炔基基底，叠氮化物基底，Cu（II）盐和光诱导还原剂的组合物。 本发明还包括使用光诱导性Cu（I）催化的叠氮化物 - 炔炔环加成Click反应将给定图案中的化学结构固定在固体基底表面的一部分上的方法。
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公开(公告)号：US09176380B2
公开(公告)日：2015-11-03
申请号：US13990218
申请日：2011-11-28
IPC分类号： C07D249/04 , G03F7/20 , G03F7/008
CPC分类号： G03F7/0085 , C07D249/04 , G03F7/20
摘要： The present invention includes a composition comprising an alkyne-based substrate, an azide-based substrate, a Cu(II) salt and a photoinducible reducing agent. The present invention further includes a method of immobilizing a chemical structure in a given pattern onto a section of the surface of a solid substrate, using the photoinducible Cu(I)-catalyzed azide-alkyne cycloaddition Click reaction.
摘要翻译： 本发明包括一种包含炔基基底，叠氮化物基底，Cu（II）盐和光诱导还原剂的组合物。 本发明还包括使用光诱导性Cu（I）催化的叠氮化物 - 炔炔环加成Click反应将给定图案中的化学结构固定在固体基底表面的一部分上的方法。
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公开(公告)号：US20190169340A1
公开(公告)日：2019-06-06
申请号：US16326036
申请日：2017-08-17
申请人： Melissa B. Gordon , Christopher J. Kloxin , Norman J. Wagner , Thomas H. Epps, III , Grant Alexander Knappe , Shu Wang
发明人： Melissa B. Gordon , Christopher J. Kloxin , Norman J. Wagner , Thomas H. Epps, III , Grant Alexander Knappe , Shu Wang
IPC分类号： C08F220/18 , C08F2/38 , C08K5/22 , C08K5/3437 , B29C73/18
摘要： The present disclosure is directed to stress-responsive compositions comprising (1) at least one (co)polymer comprising at least one mechanophore comprising at least one thiocarbonylthio functional group or derivative thereof and (2) at least one compound comprising at least one functional group capable of reacting with a free radical, The present disclosure is also directed to articles, coatings, and 3D printing binders comprising such stress-responsive compositions, as well as to processes of imparting the abilities of forming and maintaining protective barriers and mechanical self-healing to such articles, coatings, and 3D printing binders by incorporating such stress-responsive compositions therein.
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6.发明申请DISULFIDE MONOMERS COMPRISING ETHYLENICALLY UNSATURATED NORBORNYL GROUPS SUITABLE FOR DENTAL COMPOSITIONS 有权包含适用于牙齿组合物的乙烯不饱和诺氟涅尔组的不饱和单体公开(公告)号：US20120295227A1
公开(公告)日：2012-11-22
申请号：US13110898
申请日：2011-05-18
申请人： Christopher N. Bowman , Hee Young Park , Christopher J. Kloxin , Ahmed S. Abuelyaman , Joel D. Oxman , Yizhong Wang
发明人： Christopher N. Bowman , Hee Young Park , Christopher J. Kloxin , Ahmed S. Abuelyaman , Joel D. Oxman , Yizhong Wang
IPC分类号： A61C5/00 , C07C321/20 , A61K6/083 , C08F2/46 , C08F236/20 , C08F228/04
CPC分类号： C08F2/50 , A61K6/083 , C07C321/20 , C07C2602/42 , C08F232/08 , C08L33/06
摘要： Dental compositions and disulfide monomers described. The disulfide monomer comprises a disulfide backbone group wherein each of the sulfur atoms are bonded to a group terminating with an ethylenically unsaturated norbornyl group; and at least one other monomer comprising at least two ethylenically unsaturated groups.
摘要翻译： 描述牙科组合物和二硫单体。 二硫化物单体包含二硫主链基团，其中每个硫原子与以乙烯不饱和降冰片基为终止的基团结合; 和至少一种包含至少两个烯属不饱和基团的其它单体。
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公开(公告)号：US10968301B2
公开(公告)日：2021-04-06
申请号：US16326036
申请日：2017-08-17
申请人： Melissa B. Gordon , Christopher J. Kloxin , Norman J. Wagner , Thomas H. Epps, III , Grant Alexander Knappe , Shu Wang
发明人： Melissa B. Gordon , Christopher J. Kloxin , Norman J. Wagner , Thomas H. Epps, III , Grant Alexander Knappe , Shu Wang
IPC分类号： C08F220/18 , C08F2/38 , C08K5/22 , C08K5/3437 , B33Y10/00 , B33Y70/00 , B29C73/18
摘要： The present disclosure is directed to stress-responsive compositions comprising (1) at least one (co)polymer comprising at least one mechanophore comprising at least one thiocarbonylthio functional group or derivative thereof and (2) at least one compound comprising at least one functional group capable of reacting with a free radical, The present disclosure is also directed to articles, coatings, and 3D printing binders comprising such stress-responsive compositions, as well as to processes of imparting the abilities of forming and maintaining protective barriers and mechanical self-healing to such articles, coatings, and 3D printing binders by incorporating such stress-responsive compositions therein.
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8.发明授权Disulfide monomers comprising ethylenically unsaturated groups suitable for dental compositions 有权包含适用于牙齿组合物的烯属不饱和基团的二硫化物单体公开(公告)号：US08455565B2
公开(公告)日：2013-06-04
申请号：US13110900
申请日：2011-05-18
申请人： Ahmed S. Abuelyaman , Joel D. Oxman , Yizhong Wang , Christopher N. Bowman , Hee Young Park , Christopher J. Kloxin
发明人： Ahmed S. Abuelyaman , Joel D. Oxman , Yizhong Wang , Christopher N. Bowman , Hee Young Park , Christopher J. Kloxin
IPC分类号： A61K6/00 , A61K6/08 , A61K6/083 , C08F28/04 , C07C321/18
CPC分类号： C07C323/12 , A61K6/083 , C08L33/06
摘要： Dental compositions and disulfide monomers are described. The disulfide monomer comprise a disulfide backbone group wherein each of the sulfur atoms are bonded to an ethylenically unsaturated group via a divalent linking group and the linking group comprises at least one heteroatom; and at least one other monomer ethylenically unsaturated monomer.
摘要翻译： 描述了牙科组合物和二硫化物单体。 二硫化物单体包含二硫主链基团，其中每个硫原子通过二价连接基团与烯属不饱和基团键合，并且连接基团包含至少一个杂原子; 和至少一种其它单体烯属不饱和单体。
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9.发明授权Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates 失效光敏聚合物组合物和含有光敏聚酰胺和丙烯酸酯混合物的元素
公开(公告)号：US5925498A
公开(公告)日：1999-07-20
申请号：US876525
申请日：1997-06-16
CPC分类号： G03F7/037
摘要： A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a mixture of a polyalkyleneglycol diacrylate and polyacrylate polymerizable monomers, a photocrosslinkable polyester, a photoinitiator, and a photosensitizer. The photosensitive resins are present at a total weight ratio to the polymerizable monomers of at least 1.5:1.
摘要翻译： 光敏组合物可用于制备负性感光元件如平版印刷版。 该组合物包括具有光可交联基团和数均分子量至少约1500的第一可光致交联芳族树脂。还包括聚亚烷基二醇二丙烯酸酯和聚丙烯酸酯可聚合单体，光可交联聚酯，光引发剂和光敏剂的混合物。 感光性树脂与聚合性单体的总重量比为至少1.5:1。
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10.发明授权Disulfide monomers comprising ethylenically unsaturated norbornyl groups suitable for dental compositions 有权包含适用于牙齿组合物的烯属不饱和降冰片基的二硫化物单体公开(公告)号：US08431626B2
公开(公告)日：2013-04-30
申请号：US13110898
申请日：2011-05-18
申请人： Christopher N. Bowman , Hee Young Park , Christopher J. Kloxin , Ahmed S. Abuelyaman , Joel D. Oxman , Yizhong Wang
发明人： Christopher N. Bowman , Hee Young Park , Christopher J. Kloxin , Ahmed S. Abuelyaman , Joel D. Oxman , Yizhong Wang
IPC分类号： A61K6/083 , C07C321/20 , C07C321/16 , C08F232/06 , C08F236/20
CPC分类号： C08F2/50 , A61K6/083 , C07C321/20 , C07C2602/42 , C08F232/08 , C08L33/06
摘要： Dental compositions and disulfide monomers described. The disulfide monomer comprises a disulfide backbone group wherein each of the sulfur atoms are bonded to a group terminating with an ethylenically unsaturated norbornyl group; and at least one other monomer comprising at least two ethylenically unsaturated groups.
摘要翻译： 描述牙科组合物和二硫单体。 二硫化物单体包含二硫主链基团，其中每个硫原子与以乙烯不饱和降冰片基为终止的基团结合; 和至少一种包含至少两个烯属不饱和基团的其它单体。
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