摘要:
A stepper motor device uses compensating non-sinusoidal driving values to compensate for operational non-sinusoidal drive characteristics of a motor of the device due to at least design and manufacturing imperfections in the motor. The compensating non-sinusoidal driving values may be derived using back electromagnetic force produced from the motor or using measured rotational positions of the motor when the motor is driven using known driving values.
摘要:
A stepper motor device uses compensating non-sinusoidal driving values to compensate for operational non-sinusoidal drive characteristics of a motor of the device due to at least design and manufacturing imperfections in the motor. The compensating non-sinusoidal driving values may be derived using back electromagnetic force produced from the motor or using measured rotational positions of the motor when the motor is driven using known driving values.
摘要:
A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.
摘要:
An integrated motor device with driver circuitry and method of setting and reading configuration parameters of the driver circuitry uses configuration data embedded in driver control signals to set at least one configuration parameter of the driver circuitry.
摘要:
An apparatus and method for processing substrates uses one or more vacuum transfer chamber units to transfer some of the substrates between at least one load lock chamber unit and at least one vacuum process chamber unit.
摘要:
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.
摘要:
A multi-camera system and method of calibrating the multi-camera system uses at least one timer to synchronize cameras of the multi-camera system with respect to time. The cameras are used to capture images of the at least one timer. The images are then analyzed to adjust an image-capture timing parameter of at least one of the cameras to time synchronize the cameras.
摘要:
A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.
摘要:
An optical encoder and method for measuring displacement information uses an encoder member that includes multiple optical tracks of diffractive optical regions having different periodicities with respect to consecutive identical diffractive optical regions to produce diffracted beams of light from at least one beam of light emitted from a light source. The diffracted beams of light are received at photodetectors, which produce electrical signals in response to the received beams of light. The electrical signals are related to the displacement information being measured.
摘要:
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises zirconia toughened ceramic material as an outermost surface of the component. The component can be made entirely of the ceramic material or the ceramic material can be provided as a coating on a substrate such as aluminum or aluminum alloy, stainless steel, or refractory metal. The zirconia toughened ceramic can be tetragonal zirconia polycrystalline (TZP) material, partially-stabilized zirconia (PSZ), or a zirconia dispersion toughened ceramic (ZTC) such as zirconia-toughened alumina (tetragonal zirconia particles dispersed in Al2O3). In the case of a ceramic zirconia toughened coating, one or more intermediate layers may be provided between the component and the ceramic coating. To promote adhesion of the ceramic coating, the component surface or the intermediate layer surface may be subjected to a surface roughening treatment prior to depositing the ceramic coating.
摘要翻译:诸如等离子体室的半导体加工设备的耐腐蚀部件包括作为部件的最外表面的氧化锆增韧陶瓷材料。 该组件可以完全由陶瓷材料制成,或者陶瓷材料可以作为涂层提供在诸如铝或铝合金,不锈钢或难熔金属的基底上。 氧化锆增韧陶瓷可以是四方晶氧化锆多晶(TZP)材料,部分稳定的氧化锆(PSZ)或氧化锆分散体增韧陶瓷(ZTC),如氧化锆增韧的氧化铝(分散在Al 2+中的四方晶氧化锆颗粒) SUB> O 3 3)。 在陶瓷氧化锆增韧涂层的情况下,可以在组件和陶瓷涂层之间提供一个或多个中间层。 为了促进陶瓷涂层的粘合,可以在沉积陶瓷涂层之前对组分表面或中间层表面进行表面粗糙化处理。