Wafer bonding method
    1.
    发明申请
    Wafer bonding method 有权
    晶圆接合法

    公开(公告)号:US20070148911A1

    公开(公告)日:2007-06-28

    申请号:US11432632

    申请日:2006-05-12

    IPC分类号: H01L21/30

    CPC分类号: H01L21/187 H01L33/0079

    摘要: A wafer bonding method, comprising steps of: coating a medium layer respectively on the surfaces of two wafers; removing impurities formed on the surface of each medium layer; laminating the two wafers while enabling the surface coated with the medium layer of one of the two wafers to face the surface coated with the medium layer of another wafer; and applying an ultra-sonic oscillation and a bonding pressure upon the laminated wafers for bonding the two wafers.

    摘要翻译: 一种晶片接合方法,包括以下步骤:分别在两个晶片的表面上涂覆介质层; 去除形成在每个介质层表面上的杂质; 层压两个晶片同时使得涂覆有两个晶片之一的介质层的表面面对涂覆有另一晶片的介质层的表面; 以及在层叠的晶片上施加超声波振荡和接合压力以接合两个晶片。

    Wafer bonding method
    2.
    发明授权
    Wafer bonding method 有权
    晶圆接合法

    公开(公告)号:US07371661B2

    公开(公告)日:2008-05-13

    申请号:US11432632

    申请日:2006-05-12

    IPC分类号: H01L21/30

    CPC分类号: H01L21/187 H01L33/0079

    摘要: A wafer bonding method, comprising steps of: coating a medium layer respectively on the surfaces of two wafers; removing impurities formed on the surface of each medium layer; laminating the two wafers while enabling the surface coated with the medium layer of one of the two wafers to face the surface coated with the medium layer of another wafer; and applying an ultra-sonic oscillation and a bonding pressure upon the laminated wafers for bonding the two wafers.

    摘要翻译: 一种晶片接合方法,包括以下步骤:分别在两个晶片的表面上涂覆介质层; 去除形成在每个介质层表面上的杂质; 层压两个晶片同时使得涂覆有两个晶片之一的介质层的表面面对涂覆有另一晶片的介质层的表面; 以及在层叠的晶片上施加超声波振荡和接合压力以接合两个晶片。

    Method and apparatus for inspecting radio frequency identification tags
    3.
    发明授权
    Method and apparatus for inspecting radio frequency identification tags 有权
    用于检查射频识别标签的方法和装置

    公开(公告)号:US07973646B2

    公开(公告)日:2011-07-05

    申请号:US11944596

    申请日:2007-11-23

    IPC分类号: H04Q5/22

    摘要: A method and an apparatus for inspecting radio frequency identification (RFID) tags which utilize a way of shielding for inspecting whether RFID tags function properly or not. The method of the present invention comprises steps of: reading a plurality of RFID tags in a readable zone; and determining whether there is any malfunctional RFID tag in the plurality of RFID tags. If all the plurality of RFID tags function properly, the method will check a next plurality of RFID tags. If there is at least one unreadable RFID tag, the at least one malfunctional RFID tag will be found by shielding one or the plurality of RFID tags. By means of the disclosure in the present invention, the present method and apparatus are capable of improving the efficiency during inspection and simplifying the design of a readable zone.

    摘要翻译: 一种用于检查射频识别(RFID)标签的方法和装置,其利用屏蔽方式来检查RFID标签是否正常工作。 本发明的方法包括以下步骤:读取可读区域中的多个RFID标签; 以及确定所述多个RFID标签中是否存在任何故障的RFID标签。 如果所有多个RFID标签正常工作,则该方法将检查下一个RFID标签。 如果存在至少一个不可读RFID标签,则通过屏蔽一个或多个RFID标签来找到至少一个故障的RFID标签。 通过本发明的公开内容,本发明的方法和装置能够提高检查期间的效率并简化可读区域的设计。

    METHOD AND APPARATUS FOR INSPECTING RADIO FREQUENCY IDENTIFICATION TAGS
    4.
    发明申请
    METHOD AND APPARATUS FOR INSPECTING RADIO FREQUENCY IDENTIFICATION TAGS 有权
    检测无线电频率识别标签的方法和装置

    公开(公告)号:US20080174407A1

    公开(公告)日:2008-07-24

    申请号:US11944596

    申请日:2007-11-23

    IPC分类号: H04Q5/22

    摘要: A method and an apparatus for inspecting radio frequency identification (RFID) tags which utilize a way of shielding for inspecting whether RFID tags function properly or not. The method of the present invention comprises steps of: reading a plurality of RFID tags in a readable zone; and determining whether there is any malfunctional RFID tag in the plurality of RFID tags. If all the plurality of RFID tags function properly, the method will check a next plurality of RFID tags. If there is at least one unreadable RFID tag, the at least one malfunctional RFID tag will be found by shielding one or the plurality of RFID tags. By means of the disclosure in the present invention, the present method and apparatus are capable of improving the efficiency during inspection and simplifying the design of a readable zone.

    摘要翻译: 一种用于检查射频识别(RFID)标签的方法和装置,其利用屏蔽方式来检查RFID标签是否正常工作。 本发明的方法包括以下步骤:读取可读区域中的多个RFID标签; 以及确定所述多个RFID标签中是否存在任何故障的RFID标签。 如果所有多个RFID标签正常工作,则该方法将检查下一个RFID标签。 如果存在至少一个不可读RFID标签,则通过屏蔽一个或多个RFID标签来找到至少一个故障的RFID标签。 通过本发明的公开内容,本发明的方法和装置能够提高检查期间的效率并简化可读区域的设计。

    CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR FORMING PARYLENE FILM
    5.
    发明申请
    CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR FORMING PARYLENE FILM 有权
    化学蒸气沉积装置和形成片状薄膜的方法

    公开(公告)号:US20110151121A1

    公开(公告)日:2011-06-23

    申请号:US12876226

    申请日:2010-09-06

    摘要: A chemical vapor deposition apparatus and a method for forming a parylene film are provided. The chemical vapor deposition apparatus includes a buffer chamber, a deposition chamber, a pyrolysis chamber and an evaporator. The buffer chamber has a first valve and a second valve. The evaporator is connected with the second valve. The pyrolysis chamber is connected with the evaporator through a first pipe, wherein the first pipe has a third valve. The deposition chamber is connected with the pyrolysis chamber.

    摘要翻译: 提供化学气相沉积设备和形成聚对二甲苯膜的方法。 化学气相沉积装置包括缓冲室,沉积室,热解室和蒸发器。 缓冲室具有第一阀和第二阀。 蒸发器与第二阀连接。 热解室通过第一管与蒸发器连接,其中第一管具有第三阀。 沉积室与热解室连接。

    Method of forming parylene film
    7.
    发明授权
    Method of forming parylene film 有权
    形成聚对二甲苯膜的方法

    公开(公告)号:US08889224B2

    公开(公告)日:2014-11-18

    申请号:US12876226

    申请日:2010-09-06

    摘要: A method for forming a parylene film is provided, which includes following steps. Providing a chemical vapor deposition apparatus including a buffer chamber having first and second valves and a rotative carrying apparatus, an evaporator connected with the second valve, a pyrolysis chamber connected with the evaporator, and a deposition chamber connected with the pyrolysis chamber. Placing a parylene material in the rotative carrying apparatus of the buffer chamber through the first valve. Turning off the first and second valves and balancing a pressure in the buffer chamber and a pressure in the evaporator. Turning on the second valve and delivering the parylene material into the evaporator. Evaporating the parylene material in the evaporator to form a parylene gas. Pyrolyzing the parylene gas in the pyrolysis chamber to form a parylene monomer. Delivering the parylene monomer to the deposition chamber for deposition so as to form a parylene film.

    摘要翻译: 提供了形成聚对二甲苯膜的方法,其包括以下步骤。 提供一种化学气相沉积设备,包括具有第一和第二阀的缓冲室和旋转运载装置,与第二阀连接的蒸发器,与蒸发器连接的热解室以及与热解室连接的沉积室。 通过第一阀将缓冲室的旋转输送装置中的聚对二甲苯材料放置。 关闭第一和第二阀并平衡缓冲室中的压力和蒸发器中的压力。 打开第二个阀门并将聚对二甲苯材料输送到蒸发器中。 在蒸发器中蒸发聚对二甲苯材料以形成对二甲苯气体。 在热解室中热解聚对二甲苯以形成聚对二甲苯单体。 将聚对二甲苯单体输送到沉积室以进行沉积以形成聚对二甲苯膜。

    Plasma assisted apparatus for organic film deposition
    8.
    发明授权
    Plasma assisted apparatus for organic film deposition 有权
    用于有机膜沉积的等离子体辅助设备

    公开(公告)号:US08235002B2

    公开(公告)日:2012-08-07

    申请号:US12046042

    申请日:2008-03-11

    IPC分类号: C23C16/00

    摘要: A plasma assisted apparatus for organic film deposition, comprising: a plasma chamber, capable of thermally cracking a precursor in the plasma chamber; and a deposition chamber, being channeled with the plasma chamber for receiving the thermally cracked precursor. In an exemplary embodiment, the deposition chamber further comprises a substrate device, being provided for the thermally cracked precursor to deposit thereon to form an organic film. As the plasma chamber is separated from the deposition chamber in the aforesaid apparatus, a low-temperature film deposition process can be used for forming organic films while preventing the substrate device from being bombarded directly by plasma. In addition, as there is a flow guiding device arranged at the outlet of the plasma chamber, the thermally cracked precursor is guided or disturbed and thus is prevented from overly concentrating at the outlet or the center of the substrate device. Thereby, surface roughness as well as uniformity of the organic film can be effectively improved.

    摘要翻译: 一种用于有机膜沉积的等离子体辅助装置,包括:等离子体室,其能够热裂解等离子体室中的前体; 以及沉积室,其与等离子体室一起引导以接收热裂化的前体。 在示例性实施例中,沉积室还包括衬底装置,其被设置用于使热裂化的前体沉积在其上以形成有机膜。 由于在上述装置中等离子体室与沉积室分离,所以可以使用低温膜沉积工艺来形成有机膜,同时防止基板装置被等离子体直接轰击。 此外,由于在等离子体室的出口处设置有引流装置,所以热裂化的前体被引导或干扰,从而防止过度集中在基板装置的出口或中心。 由此,可以有效地提高表面粗糙度以及有机膜的均匀性。

    Plasma excitation module
    9.
    发明授权
    Plasma excitation module 有权
    等离子激发模块

    公开(公告)号:US08604696B2

    公开(公告)日:2013-12-10

    申请号:US12456438

    申请日:2009-06-16

    IPC分类号: H01J7/24

    摘要: A plasma excitation module including a chamber, a plurality of coils and a multi-duct gas intake system is provided. The chamber has a dielectric layer. The coils are disposed at an outer side of the dielectric layer, and the coils are separated from each other by an interval and in parallel connection. The multi-duct gas intake system surrounds the dielectric layer and is communicated with the chamber.

    摘要翻译: 提供了包括室,多个线圈和多管道气体进气系统的等离子体激励模块。 该腔室具有介电层。 线圈设置在电介质层的外侧,并且线圈以间隔和并联的方式彼此分离。 多管道气体进气系统围绕电介质层并与腔室连通。

    PLASMA APPARATUS
    10.
    发明申请
    PLASMA APPARATUS 审中-公开
    等离子体设备

    公开(公告)号:US20120145325A1

    公开(公告)日:2012-06-14

    申请号:US13044570

    申请日:2011-03-10

    IPC分类号: C23F1/08 H05H1/24

    CPC分类号: H01J37/32532 H01J37/32449

    摘要: A plasma apparatus including a chamber, an electrode set and a gas supplying tube set is provided. The chamber has a supporting table for supporting a substrate. The gas supplying tube set is disposed in the chamber and has a plurality of gas apertures. The gas supplying tube set is located between the supporting table and the electrode set.

    摘要翻译: 提供了包括室,电极组和供气管组的等离子体装置。 该腔室具有用于支撑衬底的支撑台。 气体供给管组设置在室中并具有多个气体孔。 供气管组位于支撑台和电极组之间。