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1.发明授权Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy 有权使用功率调制的方法和系统，用于空间梯度薄膜和多层涂层的无掩模气相沉积，具有原子级精度和准确度公开(公告)号：US06425988B1
公开(公告)日：2002-07-30
申请号：US09711441
申请日：2000-11-13
申请人： Claude Montcalm , James Allen Folta , Swie-In Tan , Ira Reiss
发明人： Claude Montcalm , James Allen Folta , Swie-In Tan , Ira Reiss
IPC分类号： C23C1434
CPC分类号： C23C14/54 , C23C14/543 , C23C14/545 , G02B1/10
摘要： A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source operated with time-varying flux distribution. In preferred embodiments, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. A user selects a source flux modulation recipe for achieving a predetermined desired thickness profile of the deposited film. The method relies on precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution.
摘要翻译： 通过扫描基板穿过随时间操作的气相沉积源，在平坦或渐变的基板（例如凹凸光学元件）上制造膜（优选具有高度均匀或高精度定制分级厚度的薄膜）的方法和系统 - 通量分布。 在优选实施例中，在衬底的每次扫描期间，源施加到其上的时变功率，以实现作为时间的函数的时变通量分布。 用户选择源通量调制配方以实现沉积膜的预定期望厚度分布。 该方法依赖于对衬底暴露的沉积通量的精确调制，以提供所需的涂层厚度分布。
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2.发明授权Method and system using power modulation and velocity modulation producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients 有权使用功率调制和速度调制的方法和系统产生具有亚埃厚度均匀性或定制厚度梯度的溅射薄膜公开(公告)号：US06668207B1
公开(公告)日：2003-12-23
申请号：US09710957
申请日：2000-11-13
IPC分类号： G06F1900
CPC分类号： C23C14/54 , C23C14/543 , C23C14/545 , G02B1/10
摘要： A method and system for determining a source flux modulation recipe for achieving a selected thickness profile of a film to be deposited (e.g., with highly uniform or highly accurate custom graded thickness) over a flat or curved substrate (such as concave or convex optics) by exposing the substrate to a vapor deposition source operated with time-varying flux distribution as a function of time. Preferably, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. Preferably, the method includes the steps of measuring the source flux distribution (using a test piece held stationary while exposed to the source with the source operated at each of a number of different applied power levels), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of source flux modulation recipes, and determining from the predicted film thickness profiles a source flux modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal source flux modulation recipe to achieve a desired thickness profile on a substrate. The method enables precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution.
摘要翻译： 一种用于确定源通量调制配方的方法和系统，用于在平坦或弯曲的衬底（例如凹或凸光学器件）上实现要沉积的膜的选定厚度分布（例如，具有高度均匀或高精度的定制分级厚度） 通过将衬底暴露于作为时间的函数的随时间变化的通量分布操作的气相沉积源。 优选地，在衬底的每次扫描期间，源施加到其上的时变功率，以实现作为时间的函数的时变通量分布。 优选地，该方法包括以下步骤：测量源极通量分布（使用在多个不同施加的功率水平的每一个处操作的源在暴露于源的情况下保持静止的测试片），计算一组预测的膜厚度分布， 每个膜厚度轮廓假设测量的通量分布和一组源通量调节配方中的不同的一个，并且根据预测的膜厚度分布确定足以实现预定厚度分布的源极通量调制配方。 本发明的方面包括采用图形用户界面的计算机实现的方法，以便于方便地选择最佳或接近最佳的源通量调节配方以在衬底上实现期望的厚度分布。 该方法能够精确地调制衬底所暴露的沉积通量，从而提供所需的涂层厚度分布。
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公开(公告)号：US6110607A
公开(公告)日：2000-08-29
申请号：US27308
申请日：1998-02-20
申请人： Claude Montcalm , Paul B. Mirkarimi
发明人： Claude Montcalm , Paul B. Mirkarimi
CPC分类号： G03F7/70958 , C03C17/36 , C03C17/3607 , C03C17/3613 , C03C17/3636 , C03C17/3644 , C03C17/3665 , G02B5/0891 , G02B5/26 , Y10T428/12674 , Y10T428/12826 , Y10T428/12993 , Y10T428/24975 , Y10T428/265
摘要： A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.
摘要翻译： 高反射率低应力Mo-Si多层反射涂层，特别适用于极紫外（EUV）波长区域。 虽然多层反射涂层具有EUV光刻技术的特殊应用，但其具有许多使用高反射率和低应力多层涂层的其它应用。 使用热和非热方法已经生产出具有高近似正常入射反射率（R> / = 65％）和低残余应力（<100MPa）的多层涂层。 热方法包括在沉积之后将多层涂层加热到给定温度一段给定的时间，以便在不显着降低反射率的情况下引起多层涂层的结构变化，这将具有整体的“松弛”效应。
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公开(公告)号：US6134049A
公开(公告)日：2000-10-17
申请号：US160264
申请日：1998-09-25
IPC分类号： B32B7/02 , B32B15/04 , G02B1/10 , G02B5/08 , G02B5/26 , G02B5/28 , G03F1/22 , G03F7/20 , F21V9/04
CPC分类号： G03F7/70958 , G02B5/0875 , G02B5/0891 , G02B5/26 , G03F1/22 , G21K1/062
摘要： Stress compensating systems that reduces/compensates stress in a multilayer without loss in reflectivity, while reducing total film thickness compared to the earlier buffer-layer approach. The stress free multilayer systems contain multilayer systems with two different material combinations of opposite stress, where both systems give good reflectivity at the design wavelengths. The main advantage of the multilayer system design is that stress reduction does not require the deposition of any additional layers, as in the buffer layer approach. If the optical performance of the two systems at the design wavelength differ, the system with the poorer performance is deposited first, and then the system with better performance last, thus forming the top of the multilayer system. The components for the stress reducing layer are chosen among materials that have opposite stress to that of the preferred multilayer reflecting stack and simultaneously have optical constants that allow one to get good reflectivity at the design wavelength. For a wavelength of 13.4 nm, the wavelength presently used for extreme ultraviolet (EUV) lithography, Si and Be have practically the same optical constants, but the Mo/Si multilayer has opposite stress than the Mo/Be multilayer. Multilayer systems of these materials have practically identical reflectivity curves. For example, stress free multilayers can be formed on a substrate using Mo/Be multilayers in the bottom of the stack and Mo/Si multilayers at the top of the stack, with the switch-over point selected to obtain zero stress. In this multilayer system, the switch-over point is at about the half point of the total thickness of the stack, and for the Mo/Be--Mo/Si system, there may be 25 deposition periods Mo/Be to 20 deposition periods Mo/Si.
摘要翻译： 应力补偿系统减少/补偿多层中的应力，而不损失反射率，同时减少与较早的缓冲层方法相比的总膜厚度。 无应力的多层系统包含具有两种不同材料组合的相反应力的多层系统，其中两个系统在设计波长处给出良好的反射率。 多层系统设计的主要优点是减压不需要任何附加层的沉积，如缓冲层方法一样。 如果两个系统的设计波长的光学性能不同，首先沉积性能较差的系统，然后再次具有更好性能的系统，从而形成多层系统的顶部。 应力降低层的组件选自具有与优选的多层反射叠层相反的应力的材料，并且同时具有允许在设计波长处获得良好的反射率的光学常数。 对于13.4nm的波长，目前用于极紫外（EUV）光刻的波长Si和Be实际上具有相同的光学常数，但Mo / Si多层具有与Mo / Be多层相反的应力。 这些材料的多层系统具有几乎相同的反射曲线。 例如，可以在堆叠底部使用Mo / Be多层和堆叠顶部的Mo / Si多层在衬底上形成无应力多层，选择切换点以获得零应力。 在该多层体系中，切换点为堆叠总厚度的大约一半，对于Mo / Be-Mo / Si系统，可能存在25个沉积周期Mo / Be至20个沉积周期Mo / Si。
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5.发明授权
公开(公告)号：US5958605A
公开(公告)日：1999-09-28
申请号：US969411
申请日：1997-11-10
CPC分类号： B82Y10/00 , G02B1/105 , G02B5/283 , G03F7/70958 , G21K1/062 , Y10T428/12576
摘要： A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.
摘要翻译： 钝化大衣双层用于极紫外（EUV）或软X射线应用的多层反射涂层，以防止多层涂层的氧化和腐蚀，从而提高EUV光学性能。 外涂层双层包含至少一层抵抗氧化和腐蚀的元素或复合材料的顶层之下的硅或铍层。 顶层材料包括碳，钯，碳化物，硼化物，氮化物和氧化物。 构成外涂层双层的两层的厚度被优化以在操作的波长范围产生最高的反射率。 包括三层或更多层的保护性外涂层系统也是可能的。
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6.发明授权Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers 有权通过改变表面或近表层的局部密度来校正光学表面上的局部形状误差公开(公告)号：US06844272B2
公开(公告)日：2005-01-18
申请号：US10086922
申请日：2002-03-01
申请人： John S. Taylor , James A. Folta , Claude Montcalm
发明人： John S. Taylor , James A. Folta , Claude Montcalm
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70958
摘要： Figure errors are corrected on optical or other precision surfaces by changing the local density of material in a zone at or near the surface. Optical surface height is correlated with the localized density of the material within the same region. A change in the height of the optical surface can then be caused by a change in the localized density of the material at or near the surface.
摘要翻译： 通过改变表面处或表面附近的区域中的材料的局部密度，在光学或其他精密表面上校正图形误差。 光学表面高度与同一区域内材料的局部密度相关。 然后可以通过在表面处或附近的材料的局部密度的变化来引起光学表面的高度的变化。
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公开(公告)号：US06634760B2
公开(公告)日：2003-10-21
申请号：US09940099
申请日：2001-08-27
IPC分类号： G02B508
CPC分类号： G02B5/283 , Y10T428/12632
摘要： Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 Å and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.
摘要翻译： 通过标准光学雕刻和抛光技术制造的球形和非球形光学元件是非常昂贵的。 这种表面可以通过金刚石车削廉价生产; 然而，金刚石转向表面的粗糙度阻止其用于EUV光刻。 在施加60周期的Mo / Si多层以反射波长的范围之前，使用聚酰亚胺涂层使这些波纹平滑，并获得接近63％的峰值反射率。 成本节约约为100。
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8.发明申请Method of Deposition with Reduction of Contaminants in An Ion Assist Beam and Associated Apparatus 审中-公开在离子辅助束和相关装置中减少污染物的沉积方法公开(公告)号：US20080257715A1
公开(公告)日：2008-10-23
申请号：US11664343
申请日：2004-10-13
IPC分类号： C23C14/34
摘要： The invention relates to a dual Ion Beam Sputtering method for depositing onto a substrate (S) material generated by the sputtering of a target (121-123) by a sputtering ion beam (110), said method comprising the operation of an assistance ion beam (130) directed onto said substrate in order to assist the deposition of material, said method being characterized in that during the operation of said assistance beam said sputtering beam is also operated in association with said assistance beam, and during said operation of the sputtering beam in association with the assistance beam the sputtering beam crosses a desired part of the assistance beam in order to transport contaminants associated to said desired part of the assistance beam away from said substrate.
摘要翻译： 本发明涉及一种用于沉积到通过溅射离子束（110）溅射靶（121-123）而产生的衬底（S）上的双离子束溅射方法，所述方法包括辅助离子束 （130），以便辅助沉积材料，所述方法的特征在于，在所述辅助束的操作期间，所述溅射束还与所述辅助光束相关联地操作，并且在溅射束的所述操作期间 与辅助束相关联，溅射束与辅助光束的期望部分交叉，以便将与所述辅助光束的所需部分相关联的污染物输送离开所述衬底。
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9.发明授权Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients 有权用于制造具有亚埃厚度均匀性或定制厚度梯度的溅射薄膜的方法和系统公开(公告)号：US06524449B1
公开(公告)日：2003-02-25
申请号：US09454673
申请日：1999-12-03
IPC分类号： C23C1600
CPC分类号： C23C14/54 , C23C14/543 , C23C14/545 , G02B1/10
摘要： A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a practical method of accurately measuring source flux distribution, and a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal sweep velocity modulation recipe to achieve a desired thickness profile on a substrate. Preferably, the computer implements an algorithm in which many sweep velocity function parameters (for example, the speed at which each substrate spins about its center as it sweeps across the source) can be varied or set to zero.
摘要翻译： 通过将衬底穿过气相沉积源（通常在其上，通常用于生产具有高度均匀（或高度准确的定制分级）厚度的薄膜的方法和系统，该平板或渐变衬底（例如凹形或凸形光学器件） 时变）速度。 在优选实施例中，该方法包括以下步骤：测量源通量分布（使用在暴露于源时保持静止的测试件），计算一组预测的膜厚度分布，每个薄膜厚度分布假设测量的磁通分布;以及 一组扫描速度调制配方中的不同的一个，并且从预测的膜厚度分布确定足以实现预定厚度分布的扫描速度调制配方。 本发明的方面包括精确测量源通量分布的实用方法，以及采用图形用户界面的计算机实现的方法，以促进方便地选择最佳或近似最佳的扫描速度调制配方以在衬底上实现期望的厚度分布。 优选地，计算机实现了一种算法，其中许多扫描速度函数参数（例如，每个基板绕其中心旋转，当其扫过源时的速度）可以被改变或设置为零。
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10.发明授权Process for fabricating high reflectance-low stress Mo—Si multilayer reflective coatings 失效制造高反射低应力Mo-Si多层反射涂层的工艺公开(公告)号：US06309705B1
公开(公告)日：2001-10-30
申请号：US09483274
申请日：2000-01-13
申请人： Claude Montcalm , Paul B. Mirkarimi
发明人： Claude Montcalm , Paul B. Mirkarimi
IPC分类号： B05D302
CPC分类号： G03F7/70958 , C03C17/36 , C03C17/3607 , C03C17/3613 , C03C17/3636 , C03C17/3644 , C03C17/3665 , G02B5/0891 , G02B5/26 , Y10T428/12674 , Y10T428/12826 , Y10T428/12993 , Y10T428/24975 , Y10T428/265
摘要： A high reflectance-low stress Mo—Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R≧65%) and low residual stress (≦100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall “relaxation” effect without reducing the reflectance significantly.
摘要翻译： 高反射率低应力Mo-Si多层反射涂层，特别适用于极紫外（EUV）波长区域。 虽然多层反射涂层具有EUV光刻技术的特殊应用，但其具有许多使用高反射率和低应力多层涂层的其它应用。 使用热和非热方法已经产生了具有高近似正常入射反射率（R> = 65％）和低残余应力（<= 100MPa）的多层涂层。 热方法包括在沉积之后将多层涂层加热到给定温度一段给定的时间，以便在不显着降低反射率的情况下引起多层涂层的结构变化，这将具有整体的“松弛”效应。
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