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公开(公告)号：US20120040590A1
公开(公告)日：2012-02-16
申请号：US13210800
申请日：2011-08-16
申请人： James H. Burge , Dae Wook Kim
发明人： James H. Burge , Dae Wook Kim
IPC分类号： B24B1/00
摘要： In a non-conventional lap tool, i.e., not a stiff tool nor a conformable tool, and related method for grinding/polishing a substrate surface, includes a rigid base plate and attached work surface to define a cavity containing a non-Newtonian fluid. The non-Newtonian fluid behaves as a solid when the work surface is subjected to high shear stress, i.e., rapid tool stroke, yet behaves like a liquid when the tool is moved around the substrate surface when the shear stress of the work surface is low. A diaphragm can be used to further define the cavity and to seal within the non-Newtonian fluid therein.
摘要翻译： 在非常规的搭接工具中，即不是刚性工具，也不是适合的工具，以及用于研磨/抛光衬底表面的相关方法，包括刚性基板和附接的工作表面，以限定包含非牛顿流体的空腔。 当工作表面经受高剪切应力时，非牛顿流体表现为固体，即快速的工具冲程，当工件在工作表面的剪切应力低时，当工具移动到基板表面周围时，表现为液体 。 可以使用隔膜来进一步限定空腔并在其内的非牛顿流体内密封。
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公开(公告)号：US20090200482A1
公开(公告)日：2009-08-13
申请号：US12096095
申请日：2006-12-05
申请人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
发明人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
IPC分类号： H01J3/14
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.
摘要翻译： 本发明涉及一种改善产生电子束的电子束聚焦的方法。 根据本发明的用于控制电子束的聚焦的方法当电子束到达样本时减小了电子束的光斑尺寸，从而可以提高分辨率，并且半导体光刻工艺中的图案的线宽 可以减少，结果可以提高电子的性能。
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公开(公告)号：US09666407B2
公开(公告)日：2017-05-30
申请号：US14631330
申请日：2015-02-25
申请人： Tae Sik Oh , Ho Seob Kim , Dae Wook Kim
发明人： Tae Sik Oh , Ho Seob Kim , Dae Wook Kim
IPC分类号： H01J37/147 , H01J37/073 , H01J37/26 , H01J9/02
CPC分类号： H01J37/1477 , H01J9/02 , H01J37/073 , H01J37/26 , H01J2237/04924 , H01J2237/1516
摘要： Disclosed is an electrostatic quadrupole deflector for a microcolumn. The deflector includes an electron beam passage hole, deflecting electrodes to which a deflection voltage is applied, and floating electrodes to which the deflection voltage is not applied. The deflector is structurally stable and has a simple driving system. The deflector has good performance and characteristics.
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公开(公告)号：US09302367B2
公开(公告)日：2016-04-05
申请号：US13210800
申请日：2011-08-16
申请人： James H. Burge , Dae Wook Kim
发明人： James H. Burge , Dae Wook Kim
摘要： In a non-conventional lap tool, i.e., not a stiff tool nor a conformable tool, and related method for grinding/polishing a substrate surface, includes a rigid base plate and attached work surface to define a cavity containing a non-Newtonian fluid. The non-Newtonian fluid behaves as a solid when the work surface is subjected to high shear stress, i.e., rapid tool stroke, yet behaves like a liquid when the tool is moved around the substrate surface when the shear stress of the work surface is low. A diaphragm can be used to further define the cavity and to seal within the non-Newtonian fluid therein.
摘要翻译： 在非常规的搭接工具中，即不是刚性工具，也不是适合的工具，以及用于研磨/抛光衬底表面的相关方法，包括刚性基板和附接的工作表面，以限定包含非牛顿流体的空腔。 当工作表面经受高剪切应力时，非牛顿流体表现为固体，即快速的工具冲程，当工件在工作表面的剪切应力低时，当工具移动到基板表面周围时，表现为液体 。 可以使用隔膜来进一步限定空腔并在其内的非牛顿流体内密封。
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公开(公告)号：US09280287B2
公开(公告)日：2016-03-08
申请号：US14135628
申请日：2013-12-20
申请人： Man Keun Seo , Dae Wook Kim , Hong Rak Son , Jun Jin Kong
发明人： Man Keun Seo , Dae Wook Kim , Hong Rak Son , Jun Jin Kong
CPC分类号： G06F3/0608 , G06F3/0641 , G06F3/0655 , G06F3/0673 , G06F3/0679 , H03M7/3086 , H03M7/6082
摘要： A data compression method includes receiving an input data stream including a previous data block and a current data block, and executing a first comparison of a part of the previous data block with part of a previous reference data block, and a second comparison of the current data block with a current reference data block, where the first and second comparisons are executed in parallel. The method further includes selectively, based on results of the first and second comparisons, outputting the current data block or compressing an extended data block, where the extended data block includes the part of the previous data block and the current data block.
摘要翻译： 数据压缩方法包括接收包括先前数据块和当前数据块的输入数据流，并且执行先前数据块的一部分与先前参考数据块的一部分的第一比较，以及当前 具有当前参考数据块的数据块，其中第一和第二比较并行执行。 该方法还包括基于第一和第二比较的结果选择性地输出当前数据块或压缩扩展数据块，其中扩展数据块包括先前数据块的一部分和当前数据块。
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6.发明授权公开(公告)号：US08890092B2
公开(公告)日：2014-11-18
申请号：US13752040
申请日：2013-01-28
申请人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
发明人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
CPC分类号： G21K5/04 , H01J37/045 , H01J37/28 , H01J2237/045 , H01J2237/15 , H01J2237/30483
摘要： Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.
摘要翻译： 本文公开了包括具有偏心孔的电极层的多粒子束柱。 多粒子束柱包括两个或更多个粒子束柱，每个粒子束柱包括粒子束发射源，偏转器和两个或更多个电极层。 多粒子束柱包括至少一个具有一个或多个孔的至少一个电极层，所述孔径与颗粒束柱的各个光束轴线偏心。
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公开(公告)号：US08616992B2
公开(公告)日：2013-12-31
申请号：US12601583
申请日：2008-05-27
申请人： Dae Wook Kim
发明人： Dae Wook Kim
IPC分类号： A63B69/36
CPC分类号： A63B53/0487 , A63B69/3614 , A63B69/3685 , A63B2053/0441
摘要： A putter includes a handle (2), a putter head (1) with a striking surface, and two alignment indicia (6) symmetrically arranged relative to a vertical plane (20) which is perpendicular to the striking surface and passes through a striking line. Wherein the visible part of the alignment indicia (6) are symmetrical to the vertical plane (20) when being viewed in the vertical plane (20), while not symmetrical to the vertical plane (20) when being viewed in a plane offsetting from the vertical plane (20).
摘要翻译： 推杆包括手柄（2），具有冲击表面的推杆头（1）和相对于竖直平面（20）对称布置的两个对准标记（6），垂直于垂直于打击表面并穿过击打线 。 其中，当在垂直平面（20）中观察时，对准标记（6）的可见部分与垂直平面（20）对称，而当在从垂直平面（20）偏移的平面中观察时，与垂直平面（20）不对称 垂直平面（20）。
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8.发明申请MULTI-PARTICLE BEAM COLUMN HAVING AN ELECTRODE LAYER INCLUDING AN ECCENTRIC APERTURE 有权具有电极层的多颗粒束柱，包括偏心孔公开(公告)号：US20140209813A1
公开(公告)日：2014-07-31
申请号：US13752040
申请日：2013-01-28
申请人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
发明人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
IPC分类号： G21K1/08
CPC分类号： G21K5/04 , H01J37/045 , H01J37/28 , H01J2237/045 , H01J2237/15 , H01J2237/30483
摘要： Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.
摘要翻译： 本文公开了包括具有偏心孔的电极层的多粒子束柱。 多粒子束柱包括两个或更多个粒子束柱，每个粒子束柱包括粒子束发射源，偏转器和两个或更多个电极层。 多粒子束柱包括至少一个具有一个或多个孔的至少一个电极层，所述孔径与颗粒束柱的各个光束轴线偏心。
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公开(公告)号：US07902521B2
公开(公告)日：2011-03-08
申请号：US12096095
申请日：2006-12-05
申请人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
发明人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.
摘要翻译： 本发明涉及一种改善产生电子束的电子束聚焦的方法。 根据本发明的用于控制电子束的聚焦的方法当电子束到达样本时减小了电子束的光斑尺寸，从而可以提高分辨率，并且半导体光刻工艺中的图案的线宽 可以减少，结果可以提高电子的性能。
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公开(公告)号：US20100173720A1
公开(公告)日：2010-07-08
申请号：US12601583
申请日：2008-05-27
申请人： Dae Wook Kim
发明人： Dae Wook Kim
CPC分类号： A63B53/0487 , A63B69/3614 , A63B69/3685 , A63B2053/0441
摘要： A putter includes a handle (2), a putter head (1) with a striking surface, and two alignment indicia (6) symmetrically arranged relative to a vertical plane (20) which is perpendicular to the striking surface and passes through a striking line. Wherein the visible part of the alignment indicia (6) are symmetrical to the vertical plane (20) when being viewed in the vertical plane (20), while not symmetrical to the vertical plane (20) when being viewed in a plane offsetting from the vertical plane (20).
摘要翻译： 推杆包括手柄（2），具有冲击表面的推杆头（1）和相对于竖直平面（20）对称布置的两个对准标记（6），垂直于垂直于打击表面并穿过击打线 。 其中，当在垂直平面（20）中观察时，对准标记（6）的可见部分与垂直平面（20）对称，而当在从垂直平面（20）偏移的平面中观察时，与垂直平面（20）不对称 垂直平面（20）。
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